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David V. Adams

Applied Materials

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Publication

Featured researches published by David V. Adams.

Archive | 1990

Double-dome reactor for semiconductor processing

Roger N. Anderson; John G. Martin; Douglas Meyer; Daniel West; Russell Bowman; David V. Adams

Archive | 1992

Thermally processing semiconductor wafers at non-ambient pressures

David V. Adams; Roger N. Anderson; Thomas E. Deacon

Archive | 1989

Pressure resistant thermal reactor system for semiconductor processing

David V. Adams; Roger N. Anderson; Thomas E. Deacon

Archive | 1990

Wafer reactor vessel window with pressure-thermal compensation

David V. Adams; Roger N. Anderson

Archive | 1991

Thermal reactor for processing semiconductor wafers and a method of operating such a reactor

David V. Adams; Roger N. Anderson

Archive | 1991

Zwei Kuppeln aufweisender Reaktor zur Halbleiterbehandlung

Roger N. Anderson; John G. Martin; Douglas Meyer; Daniel West; Russell Bowman; David V. Adams

Archive | 1991

Zwei Kuppeln aufweisender Reaktor zur Halbleiterbehandlung Two domes having Descending reactor for semiconductor processing

Roger N. Anderson; John G. Martin; Douglas Meyer; Daniel West; Russell Bowman; David V. Adams

Archive | 1991

Termische Reaktoranlage zur Bearbeitung von Halbleiterscheiben und Betriebsverfahren eines solchem Reaktors. THERMIC reactor plant for the processing of semiconductor wafers and method of operation of such a reactor.

David V. Adams; Roger N. Anderson

Archive | 1991

Termische Reaktoranlage zur Bearbeitung von Halbleiterscheiben und Betriebsverfahren eines solchem Reaktors.

David V. Adams; Roger N. Anderson

Archive | 1991

THERMIC reactor plant for the processing of semiconductor wafers and methods of operation of such a reactor.

David V. Adams; Roger N. Anderson

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Roger N. Anderson

Applied Materials

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Thomas E. Deacon

Applied Materials

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Daniel West

Applied Materials

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Douglas Meyer

Applied Materials

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John G. Martin

Applied Materials

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Russell Bowman

Applied Materials

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