Dennis Kirchheim

Enhanced oxygen dissociation in a propagating constricted discharge formed in a self-pulsing atmospheric pressure microplasma jet

We report on the propagation of a constricted discharge feature in a repetitively self-pulsing microplasma jet operated in helium with a 0.075?vol% molecular oxygen admixture in ambient air environment. The constricted discharge is about 1?mm in width and repetitively ignites at the point of smallest electrode distance in a wedge-shaped electrode configuration, propagates through the discharge channel towards the nozzle, extinguishes, and re-ignites at the inlet at frequencies in the kHz range. It co-exists with a homogeneous, volume-dominated low temperature (T???300?K) ?-mode glow. Time-resolved measurements of nitrogen molecule C-state and nitrogen molecule ion B-state emission bands reveal an increase of the rotational temperature within the constricted discharge to about 600?K within 50??s. Its propagation velocity was determined by phase-resolved diagnostics to be similar to the gas velocity, in the order of 40?m?s?1. Two-photon absorption laser-induced fluorescence spectroscopy synchronized to the self-pulsing reveals spatial regions of increased oxygen atom densities co-propagating with the constricted discharge feature. The generated oxygen pulse density is about ten times higher than in the co-existing homogeneous ?-mode. Densities reach about 1.5???1016?cm?3 at average temperatures of 450?K at the nozzle. This enhanced dissociation of about 80% is attributed to the continuous interaction of the constricted discharge to the co-propagating gas volume.

PEALD of SiO2 and Al2O3 Thin Films on Polypropylene: Investigations of the Film Growth at the Interface, Stress, and Gas Barrier Properties of Dyads

A study on the plasma-enhanced atomic layer deposition of amorphous inorganic oxides SiO2 and Al2O3 on polypropylene (PP) was carried out with respect to growth taking place at the interface of the polymer substrate and the thin film employing in situ quartz-crystal microbalance (QCM) experiments. A model layer of spin-coated PP (scPP) was deposited on QCM crystals prior to depositions to allow a transfer of findings from QCM studies to industrially applied PP foil. The influence of precursor choice (trimethylaluminum (TMA) vs [3-(dimethylamino)propyl]-dimethyl aluminum (DMAD)) and of plasma pretreatment on the monitored QCM response was investigated. Furthermore, dyads of SiO2/Al2O3, using different Al precursors for the Al2O3 thin-film deposition, were investigated regarding their barrier performance. Although the growth of SiO2 and Al2O3 from TMA on scPP is significantly hindered if no oxygen plasma pretreatment is applied to the scPP prior to depositions, the DMAD process was found to yield comparable Al2O3 growth directly on scPP similar to that found on a bare QCM crystal. From this, the interface formed between the Al2O3 and the PP substrate is suggested to be different for the two precursors TMA and DMAD due to different growth modes. Furthermore, the residual stress of the thin films influences the barrier properties of SiO2/Al2O3 dyads. Dyads composed of 5 nm Al2O3 (DMAD) + 5 nm SiO2 exhibit an oxygen transmission rate (OTR) of 57.4 cm3 m-2 day-1, which correlates with a barrier improvement factor of 24 against 5 when Al2O3 from TMA is applied.

The effect of UV radiation from oxygen and argon plasma on the adhesion of organosilicon coatings on polypropylene

The influence of ultraviolet (UV) radiation from oxygen and argon pretreatment plasmas on a plastic substrate has not been fully understood yet. In particular, its influence on the adhesion properties has not been sufficiently researched so far. This paper addresses this issue by comparing the bond strength of a plasmapolymerized silicon organic coating (SiO x C y H z ) on polypropylene (PP) after oxygen and argon plasma pretreatment and pretreatment by UV radiation emitted by the same plasmas. The UV radiation is isolated from the other species from the plasma by means of a magnesium fluoride (MgF2) optical filter. It could be shown that UV radiation originating from an oxygen plasma has a significant impact on both substrate surface chemistry and coating adhesion. The same maximum bond strength enhancement can be reached by pretreating the polypropylene surface either with pulsed oxygen plasma, or with only the UV radiation from this oxygen plasma. Also, similar surface chemistry and topography modifications are induced. For argon plasma no significant influence of its UV radiation on the substrate could be observed in this study.

Improved homogeneity of plasma and coating properties using a lance matrix gas distribution in MW-PECVD

Plasma reactors for the application of silicon oxide coatings (SiOx) are often customized to optimize the processes regarding substrate properties and targeted functionalities. The design of these reactors is often based on qualitative considerations. This paper evaluates the use of a numerical, free simulation software for continuous mechanical problems (OpenFOAM) as a tool to evaluate reactor design options. As demonstrator for this purpose serves a given reactor for large-area pulsed microwave plasmas with a precursor inlet in the form of a shower ring. Previous results indicate that the shower ring may lead to an inhomogeneity in plasma and coatings properties along the substrate surface. Thus, a new precursor inlet design shall be developed. For this, the distribution of the process gases in the reactor for a variety of gas inlet designs and gas flows was simulated and a design chosen based on the results. The reactor was modified accordingly, and the simulations correlated with experimental results of plasma and coating properties. The results show that, despite many simplifications, a simulation of the neutral gas distribution using an open-access software can be a viable tool to support reactor and process design development.