Dirk N. Anderson

Method of manufacturing a minimum scaled transistor

Semiconductor stack having a dielectric sidewall for prevention of oxidation of tungsten in tungsten capped poly-silicon gate electrodes

Edge stress reduction by noncoincident layers

Process for making vertically-oriented interconnections for VLSI devices

CVD-based process for manufacturing stable low-resistivity poly-metal gate electrodes

Method to protect metal from oxidation during poly-metal gate formation in semiconductor device manufacturing

Integrated circuit metallization with reduced electromigration

Encapsulated low resistance gate structure and method for forming same

Process for making contacts and interconnections using direct-reacted silicide

Contacts for VLSI devices using direct-reacted silicide