Dong-Keun Ki
Pohang University of Science and Technology
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Publication
Featured researches published by Dong-Keun Ki.
Physical Review B | 2008
Dong-Keun Ki; Dongchan Jeong; Jae-Hyun Choi; Hu-Jong Lee; Kee-Su Park
Charge carriers in a graphene sheet, a single layer of graphite, exhibit distinct characteristics from those in other two-dimensional electronic systems because of their chiral nature. In this paper, we focus on the observation of weak localization in a graphene sheet exfoliated from a piece of natural graphite and nanopatterned into a Hall-bar geometry. Much stronger chiral-symmetry-breaking elastic intervalley scattering in our graphene sheet restores the conventional weak localization. The resulting carrier density and temperature dependence of the phase coherence length reveal that the electron-electron interaction including a direct Coulomb interaction is the main inelastic-scattering factor while electron-hole puddles enhance the inelastic scattering near the Dirac point.
Physical Review X | 2014
Nuno Jose Guimaraes Couto; Alberto F. Morpurgo; Kenji Watanabe; Stephan Engels; Dong-Keun Ki; F. Guinea; Davide Costanzo; Christoph Stampfer; Takashi Taniguchi
Futuristic electronic devices will rely on high electron speeds in graphene. A new investigation shows that random strain in the carbon honeycomb lattice limits the speed of electrons.
Applied Physics Letters | 2013
Anya L. Grushina; Dong-Keun Ki; Alberto F. Morpurgo
We have developed a process to fabricate suspended graphene devices with local bottom gates, and tested it by realizing electrostatically controlled pn junctions on a suspended graphene mono-layer nearly 2 μm long. Measurements as a function of gate voltage, magnetic field, bias, and temperature exhibit characteristic Fabry-Perot oscillations in the cavities formed by the pn junction and each of the contacts, with transport occurring in ballistic regime. Our results demonstrate the possibility to achieve a high degree of control on the local electronic properties of ultra-clean suspended graphene layers, a key aspect for the realization of high quality graphene nanostructures.
Physical Review X | 2016
Zhe Wang; Dong-Keun Ki; Jun Yong Khoo; Diego Mauro; Helmuth Berger; L. S. Levitov; Alberto F. Morpurgo
We use a combination of experimental techniques to demonstrate a general occurrence of spin-orbit interaction (SOI) in graphene on transition metal dichalcogenide (TMD) substrates. Our measurements indicate that SOI is ultra-strong and extremely robust, despite it being merely interfacially-induced, with neither graphene nor the TMD substrates changing their structure. This is found to be the case irrespective of the TMD material used, of the transport regime, of the carrier type in the graphene band, and of the thickness of the graphene multilayer. Specifically, we perform weak antilocalization measurements as the simplest and most general diagnostic of SOI, and show that the spin relaxation time is very short in all cases regardless of the elastic scattering time. Such a short spin-relaxation time strongly suggests that the SOI originates from a modification of graphene band structure. We confirmed this expectation by measuring a gate-dependent beating, and a corresponding frequency splitting, in the low-field Shubnikov-de Haas magneto-resistance oscillations in high quality bilayer graphene on WSe
Nature Communications | 2015
Anya L. Grushina; Dong-Keun Ki; Mikito Koshino; A. A. L. Nicolet; C. Faugeras; Edward McCann; M. Potemski; Alberto F. Morpurgo
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Nanotechnology | 2011
Seung-Geol Nam; Dong-Keun Ki; Jong Wan Park; Youngwook Kim; Jun Sung Kim; Hu-Jong Lee
. These measurements provide an unambiguous diagnostic of a SOI-induced splitting in the electronic band structure, and their analysis allows us to determine the SOI coupling constants for the Rashba term and the so-called spin-valley coupling term, i.e., the terms that were recently predicted theoretically for interface-induced SOI in graphene. The magnitude of the SOI splitting is found to be on the order of 10 meV, more than 100 times greater than the SOI intrinsic to graphene. Both the band character of the interfacially induced SOI, as well as its robustness and large magnitude make graphene-on-TMD a promising system to realize and explore a variety of spin-dependent transport phenomena, such as, in particular, spin-Hall and valley-Hall topological insulating states.
Physical Review B | 2010
Dong-Keun Ki; Seung-Geol Nam; Hu-Jong Lee; Barbaros Özyilmaz
Close to charge neutrality, the electronic properties of graphene and its multilayers are sensitive to electron–electron interactions. In bilayers, for instance, interactions are predicted to open a gap between valence and conduction bands, turning the system into an insulator. In mono and (Bernal-stacked) trilayers, which remain conducting at low temperature, interactions do not have equally drastic consequences. It is expected that interaction effects become weaker for thicker multilayers, whose behaviour should converge to that of graphite. Here we show that this expectation does not correspond to reality by revealing the occurrence of an insulating state close to charge neutrality in Bernal-stacked tetralayer graphene. The phenomenology—incompatible with the behaviour expected from the single-particle band structure—resembles that observed in bilayers, but the insulating state in tetralayers is visible at higher temperature. We explain our findings, and the systematic even–odd effect of interactions in Bernal-stacked layers of different thickness that emerges from experiments, in terms of a generalization of the interaction-driven, symmetry-broken states proposed for bilayers.
Applied Physics Letters | 2009
Dong-Keun Ki; Sanghyun Jo; Hu-Jong Lee
We fabricated graphene pnp devices, by embedding pre-defined local gates in an oxidized surface layer of a silicon substrate. With neither deposition of dielectric material on the graphene nor electron-beam irradiation, we obtained high-quality graphene pnp devices without degradation of the carrier mobility even in the local-gate region. The corresponding increased mean free path leads to the observation of ballistic and phase-coherent transport across a local gate 130 nm wide, which is about an order of magnitude wider than reported previously. Furthermore, in our scheme, we demonstrated independent control of the carrier density in the local-gate region, with a conductance map very much distinct from those of top-gated devices. This was caused by the electric field arising from the global back gate being strongly screened by the embedded local gate. Our scheme allows the realization of ideal multipolar graphene junctions with ballistic carrier transport.
Nature Physics | 2017
Youngwoo Nam; Dong-Keun Ki; David Soler-Delgado; Alberto F. Morpurgo
By using four-terminal configurations, we investigated the dependence of longitudinal and diagonal resistances of a graphene p-n interface on the quantum-Hall edge-state equilibration position. The resistance of a p-n device in our four-terminal scheme is asymmetric with respect to the zero point where the filling factor of the entire graphene vanishes. This resistance asymmetry is caused by the chiral direction dependent change in the equilibration position and leads to a deeper insight into the equilibration process of the quantum-Hall edge-states in a bipolar graphene system.
Physical Review Letters | 2016
Lin Wang; Ignacio Gutiérrez-Lezama; Céline Barreteau; Dong-Keun Ki; Enrico Giannini; Alberto F. Morpurgo
In this study, we determined the chiral direction of the quantum-Hall (QH) edge states in graphene by adopting simple two-terminal conductance measurements while grounding different edge positions of the sample. The edge state with a smaller filling factor is found to more strongly interact with the electric contacts. This simple method can be conveniently used to investigate the chirality of the QH edge state with zero filling factor in graphene, which is important to understand the symmetry breaking sequence in high magnetic fields (≳25 T).