Doo-hwan Kim

Fabrication of nanosize aperture under electron beam exposure for optical trapping device

Recently there have been tremendous interests about single molecule trapping and characterization using nearfield optical technique. In order to manipulate and trap single molecule such as DNA, the trapping volume has to be significantly smaller than the normal optical trapping with laser beam. The evanescent field can provide the tiny trapping volume and can successfully trap single molecules. The nanosize metal aperture array has been designed and fabricated using various semiconductor fabrication techniques.

Fabrication of gated nanosize Si-tip arrays for high perveance electron beam applications

Summary form only given. Nanosize Si-tip arrays with gated electrodes have been fabricated using self-aligned method. In order to have parallel electron beam (high perveance beam) toward the anode plate, we have designed a nanosize tip array with heights of the tip slightly less than that of a gate electrode. High perveance beam is supposed to provide a better focusing of electron beams. Hence, it is important to have a high perveance electron beam for nano lithographic application.