Doo-Sub Lee

A 1.8 V 700 Mb/s/pin 512 Mb DDR-II SDRAM with on-die termination and off-chip driver calibration

A 1.8 V 700 Mb/s/pin 512 Mb DDR-II SDRAM is JEDEC standard compliant. With the hierarchical I/O line and local sensing, t/sub AA/ /t/sub RCD//t/sub RP/ of 3/3/3 at 533 Mb/s are achieved in the design. For signal integrity at 533 Mb/s, off-chip driver calibration and on-die termination are employed.

7.1 256Gb 3b/cell V-NAND flash memory with 48 stacked WL layers

Todays explosive demand for data transfer is accelerating the development of non-volatile memory with even larger capacity and cheaper cost. Since the introduction of 3D technology in 2014 [1], V-NAND is believed to be a successful alternative to planar NAND and is quickly displacing planar NAND in the SSD market, due to its performance, reliability, and cost competitiveness. V-NAND has also eliminated the cell-to-cell interference problem by forming an atomic layer for charge trapping [2], which enables further technology scaling. However, the etching technology required for creating a channel hole cannot keep up with the market-driven WL stack requirement. Therefore, total mold height reduction is unavoidable and this creates several problems. 1) reduced mold height increases resistance and capacitance for WLs due to the thinner layers being used. 2) channel hole critical dimension (CD) variation becomes problematic because the additional mold stack height aggravates uniformity, thereby producing WL resistance variation. Consequently, read and program performance degradation is inevitable, furthermore their optimization becomes more challenging.

A 128 Gb 3b/cell V-NAND Flash Memory With 1 Gb/s I/O Rate

Most memory-chip manufacturers keep trying to supply cost-effective storage devices with high-performance characteristics such as shorter tPROG, lower power consumption and higher endurance. For many years, every effort has been made to shrink die size to lower cost and to improve performance. However, the previously used node-shrinking methodology is facing challenges due to increased cell-to-cell interference and patterning difficulties caused by decreasing dimension. To overcome these limitations, 3D-stacking technology has been developed. As a result of long and focused research in 3D stacking technology, we succeed in developing 128 Gb 3b/cell Vertical NAND with 32 stack WL layers for the first time, which is the smallest 128 Gb NAND Flash. The die size is 68.9 mm 2, program time is 700 us and I/O rate is 1 Gb/s.

7.2 A 128Gb 3b/cell V-NAND flash memory with 1Gb/s I/O rate

Most memory-chip manufacturers keep trying to supply cost-effective storage devices with high-performance characteristics such as smaller tPROG, lower power consumption and longer endurance. For many years, every effort has been made to shrink die size to lower cost and to improve performance. However, the previously used node-shrinking methodology is facing challenges due to increased cell-to-cell interference and patterning difficulties caused by decreasing dimension. To overcome these limitations, 3D-stacking technology has been developed. As a result of long and focused research in 3D stacking technology, 128Gb 2b/cell device with 24 stack WL layers was announced in 2014 [1].

Temperature-compensation circuit techniques for high-density CMOS DRAMs

Temperature-compensation circuit techniques are presented for the CMOS DRAM internal voltage converter, the RC-delay circuit, and the back-bias generator, which do not need any additional process steps. The above-mentioned circuits have been designed and evaluated through a 16-Mb CMOS DRAM process. These circuits have shown an internal voltage converter (IVC) with an internal voltage temperature coefficient of 185 ppm/ degrees C, and an RC-delay circuit with a delay time temperature coefficient of 0.03%/ degrees C. As a result, a 6.5-ns faster RAS access time and improved latchup immunity have been achieved, compared with conventional circuit techniques. >

256 Gb 3 b/Cell V-nand Flash Memory With 48 Stacked WL Layers

A 48 WL stacked 256-Gb V-NAND flash memory with a 3 b MLC technology is presented. Several vertical scale-down effects such as deteriorated WL loading and variations are discussed. To enhance performance, reverse read scheme and variable-pulse scheme are presented to cope with nonuniform WL characteristics. For improved performance, dual state machine architecture is proposed to achieve optimal timing for BL and WL, respectively. Also, to maintain robust IO driver strength against PVT variations, an embedded ZQ calibration technique with temperature compensation is introduced. The chip, fabricated in a third generation of V-NAND technology, achieved a density of 2.6 Gb/mm2 with 53.2 MB/s of program throughput.