Jeong-Don Ihm

An 80 nm 4 Gb/s/pin 32 bit 512 Mb GDDR4 Graphics DRAM With Low Power and Low Noise Data Bus Inversion

4 Gb/s/pin 32 bit 512 Mb GDDR4 (Graphics Double Data Rate 4) SDRAM was implemented by using an 80 nm CMOS process. It employs a data bus inversion (DBI) coding to overcome the bottleneck of a parallel single-ended signaling, a power consumption of I/O, power supply noise, and crosstalk. Both DBI AC and DC modes are combined to a single circuit by eliminating the feedback path of a conventional DBI AC circuit while achieving high-speed operation. The proposed DBI circuit uses an analog majority voter insensitive to mismatch for small area and delay. Ronmiddot tuning further improves the voltage and time margin by adding a user-supplied offset to auto-calibrated Ronmiddot. In addition, a dual duty cycle corrector (DCC) is used to reduce duty error and jitter by averaging two outputs of two DCCs. Measured results show that DBI DC coding reduces the peak-to-peak jitter from 65.5 ps to 44.5 ps and the voltage fluctuation from 183 mV to 115 mV at the data rate of 4 Gb/s with the 2 V.

An 80nm 4Gb/s/pin 32b 512Mb GDDR4 Graphics DRAM with Low-Power and Low-Noise Data-Bus Inversion

A 4Gb/s/pin 32b parallel 512Mb GDDR4 SDRAM is implemented in an 80nm DRAM process. It employs a data-bus inversion coding scheme with an analog majority voter insensitive to mismatch, which reduces peak-to-peak jitter by 21 ps and voltage fluctuation by 68mV. A dual duty-cycle corrector is proposed to average duty error, and tuning is added to the auto-calibration of driver and termination impedance.

7.1 256Gb 3b/cell V-NAND flash memory with 48 stacked WL layers

Todays explosive demand for data transfer is accelerating the development of non-volatile memory with even larger capacity and cheaper cost. Since the introduction of 3D technology in 2014 [1], V-NAND is believed to be a successful alternative to planar NAND and is quickly displacing planar NAND in the SSD market, due to its performance, reliability, and cost competitiveness. V-NAND has also eliminated the cell-to-cell interference problem by forming an atomic layer for charge trapping [2], which enables further technology scaling. However, the etching technology required for creating a channel hole cannot keep up with the market-driven WL stack requirement. Therefore, total mold height reduction is unavoidable and this creates several problems. 1) reduced mold height increases resistance and capacitance for WLs due to the thinner layers being used. 2) channel hole critical dimension (CD) variation becomes problematic because the additional mold stack height aggravates uniformity, thereby producing WL resistance variation. Consequently, read and program performance degradation is inevitable, furthermore their optimization becomes more challenging.

A 128 Gb 3b/cell V-NAND Flash Memory With 1 Gb/s I/O Rate

Most memory-chip manufacturers keep trying to supply cost-effective storage devices with high-performance characteristics such as shorter tPROG, lower power consumption and higher endurance. For many years, every effort has been made to shrink die size to lower cost and to improve performance. However, the previously used node-shrinking methodology is facing challenges due to increased cell-to-cell interference and patterning difficulties caused by decreasing dimension. To overcome these limitations, 3D-stacking technology has been developed. As a result of long and focused research in 3D stacking technology, we succeed in developing 128 Gb 3b/cell Vertical NAND with 32 stack WL layers for the first time, which is the smallest 128 Gb NAND Flash. The die size is 68.9 mm 2, program time is 700 us and I/O rate is 1 Gb/s.

7.2 A 128Gb 3b/cell V-NAND flash memory with 1Gb/s I/O rate

Most memory-chip manufacturers keep trying to supply cost-effective storage devices with high-performance characteristics such as smaller tPROG, lower power consumption and longer endurance. For many years, every effort has been made to shrink die size to lower cost and to improve performance. However, the previously used node-shrinking methodology is facing challenges due to increased cell-to-cell interference and patterning difficulties caused by decreasing dimension. To overcome these limitations, 3D-stacking technology has been developed. As a result of long and focused research in 3D stacking technology, 128Gb 2b/cell device with 24 stack WL layers was announced in 2014 [1].

11.4 A 512Gb 3b/cell 64-stacked WL 3D V-NAND flash memory

The advent of emerging technologies such as cloud computing, big data, the internet of things and mobile computing is producing a tremendous amount of data. In the era of big data, storage devices with versatile characteristics are required for ultra-fast processing, higher capacity storage, lower cost, and lower power operation. SSDs employing 3D NAND are a promising to meet these requirements. Since the introduction of 3D NAND technology to marketplace in 2014 [1], the memory array size has nearly doubled every year [2,3]. To continue scaling 3D NAND array density, it is essential to scale down vertically to minimize total mold height. However, vertical scaling results in critical problems such as increasing WL capacitance and non-uniformity of stacked WLs due to variation in the channel hole diameter. To tackle these issues, this work proposes schemes for programming speed improvement and power reduction, and on-chip processing algorithms for error correction.

256 Gb 3 b/Cell V-nand Flash Memory With 48 Stacked WL Layers

A 48 WL stacked 256-Gb V-NAND flash memory with a 3 b MLC technology is presented. Several vertical scale-down effects such as deteriorated WL loading and variations are discussed. To enhance performance, reverse read scheme and variable-pulse scheme are presented to cope with nonuniform WL characteristics. For improved performance, dual state machine architecture is proposed to achieve optimal timing for BL and WL, respectively. Also, to maintain robust IO driver strength against PVT variations, an embedded ZQ calibration technique with temperature compensation is introduced. The chip, fabricated in a third generation of V-NAND technology, achieved a density of 2.6 Gb/mm2 with 53.2 MB/s of program throughput.

PVT-invariant single-to-differential data converter with minimum skew and duty-ratio distortion

This paper proposes PVT-invariant single-to-differential signal converter (SDQ applicable to the output circuitry of high-speed DDR SDRAM. The proposed SDC generates PVT-invariant differential-output sampling clock using a phase interpolation technique and a symmetric structure, and improves the aperture window of output data in source synchronous DDR SDRAM. The proposed SDC was simulated using 1.8-V 80-nm DRAM technology. The comparison result indicates that the differential clocks generated by the proposed SDC achieve 80.6% reduction of skew, 76.6% reduction of duty-cycle distortion, 61.7% of reduction of delay variation, and 8.5% reduction of maximum current for a given process, voltage, and temperature (PVT) variations, as compared to conventional SDCs. The I/O interface of a source-synchronous DDR SDRAM designed using the proposed SDC, which is operating at 1.0-Gbps/pin data rate has aperture window increased by 15.3% and ISI improved by 67.7% in comparison to conventional I/O interface.

7.5 A 128Gb 2b/cell NAND flash memory in 14nm technology with tPROG=640µs and 800MB/s I/O rate

NAND flash memory is widely used as a cost-effective storage with high performance [1-2]. This paper presents a 128Gb multi-level cell (MLC) NAND flash memory with a 150 cells/string structure in 14nm CMOS that can be used as a cost-effective storage device. This paper also introduces several approaches to compensate for reliability and performance degradations caused by the 14nm transistors and the 150 cells/string structure. A technique was developed to suppress the background pattern dependency (BPD) by applying a low voltage to upper word lines (WLs) - the drain side(SSL side) WLs with respect to the location of the selected WL - during the verify sequence. Two techniques are also used to improve the program performance: equilibrium pulse scheme and smart start bias control scheme (SBC) in the MSB page. In addition, the first cycle recovery (FCR) of read enable (RE) and the bi-directional data strobe (DQS) is used to achieve a high speed I/O rate. As a result, a 640μs program time and a 800MB/s I/O rate is achieved.

A 1.2V 1.33Gb/s/pin 8Tb NAND flash memory multi-chip package employing F-chip for low power and high performance storage applications

A 1.2 V 1.33Gb/s/pin 8Tb NAND flash memory multi-chip package incorporating 16-die stacked 512-Gb NAND flash memories and F-Chip is presented. To meet the performance requirements of storage devices for higher capacity and faster data throughput, the 2nd generation F-Chip is developed. The F-Chip presents a dual bi-directional transceiver architecture including data retiming and training techniques to adaptively improve signal integrity. Besides, the F-Chip supports 1.2 V I/O for low power storage applications. This work, as a result, shows 33% improvement of eye-opening performances and 41% reduction of I/O power consumption compared to the previous generation.