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Dive into the research topics where E.G. van Putten is active.

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Featured researches published by E.G. van Putten.


Physical Review Letters | 2011

Scattering Lens Resolves Sub-100 nm Structures with Visible Light

E.G. van Putten; D. Akbulut; Jacopo Bertolotti; Willem L. Vos; Aart Lagendijk; Allard Mosk

The smallest structures that conventional lenses are able to optically resolve are of the order of 200 nm. We introduce a new type of lens that exploits multiple scattering of light to generate a scanning nanosized optical focus. With an experimental realization of this lens in gallium phosphide we imaged gold nanoparticles at 97 nm optical resolution. Our work is the first lens that provides a resolution better than 100 nm at visible wavelengths.


Optics Express | 2011

Focusing light through random photonic media by binary amplitude modulation

D. Akbulut; T.J. Huisman; E.G. van Putten; Willem L. Vos; Allard Mosk

We study the focusing of light through random photonic materials using wavefront shaping. We explore a novel approach namely binary amplitude modulation. To this end, the light incident to a random photonic medium is spatially divided into a number of segments. We identify the segments that give rise to fields that are out of phase with the total field at the intended focus and assign these a zero amplitude, whereas the remaining segments maintain their original amplitude. Using 812 independently controlled segments of light, we find the intensity at the target to be 75±6 times enhanced over the average intensity behind the sample. We experimentally demonstrate focusing of light through random photonic media using both an amplitude only mode liquid crystal spatial light modulator and a MEMS-based spatial light modulator. Our use of Micro Electro-Mechanical System (MEMS)-based digital micromirror devices for the control of the incident light field opens an avenue to high speed implementations of wavefront shaping.


Applied Optics | 2008

Spatial amplitude and phase modulation using commercial twisted nematic LCDs

E.G. van Putten; Ivo Micha Vellekoop; Allard Mosk

We present a method for full spatial phase and amplitude control of a laser beam using a twisted nematic LCD combined with a spatial filter. By spatial filtering we combine four neighboring pixels into one superpixel. At each superpixel we are able to independently modulate the phase and the amplitude of light. We experimentally demonstrate the independent phase and amplitude modulation using this novel technique. Our technique does not impose special requirements on the spatial light modulator and allows precise control of fields even with imperfect modulators.


Superconductor Science and Technology | 2005

Impact of spatial periodic bending and load cycling on the critical current of a Nb3Sn strand

Arend Nijhuis; N.C. van den Eijnden; Y. Ilyin; E.G. van Putten; G J T Veening; Wilhelm A.J. Wessel; A. den Ouden; H.H.J. ten Kate

Differences in the thermal contraction of the composite materials in a cable in conduit conductor (CICC) for the International Thermonuclear Experimental Reactor (ITER) in combination with electromagnetic charging cause significant axial, transverse and bending strains in the Nb3Sn layer. These high strain loads degrade the superconducting properties of a CICC. Here we report on the influence of periodic bending load, using different bending wavelengths from 5 to 10 mm on a Nb3Sn powder-in-tube processed strand. The strand axial tensile stress–strain curve, the critical current versus applied axial strain results, the influence of cyclic loading on the RRR and assessment of the current transfer length from AC loss measurements, required for the analysis, are presented as well. For the strand under investigation, we find an influence of bending strain on the Ic that corresponds well to the predictions obtained from the applied classical relations, distinguishing ultimate boundaries of high and low interfilament electrical resistance. The reduction versus applied bending strain is similar for all wavelengths and equivalent to the low transverse resistance model, which is consistent with the estimated current transfer length. The cyclic behaviour in terms of critical current and n-value involves a component representing a permanent reduction as well as a factor expressing reversible (elastic) behaviour as a function of the applied load. The results from the set-up enable a discrimination in performance reduction per specific load type and per strand type. In this paper, we discuss the results of the pure bending tests.


arXiv: Optics | 2015

Speckle correlation resolution enhancement of wide-field fluorescence imaging

H. Yilmaz; E.G. van Putten; Jacopo Bertolotti; Aart Lagendijk; Willem L. Vos; Allard Mosk

High-resolution fluorescence imaging is essential in nanoscience and biological sciences. Due to the diffraction limit, conventional imaging systems can only resolve structures larger than 200 nm. Here, we introduce a new fluorescence imaging method that enhances the resolution by using a high-index scattering medium as an imaging lens. Simultaneously, we achieve a wide field of view. We develop a new image reconstruction algorithm that converges even for complex object structures. We collect two-dimensional fluorescence images of a collection of 100 nm diameter dye-doped nanospheres, and demonstrate a deconvolved Abbe resolution of 116 nm with a field of view of 10 μm×10  μm . Our method is robust against optical aberrations and stage drifts, and therefore is well suited to image nanostructures with high resolution under ambient conditions.Hasan Yılmaz, Elbert G. van Putten, Jacopo Bertolotti, Ad Lagendijk, Willem L. Vos, and Allard P. Mosk Complex Photonic Systems (COPS), MESA+ Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands Present address: Philips Research Laboratories, 5656 AE Eindhoven, The Netherlands Present address: Physics and Astronomy Department, University of Exeter, Stocker Road, Exeter EX4 4QL, United Kingdom


Optics Letters | 2012

Nonimaging speckle interferometry for high-speed nanometer-scale position detection

E.G. van Putten; Aart Lagendijk; Allard Mosk

We experimentally demonstrate a nonimaging approach to displacement measurement for complex scattering materials. By spatially controlling the wavefront of the light that incidents on the material, we concentrate the scattered light in a focus on a designated position. This wavefront acts as a unique optical fingerprint that enables precise position detection of the illuminated material by simply measuring the intensity in the focus. By combining two fingerprints we demonstrate position detection along one in-plane dimension with a displacement resolution of 2.1 nm. As our approach does not require an image of the scattered field, it is possible to employ fast nonimaging detectors to enable high-speed position detection of scattering materials.


Proceedings of SPIE | 2015

Non-invasive imaging through opaque scattering layers

Jacopo Bertolotti; E.G. van Putten; Christian Blum; Aart Lagendijk; Willem L. Vos; Allard Mosk

Light scattering is known for blurring images to the point of making them appear as a white halo. For this reason imaging through thick clouds or deep into biological tissues is difficult. Here we discuss in details a method we developed recently to retrieve the shape of an object hidden behind a diffusing screen.


arXiv: Physics Education | 2006

Recognition of paper samples by correlation of their speckle patterns

F. van Beijnum; E.G. van Putten; K. L. van der Molen; Allard Mosk


Computational Optical Sensing and Imaging | 2013

Imaging through Scattering Media

Jacopo Bertolotti; E.G. van Putten; Christian Blum; Aart Lagendijk; Willem L. Vos; Allard Mosk


Archive | 2015

Compressive sensing and phase retrieval for high-resolution optical microscopy

H. Yilmaz; S.A. Goorden; Henri Thyrrestrup Nielsen; Lyubov Amitonova; E.G. van Putten; Jacopo Bertolotti; Aart Lagendijk; Willem L. Vos; Allard Mosk

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Allard Mosk

MESA+ Institute for Nanotechnology

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Willem L. Vos

MESA+ Institute for Nanotechnology

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D. Akbulut

MESA+ Institute for Nanotechnology

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H. Yilmaz

MESA+ Institute for Nanotechnology

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T.J. Huisman

MESA+ Institute for Nanotechnology

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Christian Blum

MESA+ Institute for Nanotechnology

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