Edward Amatucci
National Institute of Standards and Technology
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Publication
Featured researches published by Edward Amatucci.
Proceedings of SPIE, the International Society for Optical Engineering | 1999
John A. Kramar; Edward Amatucci; David E. Gilsinn; Jau-Shi Jay Jun; William B. Penzes; Fredric Scire; E. Clayton Teague; John S. Villarrubia
We at NIST are building a metrology instrument called the Molecular Measuring Machine (MMM) with the goal of performing 2D point-to-point measurements with one nanometer accuracy cover a 50 mm by 50 mm area. The instrument combines a scanning tunneling microscope (STM) to probe the surface and a Michelson interferometer system to measure the probe movement, both with sub-nanometer resolution. The instrument also feature millidegree temperature control at 20 degrees C, an ultra-high vacuum environment with a base pressure below 10-5 Pa, and seismic and acoustic vibration isolation. High-accuracy pitch measurements have been performed on 1D gratings. In one experiment, the MMM STM probe imaged an array of laser-focused, atomically deposited chromium lines over an entire 5 micrometers by 1 mm area. Analysis of the data yielded an average line spacing of 212.69 nm with a 5 pm standard uncertainty. The uncertainty estimate is derived for an analysis of the sources of uncertainty for a 1 mm point-to-point measurement, including the effects of alignment, Abbe offset, motion cross-coupling, and temperature variations. In another measurement, the STM probe continuously tracked a holographically-produced grating surface for 10 mm, counting out 49,996 lines and measuring an average line spacing of 200.011 nm with a 5 pm standard uncertainty.
Nano Tribology Workshop | 2003
Edward Amatucci; Nicholas G. Dagalakis; Bradley N. Damazo; Matthew A. Davies; John Evans; John Song; Clayton Teague; Theodore V. Vorburger
The future of nano-, micro- and meso-scale manufacturing operations will be strongly influenced by a new breed of assembly and manufacturing tools that will be intelligent, flexible, more precise, include in-process production technologies and make use of advanced part design, assembly and process data. To prioritized NIST efforts in nano, micro and meso manufacturing, several visits to industrial and government research laboratories and two workshops were organized. The identified needs at the meso and micro Scale include: dimensional and mechanical metrology, assembly and packaging technology and standards, and providing a science base for materials and processes emphasizing materials testing methods and properties data. Nanocharacterization, nanomanipulation, nanodevices and magnetics industry support have been identified at the nanoscale. Nanometrology and nanomanipulation have a substantial base from which to expand within the Manufacturing Engineering Laboratory (MEL). Therefore, MEL is initiating a new long-term Strategic Program in nano-manufacturing to conduct research and development, to provide the measurements and standards needed by industry to measure, manipulate and manufacture nanoscale discrete part products. The program will address the measurement and standards issues associated with the manufacture of both nanoscale products themselves, as well as with the development of the production systems required for their manufacture.
Archive | 2000
Nicholas G. Dagalakis; Edward Amatucci
Proceedings of the American Society for Precision Engineering | 2001
Nicholas G. Dagalakis; Edward Amatucci
Deneb International Simulation Conference and Technology Showcase | 1997
Edward Amatucci; Roger V. Bostelman; Nicholas G. Dagalakis; Terence Tsai
Archive | 2003
Edward Amatucci; Frederic E. Scire; Lowell P. Howard; Nicholas G. Dagalakis; Jason Marcinkoski; John A. Kramer
Proceedings of the American Society for Precision Engineering | 2001
Nicholas G. Dagalakis; John A. Kramar; Edward Amatucci; Robert Bunch
ASPE--American Society for Precision Engineering | 2000
Edward Amatucci; Nicholas G. Dagalakis; John A. Kramar; Fredric Scire
MicroElectroMechanical Systems | 2002
Edward Amatucci; Nicholas G. Dagalakis
MEMS Technologies in Special Topics: Optics and Reliability | 2002
Nicholas G. Dagalakis; Edward Amatucci