Edward S. Bielejec

An integrated diamond nanophotonics platform for quantum-optical networks

Efficient interfaces between photons and quantum emitters form the basis for quantum networks and enable nonlinear optical devices operating at the single-photon level. We demonstrate an integrated platform for scalable quantum nanophotonics based on silicon-vacancy (SiV) color centers coupled to nanoscale diamond devices. By placing SiV centers inside diamond photonic crystal cavities, we realize a quantum-optical switch controlled by a single color center. We control the switch using SiV metastable orbital states and verify optical switching at the single-photon level by using photon correlation measurements. We use Raman transitions to realize a single-photon source with a tunable frequency and bandwidth in a diamond waveguide. Finally, we create entanglement between two SiV centers by detecting indistinguishable Raman photons emitted into a single waveguide. Entanglement is verified using a novel superradiant feature observed in photon correlation measurements, paving the way for the realization of quantum networks.Integrated quantum nanophotonics Technologies that exploit the rules of quantum mechanics offer a potential advantage over classical devices in terms of sensitivity. Sipahigil et al. combined the quantum optical features of silicon-vacancy color centers with diamond-based photonic cavities to form a platform for integrated quantum nanophotonics (see the Perspective by Hanson). They could thus generate single photons from the color centers, optically switch light in the cavity by addressing the state of the color center, and quantum-mechanically entangle two color centers positioned in the cavity. The work presents a viable route to develop an integrated platform for quantum networks. Science, this issue p. 847; see also p. 835 An integrated quantum optical platform is demonstrated using silicon vacancy color centers and diamond photonics. Efficient interfaces between photons and quantum emitters form the basis for quantum networks and enable optical nonlinearities at the single-photon level. We demonstrate an integrated platform for scalable quantum nanophotonics based on silicon-vacancy (SiV) color centers coupled to diamond nanodevices. By placing SiV centers inside diamond photonic crystal cavities, we realize a quantum-optical switch controlled by a single color center. We control the switch using SiV metastable states and observe optical switching at the single-photon level. Raman transitions are used to realize a single-photon source with a tunable frequency and bandwidth in a diamond waveguide. By measuring intensity correlations of indistinguishable Raman photons emitted into a single waveguide, we observe a quantum interference effect resulting from the superradiant emission of two entangled SiV centers.

Initial Assessment of the Effects of Radiation on the Electrical Characteristics of

Radiation-induced effects on the electrical characteristics of TaOx memristive (or redox) memory are experimentally assessed. 10 keV x-ray irradiation is observed to cause switching of the memristors from high to low resistance states, as well as functional failure due to cumulative dose. Gamma rays and 4.5 MeV energy protons are not observed to cause significant change in resistance state or device function at levels up to 2.5 Mrad(Si) and 5 Mrad(Si) protons, respectively. 105 MeV and 480 MeV protons cause switching of the memristors from high to low resistance states in some cases, but do not exhibit a consistent degradation. 800 keV silicon ions are observed to cause resistance degradation, with an inverse dependence of resistance on oxygen vacancy density. Variation between different devices appears to be a key factor in determining the electrical response resulting from irradiation. The proposed degradation mechanism likely involves the creation of oxygen vacancies, but a better fundamental understanding of switching is needed before a definitive understanding of radiation degradation can be achieved.

{\rm TaO}_{\rm x}

We have exposed silicon bipolar transistors to fast neutrons and characterized the properties of the resulting defects using capacitance-based spectroscopy of the n-type collector. We have performed low-temperature electron capture measurement of the divacancy (=/−) and vacancy-oxygen (−/0) defects after the samples were annealed from 350–500 K. We show from a simple rate equation analysis that one can define an unambiguous test for cluster-induced reductions of defect level occupation due to slow capture. This allows easy identification of deep level transient spectroscopy (DLTS) levels where the capture is inhibited due to band bending. Our measurements show extremely long, temperature-dependent capture times for the doubly charged state of the divacancy. We have modeled the capture dynamics as a function of annealing using a simple electrostatic band-bending approach coupled with a realistic simulation of the cluster size and shape distribution as estimated from computer simulation of the damage cascad...

Memristive Memories

Two deep level transient spectroscopy (DLTS) electron emission signatures, previously labeled E4 and E5, have been shown to be bistable with respect to minority carrier injection at room temperature. These result from two charge state transitions of the same defect. We have performed DLTS measurements as function of annealing between 350 and 680 K, using minority carrier injection after each annealing stage to make E4 and E5 visible. We show that the E4–E5 pair is associated with defect clusters which dominate after neutron or ion damage with annealing characteristics that closely parallel to those of silicon divacancies found in damage clusters. At annealing temperatures above 500 K, the E4–E5 pair ceases to be bistable and exists after anneals in thermal equilibrium. We show that the stable E4 peak appears to be the same emission signature previously labeled the L center. The transformation of the E4–E5 bistable pair into the stable L center and a stable E5 companion level occurs at the same temperature...

Effects of clustering on the properties of defects in neutron irradiated silicon

Using deep level transient spectroscopy, the authors have measured the defect spectrum in the collector of a n-p-n bipolar transistor following fast neutron irradiation as well as the gain on the same device. They show that a slow change observed in both the gain and deep level traps in the n-type collector at 300K are bistable. The transistor gain and the defects can be returned to the postirradiation condition by forward bias at room temperature, i.e., by operating the transistor (gain) or injection through the base-collector diode (defect spectrum).

A bistable divacancylike defect in silicon damage cascades

The controlled creation of defect centre—nanocavity systems is one of the outstanding challenges for efficiently interfacing spin quantum memories with photons for photon-based entanglement operations in a quantum network. Here we demonstrate direct, maskless creation of atom-like single silicon vacancy (SiV) centres in diamond nanostructures via focused ion beam implantation with ∼32 nm lateral precision and <50 nm positioning accuracy relative to a nanocavity. We determine the Si+ ion to SiV centre conversion yield to be ∼2.5% and observe a 10-fold conversion yield increase by additional electron irradiation. Low-temperature spectroscopy reveals inhomogeneously broadened ensemble emission linewidths of ∼51 GHz and close to lifetime-limited single-emitter transition linewidths down to 126±13 MHz corresponding to ∼1.4 times the natural linewidth. This method for the targeted generation of nearly transform-limited quantum emitters should facilitate the development of scalable solid-state quantum information processors.

Defect-driven gain bistability in neutron damaged, silicon bipolar transistors

Results of displacement damage correlation between neutrons, light ions and heavy ions in bipolar junction transistors are presented. Inverse gain degradation as the function of fluence was measured. The inverse gain degradation due to heavy ion irradiation followed the Messenger-Spratt equation, while some deviation was found for light ions

Scalable focused ion beam creation of nearly lifetime-limited single quantum emitters in diamond nanostructures

We report on the fabrication and performance of a novel single ion Geiger mode avalanche (SIGMA) diode detector that senses single ions with ∼100% detection efficiency at room temperature for 250 keV protons. The SIGMA diode detector utilizes Geiger mode operation of avalanche photodiodes, which can be sensitive to single electron-hole (e-h) pairs induced by the ion stopping. The SIGMA diode detector takes advantage of a complementary metal oxide semiconductor foundry allowing for future integration with silicon nanostructures to build novel single atom modified devices. SIGMA diode detector offers potential improvement in current integrated ion detector approaches that have noise floors in the order of 103 e-h pairs.

Damage Equivalence of Heavy Ions in Silicon Bipolar Junction Transistors

We report low-dimensional tunneling in an independently contacted vertically coupled quantum wire system. This nanostructure is fabricated in a high quality GaAs∕AlGaAs parallel double quantum well heterostructure. Using a unique flip chip technique to align top and bottom split gates to form low-dimensional constrictions in each of the independently contacted quantum wells we explicitly control the subband occupation of the individual wires. In addition to the expected two-dimensional (2D)-2D tunneling results, we have found additional tunneling features that are related to the one-dimensional quantum wires.

Room temperature single ion detection with Geiger mode avalanche diode detectors

The effects of radiation on memristors created using tantalum oxide and titanium oxide are compared. Both technologies show changes in resistance when exposed to 800 keV Ta ion irradiation at fluences above 1010 cm-2. TaOx memristors show a gradual reduction in resistance at high fluences whereas TiO2 memristors show gradual increases in resistance with inconsistent decreases. After irradiation TaOx devices remain fully functional and can even recover resistance with repeated switching. TiO2 devices are more variable and exhibit significant increases and decreases in resistance when switching after irradiation. Irradiation with 28 MeV Si ions causes both technologies to switch from the off-state to the on-state when ionizing doses on the order of 60 Mrad(Si) or greater (as calculated by SRIM) are reached without applying current or voltage to the part. Irradiation with 10 keV X-rays up to doses of 18 Mrad(Si) in a single step show little effect on either technology. TaOx and TiO2 memristors both show high tolerance for displacement damage and ionization damage and are promising candidates for future radiation-hardened non-volatile memory applications.