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Featured researches published by Eizo Fukami.


ieee international magnetics conference | 2000

Low-resistance tunnel magnetoresistive head

Keishi Ohashi; Kazuhiko Hayashi; Kiyokazu Nagahara; Kunihiko Ishihara; Eizo Fukami; Junichi Fujikata; Shigeru Mori; Masafumi Nakada; Tsutomu Mitsuzuka; K. Matsuda; H. Mori; Atsushi Kamijo; Hisanao Tsuge

A tunnel magnetoresistive (TMR) head with a low resistance of about 30 /spl Omega/ and effective track width of 1.4 /spl mu/m was fabricated using an in situ natural oxidation (ISNO) technique. Its read-output was almost the same as that expected from test elements at the wafer level. We found no large difference in noise voltages between TMR head and GMR head when their resistance was about 30 /spl Omega/. A very low-resistivity TMR element with a resistance-area product of 14 /spl Omega//spl middot//spl mu/m/sup 2/ and a fairly high /spl Delta/R/R of 14% was also developed using ISNO. A signal-to-noise ratio consideration suggests that such low resistance is a key to TMR heads for high recording densities.


IEEE Transactions on Magnetics | 2001

Read performance of tunneling magnetoresistive heads

Kunihiko Ishihara; Masafumi Nakada; Eizo Fukami; Kiyokazu Nagahara; Hiroaki Honjo; Keishi Ohashi

We discuss the read performance, including the off-track performance and noise characteristics, of TMR heads. A vortex-like sense current field in TMR heads creates insensitive zones in the free layer and affects the output voltage and effective read width. The 1/f noise in the MHz-order frequency range was observed. To achieve a low-noise TMR head for high-density recording with small junction area, a high-quality thin barrier is a key to obtaining low 1/f noise, as well as small R/spl middot/A products to reduce the shot noise.


Archive | 2000

Magnetic head with a tunnel junction including metallic material sandwiched between one of an oxide and a nitride of the metallic material

Kazuhiko Hayashi; Keishi Ohashi; Nobuyuki Ishiwata; Masafumi Nakada; Eizo Fukami; Kiyokazu Nagahara; Hiroaki Honjou; Shinsaku Saitoh


Archive | 2000

Magnetoresistive head having ferromagnetic tunnel junction film with a smaller resistance at a terminal portion than a central portion, magnetic resistance detection system with the magnetoresistive head and a magnetic storage system using it

Kazuhiko Hayashi; Masafumi Nakada; Eizo Fukami; Kiyokazu Nagahara; Hiroaki Honjou; Kunihiko Ishihara; Tamaki Toba; Hisanao Tsuge; Atsushi Kamijo


Archive | 2000

Magnetoresistance effect head, its manufacture effect head, and magnetic recording apparatus using the magnetoresistance

Junichi Fujikata; Eizo Fukami; Kazuhiko Hayashi; Hiroaki Honjo; Kunihiko Ishihara; Nobuyuki Ishiwata; Atsushi Kamijo; Shigeru Mori; Kiyokazu Nagahara; Masabumi Nakada; Hiroyuki Ohashi; Shinsaku Saito; Hisanao Tsuge; 敦 上條; 正文 中田; 啓之 大橋; 信作 斉藤; 弘明 本庄; 一彦 林; 久尚 柘植; 聖万 永原; 栄三 深見; 邦彦 石原; 延行 石綿; 潤一 藤方


Archive | 2003

Magnetoresistive effect element, magneto-resistive effect head, method for manufacturing the same and magnetic recording apparatus using the same

Kazuhiko Hayashi; Keishi Ohashi; Nobuyuki Ishiwata; Masafumi Nakada; Eizo Fukami; Kiyokazu Nagahara; Hiroaki Honjou; Shinsaku Saitoh


Archive | 2001

Magnetoresistive effect sensor with barrier layer smoothed by composition of lower shield layer

Kazuhiko Hayashi; Keishi Ohashi; Nobuyuki Ishiwata; Masafumi Nakada; Eizo Fukami; Kiyokazu Nagahara; Hiroaki Honjo; Junichi Fujikata; Kunihiko Ishihara; Shigeru Mori


Archive | 2001

Magnetoresistive effect sensor, method for manufacturing a magnetoresistive effect sensor, magnetoresistive detection system, and magnetoresistive recording system

Kazuhiko Hayashi; Keishi Ohashi; Nobuyuki Ishiwata; Masafumi Nakada; Eizo Fukami; Kiyokazu Nagahara; Hiroaki Honjo; Junichi Fujikata; Kunihiko Ishihara; Shigeru Mori


Archive | 2000

Magnetoresistive head production method

Kazuhiko Hayashi; Keishi Ohashi; Nobuyuki Ishiwata; Masafumi Nakada; Eizo Fukami; Kiyokazu Nagahara; Hiroaki Honjo; Shinsaku Saitoh


Archive | 2000

Magnetoresistance element, with lower electrode anti-erosion/flaking layer

Kazuhiko Hayashi; Keishi Ohashi; Nobuyuki Ishiwata; Masafumi Nakada; Eizo Fukami; Hiroaki Honjo; Hisanao Tsuge; Atsushi Kamijo

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