Ekishu Nagae

Scatterless SiO 2 /Nb 2 O 5 multi-layered UV-IR cut filter prepared by RAS system

Scatterless SiO2/Nb2O5 multi-layered UV-IR cut filters can be prepared by biased RAS (Radical Assisted Sputtering) system.

Scatterless SiO 2 /TiO 2 multi-layered thick UV-IR cut filter prepared by EPD system

Scatterless SiO2/TiO2 multi-layered thick UV-IR cut filter can be prepared by the new IAD method called EPD (Effective Physical vapor Deposition).

RAS Bias Voltage Coating

In SiO2 bias voltage coating, it was suggested that densification of SiO2 occurred at high bias power. This technique shows promise for the application of electric devices such as surface acoustic wave (SAW) filter.

High-rate AR Coating for Plastic Substrate by EPD

These results indicate that EPD is the most relevant technique for AR coating on the plastic substrates and applicable to industrial production.