Fengrui Wang

Effects of γ-ray irradiation on optical absorption and laser damage performance of KDP crystals containing arsenic impurities

The effects of γ-irradiation on potassium dihydrogen phosphate crystals containing arsenic impurities are investigated with different optical diagnostics, including UV-VIS absorption spectroscopy, photo-thermal common-path interferometer and photoluminescence spectroscopy. The optical absorption spectra indicate that a new broad absorption band near 260 nm appears after γ-irradiation. It is found that the intensity of absorption band increases with the increasing irradiation dose and arsenic impurity concentration. The simulation of radiation defects show that this absorption is assigned to the formation of AsO₄⁴⁻ centers due to arsenic ions substituting for phosphorus ions. Laser-induced damage threshold test is conducted by using 355 nm nanosecond laser pulses. The correlations between arsenic impurity concentration and laser induced damage threshold are presented. The results indicate that the damage performance of the material decreases with the increasing arsenic impurity concentration. Possible mechanisms of the irradiation-induced defects formation under γ-irradiation of KDP crystals are discussed.

Influence of subsurface defects on damage performance of fused silica in ultraviolet laser

Abstract. In ultraviolet pulse laser, damage performance of fused silica optics is directly dependent on the absorptive impurities and scratches in subsurface, which are induced by mechanical polishing. In the research about influence of subsurface defects on damage performance, a series of fused silica surfaces with various impurity concentrations and scratch structures were created by hydrofluoric (HF) acid solution etching. Time of Flight secondary ion mass spectrometry and scanning probe microprobe revealed that with increasing etching depth, impurity concentrations in subsurface layers are decreased, the scratch structures become smoother and the diameter:depth ratio is increased. Damage performance test with 355-nm pulse laser showed that when 600 nm subsurface thickness is removed by HF acid etching, laser-induced damage threshold of fused silica is raised by 40 percent and damage density is decreased by over one order of magnitude. Laser weak absorption was tested to explain the cause of impurity elements impacting damage performance, field enhancement caused by change of scratch structures was calculated by finite difference time domain simulation, and the calculated results are in accord with the damage test results.

Laser-Induced Point Defects in Fused Silica Irradiated by UV Laser in Vacuum

High-purity fused silica irradiated by third harmonic of the Nd:YAG laser in vacuum with different laser pulse parameters was studied experimentally. Laser-induced defects are investigated by UV spectroscopy, and fluorescence spectra and correlated to the structural modifications in the glass matrix through Raman spectroscopy. Results show that, for laser fluence below laser-induced damage threshold (LIDT), the absorbance and intensity of fluorescence bands increase with laser energies and/or number of laser pulses, which indicates that laser-induced defects are enhanced by laser energies and/or number of laser pulses in vacuum. The optical properties of these point defects were discussed in detail.

Effect of UV Laser Conditioning on the Structure of KDP Crystal

Multiparametric raster scanning experiments for KDP crystals are carried out to study the laser conditioning efficiency as a function of laser fluence, fluence step, and pulse sequence by using ultraviolet (UV) laser irradiation with pulse duration of approximately 7 ns. It indicates that damage resistance of KDP can be enhanced after conditioning process. And laser conditioning efficiency depends on the maximal fluence which is below the damage threshold. Raman spectra and photothermal absorption have also been studied on KDP crystals before and after multiparametric laser conditioning. Photothermal absorption data reveal that absorbance of conditioned KDP crystal decreases with the increase of laser fluence and the damage threshold of low absorption area is higher. Raman analysis reveals that the effectiveness of laser conditioning relies mainly on the individual mode of PO4 molecule.

The effect of RIE-modified surface contamination on opticalperformance of fused silica

A series of fused silica surface have been created by reaction ion etching to determine the effect of the contamination level on surface state and optical performance of the optics. The results show that both impurity elements contamination and scratches of fused silica surface can be removed dramatically during RIE process. The laser induced damage threshold is raised by 37.6% when the polishing layer is removed for a thickness of 6μm, and the laser weak absorption doesn’t increase obviously. The results can provide technique support for improving laser induced damage performance of fused silica.

Influence of bulk defects on bulk damage performance of fused silica optics at 355 nm nanosecond pulse laser

We demonstrate the effects of typical bulk defects in fused silica on the bulk damage threshold under nanosecond UV pulse in this study. A new test method is proposed to accurately evaluate laser induced bulk damage performance. The bulk bubble, hydroxyl, metal impurity, and weak absorption of the 355 nm laser are respectively characterized. The effects of bulk defects on bulk damage performance are analyzed statistically based on the correlation principle. For synthetic fused silica, metal impurities and hydroxyl have a weak correlation coefficient with the bulk damage threshold, while there is strong correlation between weak UV absorption and the bulk damage threshold. The influence of bulk damage threshold on surface damage performance is also discussed.

Photoluminescence defects on subsurface layer of fused silica and its effects on laser damage performance

Subsurface defects of polished fused silica optics are responsible for igniting laser damage in high power laser system. A non destructive measurement technique is developed to detect subsurface photoluminescence defects of fused silica. The fused silica samples polished by different vendors are applied to characterization of subsurface defects and measurement of damage performance. Subsurface photoluminescence defects of fused silica are evaluated by confocal fluorescence microscopy system. Laser induced damage threshold and damage density are measured by 355 nm nanosecond pulse laser. The results show a great differential subsurface quality of fused silica samples. Laser induced damage performance has a good correlation with subsurface defects. This paper shows a new non destructive measurement technique to detect photoluminescence defects on the subsurface layer of polished fused silica. It is very valuable to increasing laser damage performance and improving production-manufacturing engineering of optics.

Plasma-Induced, Self-Masking, One-Step Approach to an Ultrabroadband Antireflective and Superhydrophilic Subwavelength Nanostructured Fused Silica Surface

In this work, antireflective and superhydrophilic subwavelength nanostructured fused silica surfaces have been created by one-step, self-masking reactive ion etching (RIE). Bare fused silica substrates with no mask were placed in a RIE vacuum chamber, and then nanoscale fluorocarbon masks and subwavelength nanostructures (SWSs) automatically formed on these substrate after the appropriate RIE plasma process. The mechanism of plasma-induced self-masking SWS has been proposed in this paper. Plasma parameter effects on the morphology of SWS have been investigated to achieve perfect nanocone-like SWS for excellent antireflection, including process time, reactive gas, and pressure of the chamber. Optical properties, i.e., antireflection and optical scattering, were simulated by the finite difference time domain (FDTD) method. Calculated data agree well with the experiment results. The optimized SWS show ultrabroadband antireflective property (up to 99% from 500 to 1360 nm). An excellent improvement of transmission was achieved for the deep-ultraviolet (DUV) range. The proposed low-cost, highly efficient, and maskless method was applied to achieve ultrabroadband antireflective and superhydrophilic SWSs on a 100 mm optical window, which promises great potential for applications in the automotive industry, goggles, and optical devices.

Non-destructive evaluation of UV pulse laser-induced damage performance of fused silica optics

The surface laser damage performance of fused silica optics is related to the distribution of surface defects. In this study, we used chemical etching assisted by ultrasound and magnetorheological finishing to modify defect distribution in a fused silica surface, resulting in fused silica samples with different laser damage performance. Non-destructive test methods such as UV laser-induced fluorescence imaging and photo-thermal deflection were used to characterize the surface defects that contribute to the absorption of UV laser radiation. Our results indicate that the two methods can quantitatively distinguish differences in the distribution of absorptive defects in fused silica samples subjected to different post-processing steps. The percentage of fluorescence defects and the weak absorption coefficient were strongly related to the damage threshold and damage density of fused silica optics, as confirmed by the correlation curves built from statistical analysis of experimental data. The results show that non-destructive evaluation methods such as laser-induced fluorescence and photo-thermal absorption can be effectively applied to estimate the damage performance of fused silica optics at 351 nm pulse laser radiation. This indirect evaluation method is effective for laser damage performance assessment of fused silica optics prior to utilization.

Monolayer Colloidal Crystals by Modified Air-Water Interface Self-Assembly Approach

Hexagonally ordered arrays of polystyrene (PS) microspheres were prepared by a modified air-water self-assembly method. A detailed analysis of the air-water interface self-assembly process was conducted. Several parameters affect the quality of the monolayer colloidal crystals, i.e., the colloidal microsphere concentration on the latex, the surfactant concentration, the polystyrene microsphere diameter, the microsphere polydispersity, and the degree of sphericity of polystyrene microspheres. An abrupt change in surface tension was used to improve the quality of the monolayer colloidal crystal. Three typical microstructures, i.e., a cone, a pillar, and a binary structure were prepared by reactive-ion etching using a high-quality colloidal crystal mask. This study provides insight into the production of microsphere templates with flexible structures for large-area patterned materials.