G.K. Vinogradov

2–10 nm scale plasma polymerized organic films

Ultrathin organic films can be used in electronics for several applications. There are a few ways of preparation of such films and one is plasma polymerization. Traditionally, comparatively thick films, 100–1000 nm, are deposited by this method and studied. But, for electronic devices, 10 nm or thinner films are of great importance to any wet technique considered to be unsuitable for perfect layer formation. In this work we have deposited 2–10 nm scale ultrathin hydrocarbon films on silicon wafers. A capacitively coupled rf discharge was initiated in a short residence time box‐type reactor in a uniform flow of an acetylene/argon mixture. The gas kinetic residence time in the plasma zone was limited to 5–70 ms to decrease synthesis of heavy gas phase products and to suppress particulate formation. Distribution of film thickness after the deposition was measured by an ellipsometer. The film surface topography was studied by an atomic force microscope that shows the films are smooth and pinhole free. Thus ou...

Balanced Inductive Plasma Sources

An approach is proposed for the design of powerful inductive sources with internally compensated anti-phase RF capacitive currents. It is shown that the total internal balance of both capacitive currents and RF magnetic field exist in a full wave helical resonator source. The new plasma source exhibits peculiar plasma phenomena having a clear physical interpretation.

Plasma polymerized acetylene thin film by pulsed discharge

Abstract Plasma polymerization of acetylene was performed by using a pulsed rf discharge. Capacitively coupled discharge was initiated in a box type reactor at a uniform flow of an acetylene/argon mixture gas. A 2–10 nm scale ultrathin hydrocarbon film was deposited on a silicon wafer. The distribution of thickness was measured by an eliipsometer. The thickness increased nonlinearly with distance from the monomer inlet. This means that secondary gas phase products took part in the film formation.

Patterning of 2 -10 Nanometer-Scale Plasma-Polymerized Organic Films by Atomic Force Microscope

Ultrathin films of 2–10 nm thickness were deposited by pulsed discharge plasma polymerization. The film surface topography was studied by an atomic force microscope (AFM), which showed that the films are smooth and pinhole-free. The AFM was used to produce nanometer-scale indentations/holes in these deposited ultrathin organic films. The patterning process is governed by several factors: mechanical and Coulomb forces, heat effects, material transfer, and electric charge deposition depending on the conditions. The patterning results indicate the AFM can be used for the formation of nanometer-scale structures.

Atomic force microscope patterning on plasma deposited polyacetylene film

Nanometer‐thick hydrocarbon films were plasma polymerized in a rf pulse discharge in an acetylene/argon mixture and were mechanically patterned by the AFM (atomic force microscope). In addition a dc bias voltage was applied to the gold coated Si3N4 AFM tip. Depending on the experimental conditions, different patterns have been observed: mechanical indentation, electric charge, and material deposition. The viscous properties of the plasma deposited film affects the movement of the AFM tip while it is scanning the surface in a contact mode, and also affects the size and shape of the patterned area. Spikes of about 25–72 nm height and 60–200 nm width were formed from gold transferred from the newly mounted gold coated tips. The mechanism of gold deposition could be assigned to the Joule heating of the tip, resulting from the electric breakdown of underlying dielectric layers.

Synthesis and patterning of 2 to 10-nm pinhole-free organic films

Ultrathin films in the thickness range of 2-10 nm were deposited by plasma polymerization. An AFM (atomic force microscope) was used to evaluate the film surface uniformity. The measured surface roughness of these films is of the order of 0.1 to 0.3 nm. It suggests that uniformly smooth, pinhole free ultra thin film organic films suitable for electronic applications can be deposited by plasma polymerization. The deposited films were tested for nanometer scale patterning using an atomic force microscope. Process of contact electrification was used to deposit local electric charge on these surface enhanced reactions with some adsorbates thus creating patterns.