G. Mohan Rao

dc reactive magnetron sputtering of titanium‐structural and optical characterization of TiO2 films

This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variation in cathode potential as a function of oxygen partial pressure has been explained in terms of cathode poisoning effects. The titania films deposited during this process have been studied for their structural and optical characteristics. The effect of substrate temperature (from 25 to 400 °C) and annealing (from 250 to 700 °C) on the packing density, refractive index, extinction coefficient, and crystallinity has been investigated. The refractive index varied from 2.24 to 2.46 and extinction coefficient from 2.6 × 10−3 to 10.4× 10−3 at 500 nm as the substrate temperature increased from 25 to 400 °C. The refractive index increased from 2.19 to 2.35 and extinction coefficient changed from 3.2× 10−3 to 11.6 × 10−3 at 500 nm as the annealing temperature was increased from 250 to 700 °C. Anatase and rutile phases have been observed in the films deposited at 400 °C substrate temperature and annealed at 300 °C. ...

Characteristics of indium tin oxide films deposited by bias magnetron sputtering

Indium tin oxide coatings have been deposited on glass substrates with substrate bias as a process parameter along with substrate temperature. It was found that films deposited with substrate heating and/or substrate bias were polycrystalline in nature and predominantly (400) oriented. The results are correlated to microstructural variation due to the process parameters. Films with lowest sheet resistance, 7.6 ohm/sq and electron concentration of

SnO2 nanowire anchored graphene nanosheet matrix for the superior performance of Li-ion thin film battery anode

8.1 \times10^{21}\hspace{2mm}cm^{-3}

Studies on glow‐discharge characteristics during dc reactive magnetron sputtering

have been achieved in case of films deposited at

Field emission current saturation of aligned carbon nanotube—Effect of density and aspect ratio

370^o\hspace{2mm}C

Effects of O vacancies and C doping on dielectric properties of ZrO2: A first-principles study

with a substrate bias of + 18 V

Electron cyclotron resonance plasma source for ion assisted deposition of thin films

All solid state batteries are essential candidate for miniaturizing the portable electronics devices. Thin film batteries are constructed by layer by layer deposition of electrode materials by physical vapour deposition method. We propose a promising novel method and unique architecture, in which highly porous graphene sheet embedded with SnO2 nanowire could be employed as the anode electrode in lithium ion thin film battery. The vertically standing graphene flakes were synthesized by microwave plasma CVD and SnO2 nanowires based on a vapour–liquid–solid (VLS) mechanism via thermal evaporation at low synthesis temperature (620 °C). The graphene sheet/SnO2 nanowire composite electrode demonstrated stable cycling behaviours and delivered a initial high specific discharge capacity of 1335 mAh g−1 and 900 mAh g−1 after the 50th cycle. Furthermore, the SnO2 nanowire electrode displayed superior rate capabilities with various current densities.

Transport of sputtered atoms in facing targets sputtering geometry: A numerical simulation study

The process of reactive sputtering is influenced by reactive gas pressure and the rate of sputtering because the glow-discharge characteristics vary considerably in the presenceof reactive gas. The discharge characteristics during magnetron sputtering of copper in an argon and oxygen atmosphere have been investigated in the present study. The variation in the cathode potentials has been explained in terms of negative ion formation and target poisoning effects. It has been found that the rate of deposition and the oxygen partialpressure influence target poisoning, which in turn influences the discharge characteristics and rate of deposition. The properties of films deposited under different conditions have been correlated with the discharge characteristics and target poisoning.

Preparation and characterization of TiN films by electron cyclotron resonance (ECR) sputtering for diffusion barrier applications

The investigation of field emission (FE) properties of carbon nanotube film reveals a strong dependency on the density and its aspect ratio. Nonlinearity in the Fowler-Nordheim (F-N) plot has been explained in terms of change in work function of carbon due to heating during FE. A characteristic knee in the F-N plot, separates the linear region from the nonlinear region. I-knee value turns out to be a basic parameter to define the FE process. It has been shown that an optimum density and length of the nanotubes have high efficiency of field emission. An explanation has been given for the phenomena responsible for efficient field emission in short nanotubes.

Plasma diagnostics of the high pressure oxygen-sputtering process

The authors determine electronic properties, structural stability, and dielectric response of zirconia (ZrO2) with oxygen vacancies (O vacancies) and carbon doping (C doping) using first-principles density functional theory calculations based on pseudopotentials and a plane wave basis. They find significantly enhanced static dielectric response in zirconia with oxygen vacancies arising from a softened phonon mode. They also find that effects of carbon doping on the dielectric response are anisotropic.