Gian-Franco Dalla Betta

A CMOS 3-D Imager Based on Single Photon Avalanche Diode

A 64-pixel linear array aimed at 3-D vision applications is implemented in a high-voltage 0.8 mum CMOS technology. The detection of the incident light signals is performed using photodiodes biased above breakdown voltage so that an extremely high sensitivity can be achieved exploiting the intrinsic multiplication effect of the avalanche phenomenon. Each 38times180-mum2 pixel includes, besides the single photon avalanche diode, a dedicated read-out circuit for the arrival-time estimation of incident light pulses. To increase the distance measurement resolution a multiple pulse measurement is used, extracting the mean value of the light pulse arrival-time directly in each pixel; this innovative approach dramatically reduces the dead-time of the pixel read-out, allowing a high frame rate imaging to be achieved. The sensor array provides a range map from 2 m to 5 m with a precision better than plusmn0.75% without any external averaging operation. Moreover, with the same chip, we have explored for the first time the implementation of an indirect time-of-flight measurement by operating the proposed active pixel in the photon counting mode

A hybrid CMOS-imager with a solution-processable polymer as photoactive layer

The solution-processability of organic photodetectors allows a straightforward combination with other materials, including inorganic ones, without increasing cost and process complexity significantly compared with conventional crystalline semiconductors. Although the optoelectronic performance of these organic devices does not outmatch their inorganic counterparts, there are certain applications exploiting the benefit of the solution-processability. Here we demonstrate that the small pixel fill factor of present complementary metal oxide semiconductor-imagers, decreasing the light sensitivity, can be increased up to 100% by replacing silicon photodiodes with an organic photoactive layer deposited with a simple low-cost spray-coating process. By performing a full optoelectronic characterization on this first solution-processable hybrid complementary metal oxide semiconductor-imager, including the first reported observation of different noise types in organic photodiodes, we demonstrate the suitability of this novel device for imaging. Furthermore, by integrating monolithically different organic materials to the chip, we show the cost-effective portability of the hybrid concept to different wavelength regions.

Double-Sided, Double-Type-Column 3-D Detectors: Design, Fabrication, and Technology Evaluation

We report on the latest results from the development of 3-D silicon radiation detectors at Fondazione Bruno Kessler of Trento (FBK), Italy (formerly ITC-IRST). Building on the results obtained from previous devices (3-D Single-Type-Column), a new detector concept has been defined, namely 3-D-DDTC (Double-sided Double-Type Column), which involves columnar electrodes of both doping types, etched from alternate wafer sides, stopping a short distance (d) from the opposite surface. Simulations prove that, if d is kept small with respect to the wafer thickness, this approach can yield charge collection properties comparable to those of standard 3-D detectors, with the advantage of a simpler fabrication process. Two wafer layouts have been designed with reference to this technology, and two fabrication runs have been performed. Technological and design aspects are reported in this paper, along with simulation results and initial results from the characterization of detectors and test structures belonging to the first 3-D-DDTC batch.

Development of Double-Sided Full-Passing-Column 3D Sensors at FBK

We report on the main design and technological characteristics related to the latest 3D sensor process developments at Fondazione Bruno Kessler (FBK, Trento, Italy). With respect to the previous version of this technology, which involved columnar electrodes of both doping types etched from both wafer sides and stopping at a short distance from the opposite surface, passing-through columns are now available. This feature ensures better performance, but also a higher reproducibility, which is of concern in medium volume productions. In particular, this R&D project was aimed at establishing a suitable technology for the production of 3D pixel sensors to be installed into the ATLAS Insertable B-Layer. An additional benefit is the feasibility of slim edges, which consist of a multiple ohmic column termination with an overall size as low as 100 μm. Eight batches with two different wafer layouts have been fabricated using this approach, and including several design options, among them the ATLAS 3D sensor prototypes compatible with the new read-out chip FE-I4.

Low-Noise Avalanche Photodiode in Standard 0.35-

In this paper, we report on an avalanche photodiode (APD) fabricated in a standard 0.35-mum CMOS technology. The main electrooptical characteristics of the device are presented, showing a remarkably low-noise factor if compared to other CMOS APDs. An estimation of the noise properties of a pixel based on the proposed photodiode with charge-amplifier readout is performed, showing that it could have an improved noise performance with respect to a standard photodiode-based pixel.

\mu \hbox{m}

Vacuum based devices, such as Photo Multiplier Tubes (PMT) and Micro Channel Plates (MCP), have been for many years the sensors of choice for most applications calling for photon counting and timing (Renker, 2004). While providing very good sensitivity, noise and timing characteristics, these photodetectors feature a number of disadvantages: they are bulky, fragile, and sensitive to magnetic fields; they require very high operation voltages, and have large power consumption; in their high-performance models, providing good spatial resolution, they are still very expensive. For high-sensitivity imaging applications, suitable solutions are represented by CCD cameras coupled with either MCP Image Intensifiers (I-CCDs) or Electron Multipliers (EM-CCDs) (Dussault & Hoess, 2004). However, besides being very expensive, their performance is not completely satisfactory in extreme time resolved measurements. For reasons of cost, miniaturization, ruggedness, reliability, design flexibility, integration density, and signal processing capabilities, a fully solid-state solution (and, particularly, CMOS technology) would be highly desirable. Among the advanced CMOS image sensors so far reported, the most promising ones in terms of high sensitivity and fast timing are those based on Single Photon Avalanche Diodes (SPADs). SPADs are avalanche photodiodes operated in the so-called Geiger mode, i.e., biased above breakdown, so as to be sensitive to single photons (Cova et al., 1996). Although these sensors have been developed for more than 30 years, in particular owing to the group of Prof. Cova at Politecnico di Milano, and single devices have reached outstanding performance (Ghioni et al., 2007), only recently the perspective of making a SPAD-based camera has become feasible. The first SPAD-based pixel arrays in CMOS technology have been demonstrated only a few years ago (Rochas et al., 2003a), but since then further developments rapidly followed, also facilitated by the availability of commercial, High-Voltage CMOS technologies (HV-CMOS) aimed at integrated circuits for power electronics, as well as of specially tailored “imaging” processes, which have been boosted by the huge market of

CMOS Technology

Oxygenated and standard (not oxygenated) silicon diodes processed by CNM and IRST have been irradiated by 27 MeV protons and compared with standard devices from ST Microelectronics. As expected, the leakage current density increase rate (/spl alpha/) and its annealing do not show any significant dependence on starting material, oxygenation and/or device processing. On the contrary, oxygenation improves the radiation hardness by decreasing the acceptor introduction rate (/spl beta/) and mitigating the depletion voltage (V/sub dep/) increase, with the /spl beta/ parameter depending also on starting material and/or effects related to device processing for standard diodes. Finally, these results are included in a general review on the state of the art for silicon detector radiation hardening, confirming the good performance of the considered technologies.

Avalanche Photodiodes in Submicron CMOS Technologies for High-Sensitivity Imaging

We report novel solutions for the edge termination in silicon detectors. In the framework of a project aimed at the optimization of 3D detectors with active edge, we have developed both active edges using a single sided process with support wafer, and slim edges using a double sided process without support wafer. TCAD simulations and experimental tests have been carried out to validate and compare the proposed approaches. While active edges can provide a better sensitivity up to a few microns from the physical edge, slim edges can simplify the fabrication technology while limiting the dead area at the edge to about 50 µm. The main design and technological issues are reported in this paper, along with selected results from TCAD simulations and electro-optical tests performed on these devices.

Radiation hardness of silicon detectors for high-energy physics applications

MicroElectroMechanical Systems for Radio Frequency applications (i.e. RF-MEMS) show very good performance and characteristics. However, their employment within large-scale commercial applications is still limited by issues related to the reliability of such components. In this work we present the Finite Element Method (FEM) modelling and preliminary experimental results concerning an active restoring mechanism, embedded within conventional MEMS/RF-MEMS ohmic (and capacitive) relays, capable of retrieving the normal operation of the switch if stiction occurs (i.e. the missed release of an actuated switch when the controlling bias is removed). The mechanism exploits the heat generated by an electric current flowing through an high-resistivity poly-silicon serpentine (Joule effect), to induce deformations in the suspended MEMS structures. Such changes in the mechanical structure result in shear and vertical restoring forces, helping the membrane release. The FEM-based thermo-electromechanical simulations discussed in this work include the coupling between different physical domains, starting from the imposed current, to the MEMS deformation. The preliminary experimental data reported in this paper show a speed-up of the dielectric discharge time due to the generated heat, as well as a change in the S-parameters, due to the membrane expansion, compatible with an upward bending of the central contact (i.e. restoring force), useful to counteracting stiction due to micro-welding.

Development of active and slim edge terminations for 3D and planar detectors

We report on an research and development activity aimed at the fabrication of silicon microstrip detectors with integrated front-end electronics to be used in high-energy physics and space experiments and medical/industrial imaging applications. A specially tailored fabrication technology has been developed at ITC-IRST (Trento, Italy), which allows for the production of single-sided microstrip detectors, with integrated coupling capacitors and polysilicon resistors, as well as active devices, including N-channel junction field effect transistors and N- or P-channel MOS transistors. The main characteristics of the fabrication process are outlined. Experimental results from the electrical characterization of the devices are reported, showing that transistors with good electrical figures can be obtained within the proposed technology while preserving the basic detector parameters.