Greg M. Hess

An All-Digital On-Chip Process-Control Monitor for Process-Variability Measurements

Process variability has become a major challenge in nanometer technologies. Understanding process variability is therefore a key to designing successful low-power multi-million gate SoCs. An all-digital on-chip process control-monitor (PCM) that measures process variability is described.

An on-chip process control monitor for process variability measurements in nanometer technologies

Process variability has become a fundamental challenge in nanometer technologies. This trend is driven by Moores law, which governs the exponential growth of transistors in ICs, the low-power requirements of mobile devices (i.e., Vdd ≪ 1V), and the shrinking geometries of advanced technologies reaching the sub-nanometer dimensions. Understanding process variability is therefore key to successfully designing ultra low-power multi-million gate SoCs. An all-digital on-chip process control-monitor (PCM) that measures process variability is described. It is implemented in a 65nm dual-oxide triple-Vt bulk CMOS process and it measures 0.41mm2.