Gwanho Yoon

Geometric metasurface enabling polarization independent beam splitting

A polarization independent holographic beam splitter that generates equal-intensity beams based on geometric metasurface is demonstrated. Although conventional geometric metasurfaces have the advantages of working over a broad frequency range and having intuitive design principles, geometric metasurfaces have the limitation that they only work for circular polarization. In this work, Fourier holography is used to overcome this limitation. A perfect overlap resulting from the origin-symmetry of the encoded image enables polarization independent operation of geometric metasurfaces. The designed metasurface beam splitter is experimentally demonstrated by using hydrogenated amorphous silicon, and the device performs consistent beam splitting regardless of incident polarizations as well as wavelengths. Our device can be applied to generate equal-intensity beams for entangled photon light sources in quantum optics, and the design approach provides a way to develop ultra-thin broadband polarization independent components for modern optics.

“Crypto-Display” in Dual-Mode Metasurfaces by Simultaneous Control of Phase and Spectral Responses

Although conventional metasurfaces have demonstrated many promising functionalities in light control by tailoring either phase or spectral responses of subwavelength structures, simultaneous control of both responses has not been explored yet. Here, we propose a concept of dual-mode metasurfaces that enables simultaneous control of phase and spectral responses for two kinds of operation modes of transmission and reflection, respectively. In the transmission mode, the dual-mode metasurface acts as conventional metasurfaces by tailoring phase distribution of incident light. In the reflection mode, a reflected colored image is produced under white light illumination. We also experimentally demonstrate a crypto-display as one application of the dual-mode metasurface. The crypto-display looks a normal reflective display under white light illumination but generates a hologram that reveals the encrypted phase information under single-wavelength coherent light illumination. Because two operation modes do not affect each other, the crypto-display can have applications in security techniques.

Polarization-sensitive tunable absorber in visible and near-infrared regimes

A broadband tunable absorber is designed and fabricated. The tunable absorber is comprised of a dielectric-metal-dielectric multilayer and plasmonic grating. A large size of tunable absorber device is fabricated by nano-imprinting method. The experimental results show that over 90% absorption can be achieved within visible and near-infrared regimes. Moreover, the high absorption can be controlled by changing the polarization of incident light. This polarization-sensitive tunable absorber can have practical applications such as high-efficiency polarization detectors and transmissive polarizer.

Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved electron beam lithography overlay

Nanofabrication techniques are essential for exploring nanoscience and many closely related research fields such as materials, electronics, optics and photonics. Recently, three-dimensional (3D) nanofabrication techniques have been actively investigated through many different ways, however, it is still challenging to make elaborate and complex 3D nanostructures that many researchers want to realize for further interesting physics studies and device applications. Electron beam lithography, one of the two-dimensional (2D) nanofabrication techniques, is also feasible to realize elaborate 3D nanostructures by stacking each 2D nanostructures. However, alignment errors among the individual 2D nanostructures have been difficult to control due to some practical issues. In this work, we introduce a straightforward approach to drastically increase the overlay accuracy of sub-20 nm based on carefully designed alignmarks and calibrators. Three different types of 3D nanostructures whose designs are motivated from metamaterials and plasmonic structures have been demonstrated to verify the feasibility of the method, and the desired result has been achieved. We believe our work can provide a useful approach for building more advanced and complex 3D nanostructures.

Demonstration of a Hyperlens-integrated Microscope and Super-resolution Imaging

The use of super-resolution imaging to overcome the diffraction limit of conventional microscopy has attracted the interest of researchers in biology and nanotechnology. Although near-field scanning microscopy and superlenses have improved the resolution in the near-field region, far-field imaging in real-time remains a significant challenge. Recently, the hyperlens, which magnifies and converts evanescent waves into propagating waves, has emerged as a novel approach to far-field imaging. Here, we report the fabrication of a spherical hyperlens composed of alternating silver (Ag) and titanium oxide (TiO2) thin layers. Unlike a conventional cylindrical hyperlens, the spherical hyperlens allows for two-dimensional magnification. Thus, incorporation into conventional microscopy is straightforward. A new optical system integrated with the hyperlens is proposed, allowing for a sub-wavelength image to be obtained in the far-field region in real time. In this study, the fabrication and imaging setup methods are explained in detail. This work also describes the accessibility and possibility of the hyperlens, as well as practical applications of real-time imaging in living cells, which can lead to a revolution in biology and nanotechnology.

High Refractive Index Ti3O5 Films for Dielectric Metasurfaces

Ti3O5 films are deposited with the help of an electron beam evaporator for their applications in metasurfaces. The film of subwavelength (632 nm) thickness is deposited on a silicon substrate and annealed at 400°C. The ellipsometry result shows a high refractive index above 2.5 with the minimum absorption coefficient in the visible region, which is necessary for high efficiency of transparent metasurfaces. Atomic force microscopy analysis is employed to measure the roughness of the as-deposited films. It is seen from micrographs that the deposited films are very smooth with the minimum roughness to prevent scattering and absorption losses for metasurface devices. The absence of grains and cracks can be seen by scanning electron microscope analysis, which is favorable for electron beam lithography. Fourier transform infrared spectroscopy reveals the transmission and reflection obtained from the film deposited on glass substrates. The as-deposited film shows high transmission above 60%, which is in good agreement with metasurfaces.

Towards 3D metamaterials at optical frequencies

Recent development of hierarchical fabrication techniques for three-dimensional metamaterial and plasmonic structures based on ultra-accurate and ultra-precise electron-beam lithography overlay will be discussed in this article.