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Hans-Jochen Paul

Carl Zeiss AG

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Publication

Featured researches published by Hans-Jochen Paul.

Archive | 2009

Spiegel für den EUV-Wellenlängenbereich, Substrat für einen solchen Spiegel, Verwendung einer Quarzschicht für ein solches Substrat, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel oder einem solchen Substrat und Projetktionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv

Gerhard Braun; Wilfried Clauss; Aurelian Dodoc; Stephan Müllender; Hans-Jochen Paul; Migura Sascha; Jörn Weber; Christoph Zaczek

Archive | 2004

Attenuating filter for ultraviolet light

Bernhard Weigl; Hans-Jochen Paul; Eric Eva

Archive | 2002

Antireflection coating for ultraviolet light

Hans-Jochen Paul; Matthias Heller

Archive | 2001

Antireflection coating for ultraviolet light at large angles of incidence

Ralf Kuschnereit; Hans-Jochen Paul

Archive | 2010

Mirror for the euv wavelength range, projection objective for microlithography comprising such a mirror, and projection exposure apparatus for microlithography comprising such a projection objective

Hans-Jochen Paul; Gerhard Braun; Sascha Migura; Aurelian Dodoc; Christoph Zaczek

Archive | 2012

Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective

Stephan Muellender; Joern Weber; Wilfried Clauss; Hans-Jochen Paul; Gerhard Braun; Sascha Migura; Aurelian Dodoc; Christoph Zaczek; Gisela von Blanckenhagen; Roland Loercher

Archive | 2011

MIRROR FOR EUV WAVELENGTHS, PROJECTION OBJECTIVE FOR MICROLITHOGRAPHY HAVING SUCH MIRROR AND PROJECTION EXPOSURE APPARATUS HAVING SUCH PROJECTION OBJECTIVE

Hans-Jochen Paul; Gerhard Braun; Sascha Migura; Aurelian Dodoc; Christoph Zaczek

Archive | 2005

Optical component and coating system for coating substrates for optical components

Harry Bauer; Matthias Heller; Hans-Jochen Paul; Jens Ullmann; Patrick Scheible; Christoph Zaczek

Archive | 2002

Method and coating system for coating substrates for optical components

Harry Bauer; Matthias Heller; Hans-Jochen Paul; Jens Ullmann; Patrick Scheible; Christoph Zaczek

Archive | 2015

Optisches Element und optische Anordnung damit

Hans-Jochen Paul; Boris Bittner; Norbert Wabra; Thomas Schicketanz

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Collaboration

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Christoph Zaczek

Carl Zeiss AG

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Aurelian Dodoc

Carl Zeiss AG

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Gerhard Braun

Carl Zeiss AG

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Sascha Migura

Carl Zeiss AG

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Matthias Heller

Carl Zeiss AG

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Thomas Schicketanz

Carl Zeiss AG

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Bernhard Weigl

Carl Zeiss AG

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Eric Eva

Carl Zeiss AG

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Ralf Kuschnereit

Carl Zeiss AG

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Wilfried Clauss

Carl Zeiss AG

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