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Thomas Schicketanz

Carl Zeiss AG

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Publication

Featured researches published by Thomas Schicketanz.

Archive | 2012

Imaging optics for use in optical system of projection exposure system, has imaging lights carrying components and mirror for grazing incidence of imaging light, where mirror for touching incident is arranged in image beam path

Thomas Schicketanz; Hans-Jürgen Rostalski; Sascha Migura

Archive | 2014

Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner; Walter Pauls; Holger Schmidt

Archive | 2014

Catadioptric projection objective comprising deflection mirrors and projection exposure method

Thomas Schicketanz; Toralf Gruner

Archive | 2009

High transmission, high aperture catadioptric projection objective and projection exposure apparatus

Daniel Kraehmer; Ralf Mueller; Thomas Schicketanz; Wilhelm Ulrich; Alexander Epple

Archive | 2013

Projektionsobjektiv für EUV-Mikrolithographie, Folienelement und Verfahren zur Herstellung eines Projektionsobjektivs mit Folienelement

Boris Bittner; Norbert Wabra; Sonja Schneider; Ricarda Schneider; Hendrik Wagner; Christian Wald; Rumen Iliew; Thomas Schicketanz; Toralf Gruner

Archive | 2012

Method for correcting the surface form of a mirror

Juergen Mueller; Thomas Schicketanz; Dirk Heinrich Ehm

Archive | 2015

METHOD OF LITHOGRAPHICALLY TRANSFERRING A PATTERN ON A LIGHT SENSITIVE SURFACE AND ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS

Frank Schlesener; Ingo Saenger; Olaf Dittmann; Aksel Goehnermeier; Alexandra Pazidis; Thomas Schicketanz; Michael Patra; Markus Deguenther

Archive | 2015

Optisches Element und optische Anordnung damit

Hans-Jochen Paul; Boris Bittner; Norbert Wabra; Thomas Schicketanz

Archive | 2015

Reflective optical element, and optical system of a microlithographic projection exposure system

Hartmut Enkisch; Hans-Jochen Paul; Thomas Schicketanz; Oliver Dier; Joern Weber; Christian Grasse; Ralf Winter; Sebastian Strobel

Archive | 2014

EUV-Spiegel und optisches System mit EUV-Spiegel

Thomas Schicketanz; Oliver Dier; Sebastian Strobel; Ralf Winter

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Collaboration

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Toralf Gruner

Carl Zeiss AG

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Boris Bittner

Carl Zeiss AG

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Norbert Wabra

Carl Zeiss AG

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Oliver Dier

Carl Zeiss AG

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Hans-Jochen Paul

Carl Zeiss AG

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Christian Wald

Carl Zeiss AG

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Hartmut Enkisch

Carl Zeiss AG

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Hendrik Wagner

Carl Zeiss AG

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Johannes Ruoff

Carl Zeiss AG

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Ralf Winter

Carl Zeiss AG

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