Hans Martin Sauer
Technische Universität Darmstadt
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Publication
Featured researches published by Hans Martin Sauer.
Journal of Colloid and Interface Science | 2013
Selin Manukyan; Hans Martin Sauer; Ilia V. Roisman; Kyle Anthony Baldwin; David J. Fairhurst; Haida Liang; Joachim Venzmer; Cameron Tropea
In this work, we present the visualization of the internal flows in a drying sessile polymer dispersion drop on hydrophilic and hydrophobic surfaces with Spectral Radar Optical Coherence Tomography (SR-OCT). We have found that surface features such as the initial contact angle and pinning of the contact line, play a crucial role on the flow direction and final shape of the dried drop. Moreover, imaging through selection of vertical slices using optical coherence tomography offers a feasible alternative compared to imaging through selection of narrow horizontal slices using confocal microscopy for turbid, barely transparent fluids.
Zeitschrift für Physikalische Chemie | 2006
Hans Martin Sauer; Elisabeth Cura; Stefan Spiekermann; Rolf Hempelmann
Summary Colloids made from ferrite nanoparticles are a good example of how the properties of materials change when scaled down to the nanometre scale: the continuous spectrum of magnetic spin wave excitations breaks up to a set of discrete absorption lines. In order to exploit this phenomenon, the chemical composition of the ferrite as well as the preparation method for the suspensions are essential: in nickel zinc ferrites, the magnetic anisotropy field and the life time of magnetic resonance states can be fine tuned by the zinc content to achieve optimal microwave absorption. This makes such colloids interesting for high-power microwave applications, such as bond/disbond-on-command, that are difficult to obtain with polycrystalline materials.
Organic Field-Effect Transistors XII; and Organic Semiconductors in Sensors and Bioelectronics VI | 2013
Simone Ganz; Sebastian Pankalla; Hans Martin Sauer; Manfred Glesner; Edgar Doersam
In this study we investigated the influence of the deposition technique on the surface topology and the resulting device performance in organic thin film transistors (OTFT). We varied the parameters of flexographic and gravure printing for the organic semiconductor (OSC) and did multilayer gravure printing for the dielectric, respectively. Therefore, we manufactured transistors in bottom contact top gate architecture and compared them to spin coated samples. As investigation tool for OTFTs, the charge carrier velocity distribution is correlated with the optical characteristics of the printed layers. We found a dependency of the printing technique on the surface topology of the semiconductor and, due to the resulting increase of the channel length, a broadening of the charge carrier velocity distribution. For the dielectric we found a dependency on the layer thickness which seems to be independent from the deposition technique.
Applied Physics Letters | 2013
Sebastian Pankalla; Dieter Spiehl; Hans Martin Sauer; Edgar Dörsam; Manfred Glesner
We studied the processing-related influence on contact resistivity of organic thin-film transistors in top gate architecture which are placed and oriented differently over flexible substrates. Appropriate plasma treatment reduces degradation of the source and drain contacts, increases effective contact surface for self-assembled monolayer treatment, and thus better injection. Increasing the semiconductor film thickness reduces the contact resistivity until a certain critical thickness. By these means, the contact resistivity has been reduced by two orders of magnitude. We did a mass characterisation of 366 solution-processed transistors on six samples that lead to a modified transfer line method in which we permutated the transistors to extract the contact resistivities. Thus, the intra-die dependency of the contact resistivity on the distance from the centre of the sample, the orientation of the transistor, its width, the pre-processing of the samples and on the semiconductor layer thickness has been ana...
Archive | 2004
Hans Martin Sauer; Stefan Spiekermann; Elisabeth Cura; Lars Henning Lie
Zur raschen Hartung von Reaktivklebstoffen wird gelegentlich die Bestrahlung mit Mikrowellen vorgeschlagen. Neben den bekannten Vorteilen wie dem hohen Energiewirkungsgrad und der Vertraglichkeit mit modernen Leichtbaumaterialien gibt es aber auch gewichtige Hurden: Wie sieht ein geeigneter Klebprozess aus? Wie stellt man eine gleichmasige Hartung sicher? Woher bezieht man spezifizierte Klebstoffe und Fertigungsanlagen? Auf der Basis von nanoskaligen Eisenoxiden wurde ein neues Klebsystem entwickelt, das sowohl die Bereitstellung geeigneter Klebstoffadditive als auch die Anlagentechnik umfasst.
Journal of Imaging Science and Technology | 2011
Nils Bornemann; Hans Martin Sauer; Edgar Doersam
Advanced materials and technologies | 2017
Sebastian Raupp; Dominik Daume; Serpil Tekoglu; Lisa Merklein; Uli Lemmer; Gerardo Hernandez-Sosa; Hans Martin Sauer; Edgar Dörsam; P. Scharfer; W. Schabel
IEEE Transactions on Electron Devices | 2015
Dieter Spiehl; Marc Häming; Hans Martin Sauer; Klaus Bonrad; Edgar Dörsam
Archive | 2006
Elisabeth Cura; Rolf Hempelmann; Heidi Schweitzer; Hans Martin Sauer; Stefan Spiekermann
Organic Electronics | 2013
Sebastian Pankalla; Ramkumar Ganesan; Dieter Spiehl; Hans Martin Sauer; Edgar Dörsam; Manfred Glesner