Harry Chou

The Role of Surface Oxygen in the Growth of Large Single-Crystal Graphene on Copper

Oxygen Control of Graphene Growth The growth of graphene on copper surfaces through the decomposition of hydrocarbons such as methane can result in a wide variety of crystal domain sizes and morphologies. Hao et al. (p. 720, published online 24 October; see the cover) found that the presence of surface oxygen could limit the number of nucleation sites and allowed centimeter-scale domains to grow through a diffusion-limited mechanism. The electrical conductivity of the graphene was comparable to that of exfoliated graphene. Oxygen treatment of a copper surface promoted the faster growth of compact, centimeter-scale graphene domains. The growth of high-quality single crystals of graphene by chemical vapor deposition on copper (Cu) has not always achieved control over domain size and morphology, and the results vary from lab to lab under presumably similar growth conditions. We discovered that oxygen (O) on the Cu surface substantially decreased the graphene nucleation density by passivating Cu surface active sites. Control of surface O enabled repeatable growth of centimeter-scale single-crystal graphene domains. Oxygen also accelerated graphene domain growth and shifted the growth kinetics from edge-attachment–limited to diffusion-limited. Correspondingly, the compact graphene domain shapes became dendritic. The electrical quality of the graphene films was equivalent to that of mechanically exfoliated graphene, in spite of being grown in the presence of O.

Preparation of supercapacitor electrodes through selection of graphene surface functionalities

In order to investigate the effect of graphene surface chemistry on the electrochemical performance of graphene/polyaniline composites as supercapacitor electrodes, graphene oxide (G-O), chemically reduced G-O (RG-O), nitrogen-doped RG-O (N-RG-O), and amine-modified RG-O (NH(2)-RG-O) were selected as carriers and loaded with about 9 wt % of polyaniline (PANi). The surface chemistry of these materials was analyzed by FTIR, NEXAFS, and XPS, and the type of surface chemistry was found to be important for growth of PANi that influences the magnitude of increase of specific capacitance. The NH(2)-RG-O/PANi composite exhibited the largest increase in capacitance with a value as high as 500 F g(-1) and good cyclability with no loss of capacitance over 680 cycles, much better than that of RG-O/PANi, N-RG-O/PANi, and G-O/PANi when measured in a three-electrode system. A NH(2)-RG-O/PANi//N-RG-O supercapacitor cell has a capacitance of 79 F g(-1), and the corresponding specific capacitance for NH(2)-RG-O/PANi is 395 F g(-1). This research highlights the importance of introducing -NH(2) to RG-O to achieve highly stable cycling performance and high capacitance values.

Millimeter-Size Single-Crystal Graphene by Suppressing Evaporative Loss of Cu During Low Pressure Chemical Vapor Deposition

Millimeter-size single-crystal monolayer graphene is synthesized on polycrystalline Cu foil by a method that involves suppressing loss by evaporation of the Cu at high temperature under low pressure. This significantly diminishes the number of graphene domains, and large single crystal domains up to ∼2 mm in size are grown.

Enhancement of the Electrical Properties of Graphene Grown by Chemical Vapor Deposition via Controlling the Effects of Polymer Residue

Residual polymer (here, poly(methyl methacrylate), PMMA) left on graphene from transfer from metals or device fabrication processes affects its electrical and thermal properties. We have found that the amount of polymer residue left after the transfer of chemical vapor deposited (CVD) graphene varies depending on the initial concentration of the polymer solution, and this residue influences the electrical performance of graphene field-effect transistors fabricated on SiO2/Si. A PMMA solution with lower concentration gave less residue after exposure to acetone, resulting in less p-type doping in graphene and higher charge carrier mobility. The electrical properties of the weakly p-doped graphene could be further enhanced by exposure to formamide with the Dirac point at nearly zero gate voltage and a more than 50% increase of the room-temperature charge carrier mobility in air. This can be attributed to electron donation to graphene by the -NH2 functional group in formamide that is absorbed in the polymer residue. This work provides a route to enhancing the electrical properties of CVD-grown graphene even when it has a thin polymer coating.

Reduced graphene oxide/copper nanowire hybrid films as high-performance transparent electrodes.

Hybrid films composed of reduced graphene oxide (RG-O) and Cu nanowires (NWs) were prepared. Compared to Cu NW films, the RG-O/Cu NW hybrid films have improved electrical conductivity, oxidation resistance, substrate adhesion, and stability in harsh environments. The RG-O/Cu NW films were used as transparent electrodes in Prussian blue (PB)-based electrochromic devices where they performed significantly better than pure Cu NW films.

Selective-area fluorination of graphene with fluoropolymer and laser irradiation

We have devised a method to selectively fluorinate graphene by irradiating fluoropolymer-covered graphene with a laser. This fluoropolymer produces active fluorine radicals under laser irradiation that react with graphene but only in the laser-irradiated region. The kinetics of C-F bond formation is dependent on both the laser power and fluoropolymer thickness, proving that fluorination occurs by the decomposition of the fluoropolymer. Fluorination leads to a dramatic increase in the resistance of the graphene while the basic skeletal structure of the carbon bonding network is maintained. Considering the simplicity of the fluorination process and that it allows patterning with a nontoxic fluoropolymer as a solid source, this method could find application to generate fluorinated graphene in graphene-based electronic devices such as for the electrical isolation of graphene.

Toward the Controlled Synthesis of Hexagonal Boron Nitride Films

Atomically smooth hexagonal boron nitride (h-BN) layers have very useful properties and thus potential applications for protective coatings, deep ultraviolet (DUV) emitters, and as a dielectric for nanoelectronics devices. In this paper, we report on the growth of h-BN by a low-pressure chemical vapor deposition (LPCVD) process using diborane and ammonia as the gas precursors. The use of LPCVD allows synthesis of h-BN with a controlled number of layers defined by the growth conditions, temperature, time, and gas partial pressure. Furthermore, few-layer h-BN was also grown by a sequential growth method, and insights into the growth mechanism are described, thus forming the basis of future growth of h-BN by atomic layer epitaxy.

Synthesis of High Quality Monolayer Graphene at Reduced Temperature on Hydrogen-Enriched Evaporated Copper (111) Films

We report new findings on the chemical vapor deposition (CVD) of monolayer graphene with negligible defects (≥95% negligible defect-peak over 200 μm × 200 μm areas) on evaporated copper films. Compared to copper foils used in the CVD of graphene, several new unexpected results have been observed including high-quality monolayer synthesis at temperatures <900 °C, a new growth window using a hydrogen-free methane precursor for low-defects, and electron microscope evidence of commensurate growth of graphene grains on underlying copper grains. These thermal, chemical, and physical growth characteristics of graphene on copper films can be attributed to the distinct differences in the dominant crystal orientation of copper films (111) versus foils (100), and consequent dissimilar interplay with the precursor gas. This study suggests that reduced temperature, hydrogen-free synthesis of defect-negligible monolayer graphene is feasible, with the potential to shape and scale graphene grains by controlling the size and crystal orientation of the underlying copper grains.

Chlorination of Reduced Graphene Oxide Enhances the Dielectric Constant of Reduced Graphene Oxide/Polymer Composites

14–19 ] The conductor-insulator composites are attracting much attention for potential applications of charge-storage capacitors, thin-fi lm transistors, and antistatic materials owing to their unique properties, i.e., a dramatic increase in dielectric constant in the conductor-insulator composite fi lms near the percolation threshold.

Simultaneous Transfer and Doping of CVD-Grown Graphene by Fluoropolymer for Transparent Conductive Films on Plastic

Chemical doping can decrease sheet resistance of graphene while maintaining its high transparency. We report a new method to simultaneously transfer and dope chemical vapor deposition grown graphene onto a target substrate using a fluoropolymer as both the supporting and doping layer. Solvent was used to remove a significant fraction of the supporting fluoropolymer, but residual polymer remained that doped the graphene significantly. This contrasts with a more widely used supporting layer, polymethylmethacrylate, which does not induce significant doping during transfer. The fluoropolymer doping mechanism can be explained by the rearrangement of fluorine atoms on the graphene basal plane caused by either thermal annealing or soaking in solvent, which induces ordered dipole moments near the graphene surface. This simultaneous transfer and doping of the graphene with a fluoropolymer increases the carrier density significantly, and the resulting monolayer graphene film exhibits a sheet resistance of ∼320 Ω/sq. Finally, the method presented here was used to fabricate flexible and a transparent graphene electrode on a plastic substrate.