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Dive into the research topics where Haruyuki Inoue is active.

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Featured researches published by Haruyuki Inoue.


Science and Technology of Advanced Materials | 2007

Observation of nanostructure by scanning near-field optical microscope with small sphere probe

Yasushi Oshikane; Toshihiko Kataoka; Mitsuru Okuda; Seiji Hara; Haruyuki Inoue; Motohiro Nakano

Abstract Step and terrace structure has been observed in an area of 1 μm × 1 μm on the cleaved surface of KCl–KBr solid-solution single crystal by scanning near-field optical microscope (SNOM) with a small sphere probe of 500 nm diameter. Lateral spatial resolution of the SNOM system was estimated to be 20 nm from the observation of step width and the scanning-step interval. Vertical spatial resolution was estimated to be 5–2 nm from the observation of step height and noise level of photomultiplier tube (PMT). With applying a dielectric dipole radiation model to the probe surface, the reason why such a high spatial resolution was obtained in spite of the 500 nm sphere probe, was understood as the effect of the near-field term appeared in the radiation field equations.


Applied Physics Letters | 2000

Atomically resolved scanning tunneling microscopy of hydrogen-terminated Si(001) surfaces after HF cleaning

Kenta Arima; Katsuyoshi Endo; Toshihiko Kataoka; Yasushi Oshikane; Haruyuki Inoue; Yuzo Mori

Atomic structures of hydrogen-terminated Si(001) surfaces after HF cleaning are investigated by scanning tunneling microscopy. It is revealed that the surface is macroscopically rough but is composed of terraces and steps. Inside a terrace, 1×1 structures are formed. This corresponds to the ideal 1×1 dihydride structure. The step edges run along the 〈110〉 direction. On the other hand, the 1×1 dihydride structure disappears when the surface is subsequently rinsed with ultrapure water, because every other dihydride row of the ideal 1×1 structure is preferentially etched in ultrapure water.


Applied Physics Letters | 1998

Atomic structures of hydrogen-terminated Si(001) surfaces after wet cleaning by scanning tunneling microscopy

Katsuyoshi Endo; Kenta Arima; Toshihiko Kataoka; Yasushi Oshikane; Haruyuki Inoue; Yuzo Mori

Scanning tunneling microscopy observations are performed on a H-terminated Si(001) surface treated with HF solutions and ultrapure water with very low dissolved oxygen and total organic carbon contents. Over a large area, row structures are observed in [110] and [110] directions. Pyramidal-shaped etch pits are also observed, which are caused by anisotropic etching by OH ions. Detailed images clearly show 2×1 periodic structures. It is suggested that every other row of the ideally dihydride 1×1 surface is etched preferentially by OH ions. This explains the mechanism by which the smallest etch pits are formed.


Ultramicroscopy | 1996

Development of a scanning near-field optical microscope with a probe consisting of a small spherical protrusion

Toshihiko Kataoka; Katsuyoshi Endo; Yasushi Oshikane; Haruyuki Inoue; Kohji Inagaki; Yusuke Mori; H. An; O. Kobayakawa; A. Izumi

Abstract The probe of the scanning near-field optical microscope (SNOM) is a dielectric sphere 500 nm in diameter on a transparent substrate. The probe sphere is illuminated by evanescent waves which are formed by the incidence of a HeNe laser with the wavelength of 632.8 nm under the condition of total internal reflection. The light from the probe is collected by a conventional microscope through the substrate. The detected light intensity varies markedly when a sample is brought into the near-field around the probe. The variation of the detected light intensity in the near-field depends on the complex index of refraction of samples; the smaller the real part of the refractive index, the more marked the increase of the detected light intensity. This result is explained through the use of an electric dipole model for the electromagnetic interaction between the probe and sample. The vertical and lateral resolutions of about 1 nm and 10 nm, respectively, are obtained for a standard sample which is prepared by vacuum evaporation of metal.


Surface Science | 2000

Scanning tunneling microscopy study of hydrogen-terminated Si(001) surfaces after wet cleaning

Kenta Arima; Katsuyoshi Endo; Toshihiko Kataoka; Yasushi Oshikane; Haruyuki Inoue; Yusuke Mori

Abstract A scanning tunneling microscopy (STM) study of the atomic structure of hydrogen-terminated Si(001) surfaces after wet cleaning is presented. Surface morphologies strongly depend on wet cleaning procedures. After being dipped into dilute HF solution, the surface is constructed by piling round, small terraces along the 〈110〉 direction. On the other hand, atomic rows along the 〈110〉 direction are clearly observed when the surface is subsequently rinsed by ultrapure water, and the corrugation pattern is identified as a 2×1 structure. With STM and Fourier-transform infrared attenuated total reflection (FTIR–ATR) observations, it is proposed that etching with ultrapure water proceeds in two steps. First, atomic steps perpendicular to dihydride rows of the upper layer are etched quickly to form step edges parallel to the dihydride rows and to produce large terraces with fewer steps. Second, etching occurs inside a terrace. Every other row of an ideally 1×1 dihydride terrace is removed preferentially in ultrapure water.


Proceedings of SPIE | 2013

Design and fabrication of active spectral filter with metal-insulator-metal structure for visible light communication

Kensuke Murai; Yasushi Oshikane; Takaya Higashi; Fumihiko Yamamoto; Motohiro Nakano; Haruyuki Inoue

Visible light communication with LED is an important ICT for the ubiquitous network society. However visible light communication has the speed limit in the conventional blinking LED method. Therefore an active spectral filter would be useful in order to input information signals onto the LED spectrum. Plasmonic spectral filter based on a metalinsulator- metal (MIM) structure is one of the candidates of such active filter. We will explain our progress of fabrication of the MIM structures with the vacuum deposition technique and compare their absorption properties with the theoretical prediction.


Proceedings of SPIE | 2012

Plasmonic active spectral filter in VIS-NIR region usingmetal-insulator-metal (MIM) structure on glass plate

Yasushi Oshikane; Kensuke Murai; Takaya Higashi; Fumihiko Yamamoto; Motohiro Nakano; Haruyuki Inoue

Interaction between surface plasmons at two interfaces inside a meta-insulator-metal (MIM) structure is one of the interesting physical phenomena in nanophotonics. We have started to create a plasmonic active spectral filter based on the MIM structure for a developing white light-emitting diode (LED) visible-light communication. An optical active filter at visible region assisted by surface plasmon resonance (SPR) in MIM structure of vacuum-deposited thin films on glass substrate has been studied both experimentally and theoretically. Interface between the first thin silver layer (M1, around 50 nm-thick) and bulk glass slide is appropriate for excitation of SPR at particular wavelength and incident angle of illumination light. And spatial extension of the SPR wave may cause an effective propagating mode confined in the insulator layer (I, around 150 nm-thick) by both M1 and the second thick silver layer (M2, around 200 nm-thick). Such an energy conversion from the illuminating light to the propagating SPR modes corresponds to an evident absorption dip on spectral reflectance curve of the MIM structure, and the shape of dip may vary widely in response to material and configuration of the MIM. The spectral and angular reflectance of the prototypical MIM structure has been measured by spectrophotometer for P- and S-polarized light because the plasmonic effect inside the MIM structure depends strongly on the polarization of light. Such the characteristic reflection feature has also been studied by using both the usual transfer matrix method and 2D electromagnetic simulation based on the finite element method. In this talk, several striking and preliminary MIM prototypes will be introduced and discussed.


SPIE's International Symposium on Optical Science, Engineering, and Instrumentation | 1999

3D-FDTD and experimental analysis of a resonant microcavity probe for high-resolution SNOM

Yasushi Oshikane; Hirofumi Nakagawa; Toshihiko Kataoka; Katsuyoshi Endo; Haruyuki Inoue; Takayuki Hirai

A simple novel probe for Scanning Near-field Optical Microscope (SNOM) is proposed. The probe consists of a small protrusion on a micro resonator. The resonator and protrusion is a spherical micro sphere with diameter of 50-70 μm, 1.5 μm, respectively. The resonator is a polystyrene latex sphere and the protrusion is a polymethyl methacrylate sphere. The s-polarized laser (Ti:Sapphire laser) beam, which illuminates the resonator through an evanescent wave, can be tuned to the resonant frequencies. The resonance occurred in the sphere is a traveling wave resonance, which is called MDRs (Morphology Dependent Resonances) or WGMs (Whispering Gallery Modes). The internal resonant wave could generate an intensive evanescent field on the surface of the resonator. The small protrusion on the resonator combines with the evanescent field and could acts as a high sensitive probe for SNOM. A clear image of the protrusion illuminated by the evanescent field on the resonator was observed with the cooled CCD detector. The brightness of the image of the protrusion depends on the laser wavelength. The optical characteristics of the resonant probe is also studied by a Finite-Difference Time- Domain method.


MRS Proceedings | 2007

Nano-scale Characterization of Surface Defects on CMP-finished Si Wafers by Scanning Probe Microscopy Combined with Laser Light Scattering

Kenta Arima; Takushi Shigetoshi; Haruyuki Inoue; Tsukasa Kawashima; Takaaki Hirokane; Toshihiko Kataoka; Mizuho Morita

Scanning probe microscopy has been widely used to evaluate surface microroughness on Si wafers after chemical mechanical polishing (CMP) processes. In this article, we utilize atomic force microscopy (AFM) combined with laser light scattering to detect nano-scale surface defects called microscratches on CMP-finished Si wafers. We find that most microscratches detected by the combined method are very shallow trenches with widths and depths of 80–200 nm and 0.1–0.2 nm, respectively. The dependence of scattered-light intensity on the size of microscratches agrees with theoretical calculations within one order of magnitude.


Proceedings of SPIE | 2010

Numerical and experimental studies on plasmonic effects associated with a pair of subwavelength holes on metallic thin film

Yasushi Oshikane; Motohiro Nakano; Haruyuki Inoue

Optical characteristic of a pair of subwavelength holes on metallic thin film has been studied by numerical simulation and FIB-assisted experiment. Each hole is in a square shape with four corners having fillets. One hole is set up adjascent to another by bringing the most pointed corners close to each other. As a result, a dividing wall between the holes has two v-channels on the both sides. When the hole pair is illuminated with laser beam having linear polarization perpendicular to alignment of the holes, surface plasmon polaritons (SPPs) are excited at the bottom of v-channels and propagate to the other edges of holes. Such the SPPs converge at the end of dividing wall and create a highly localized optical near-field like a point light source. The formation of intense spot is studied with systematic configuration and excitation parameters for the two holes by (1) three-dimensional electromagnetic field analysis for multi-layered model including the two holes, and (2) two-dimensional mode analysis for infinite metallic rod waveguide having the two holes near the center of itself, which are based on the proven finite element method (FEM) to solve partial differential equations (PDEs) for electromagnetic waves.

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