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Publication
Featured researches published by Hatsuyuki Tanaka.
Advances in Resist Technology and Processing IV | 1987
Hidekatsu Kohara; Hatsuyuki Tanaka; Masanori Miyabe; Yoshiaki Arai; Shingo Asaumi; Toshimasa Nakayama
Optical lithography is achieving itself into submicron region. In the limitation of resolution for stepper there is a decrease in contrast and so it requires more exposure amount than that of D. Also it is not possible to achieve faithful transcription of fine pattern dimension. The resolution of TSMR-8800 which is developed as high resolution positive photoresist is 0.6 μm. Faithful transcription of the mask pattern is possible for 0.7 μm line and space pattern. It shows good properties compared with conventional photoresist.
Archive | 1988
Hatsuyuki Tanaka; Hidekatsu Kohara; Yoshiyuki Sato; Shingo Asaumi; Toshimasa Nakayama; Akira Yokota; Hisashi Nakane
Archive | 1986
Hidekatsu Kohara; Hatsuyuki Tanaka; Masanori Miyabe; Yoshiaki Arai; Shingo Asaumi; Toshimasa Nakayama
Archive | 1986
Hatsuyuki Tanaka; Hidekatsu Kohara; Yoshiyuki Sato; Shingo Asaumi; Toshimasa Nakayama; Akira Yokota; Hisashi Nakane
Archive | 1994
Yoshinori Sakamoto; Yoshio Hagiwara; Hatsuyuki Tanaka; Toshimasa Nakayama
Archive | 1987
Masakazu Kobayashi; Shingo Asaumi; Hatsuyuki Tanaka
Archive | 1994
Katsuya Tanitsu; Atsushi Kawakami; Hatsuyuki Tanaka; Toshimasa Nakayama
Archive | 1988
Hatsuyuki Tanaka; Yoshiyuki Sato; Hidekatsu Kohara; Toshimasa Nakayama
Archive | 1992
Masaichi Kobayashi; Toshimasa Nakayama; Hatsuyuki Tanaka; Kazumasa Wakiya; 寿昌 中山; 政一 小林; 初幸 田中; 和正 脇屋
Archive | 1988
Shingo Asaumi; Hidekatsu Kohara; Hatsuyuki Tanaka; Masanori Miyabe; Toshimasa Nakayama
Collaboration
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