Hidefumi Kotsubo

Visible-light active thin-film WO3 photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering

A process based on reactive gas flow sputtering (GFS) for depositing visible-light active photocatalytic WO3 films at high deposition rates and with high film quality was successfully demonstrated. The deposition rate for this process was over 10 times higher than that achieved by the conventional sputtering process and the process was highly stable. Furthermore, Pt nanoparticle-loaded WO3 films deposited by the GFS process exhibited much higher photocatalytic activity than those deposited by conventional sputtering, where the photocatalytic activity was evaluated by the extent of decomposition of CH3CHO under visible light irradiation. The decomposition time for 60 ppm of CH3CHO was 7.5 times more rapid on the films deposited by the GFS process than on the films deposited by the conventional process. During GFS deposition, there are no high-energy particles bombarding the growing film surface, whereas the bombardment of the surface with high-energy particles is a key feature of conventional sputtering. H...

54.2: Direct Printed Electrodes of Transparent Conductive Polymers for Flexible Electronic Papers

Direct formation of line-shaped electrodes consisting of transparent conductive polymer of poly(3, 4-ethylene dioxythiophene) and poly(styrenesulfonate) (PEDOT/PSS) was successfully achieved onto a flexible polyethylene terephthalate (PET) substrate by using screen printing method. Improvement of the components and the viscosity of the conductive materials enabled to pattern the line electrodes in high resolution. A 4.0 in. diagonal and 88 dpi flexible electronic paper display using quick response liquid-powder technology has been prepared by applying the flexible substrate with the direct printed transparent polymer electrodes.