Yoshinori Iwabuchi

High rate deposition of photocatalytic TiO2 films with high activity by hollow cathode gas-flow sputtering method

Photocatalytic TiO2 films were deposited by a hollow cathode gas-flow sputtering method using two Ti metal targets mounted parallel to each other. The Ar and O2 flow rates were 3000 and 0–50SCCM (SCCM denotes cubic centimeter per minute at STP), respectively, and total gas pressure during the deposition was maintained at 45Pa. The highest deposition rate for the photocatalytic TiO2 films was 162nm∕min at 30SCCM of O2 flow. The as-deposited films and postannealed films, annealed in air at 300°C for 1h, were used to carry out photocatalytic decomposition of acetaldehyde (CH3CHO). In particular, the postannealed films showed extremely high photocatalytic activity compared to the photocatalytic activity of films deposited by conventional reactive sputtering.

Visible-light active thin-film WO3 photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering

A process based on reactive gas flow sputtering (GFS) for depositing visible-light active photocatalytic WO3 films at high deposition rates and with high film quality was successfully demonstrated. The deposition rate for this process was over 10 times higher than that achieved by the conventional sputtering process and the process was highly stable. Furthermore, Pt nanoparticle-loaded WO3 films deposited by the GFS process exhibited much higher photocatalytic activity than those deposited by conventional sputtering, where the photocatalytic activity was evaluated by the extent of decomposition of CH3CHO under visible light irradiation. The decomposition time for 60 ppm of CH3CHO was 7.5 times more rapid on the films deposited by the GFS process than on the films deposited by the conventional process. During GFS deposition, there are no high-energy particles bombarding the growing film surface, whereas the bombardment of the surface with high-energy particles is a key feature of conventional sputtering. H...

54.2: Direct Printed Electrodes of Transparent Conductive Polymers for Flexible Electronic Papers

Direct formation of line-shaped electrodes consisting of transparent conductive polymer of poly(3, 4-ethylene dioxythiophene) and poly(styrenesulfonate) (PEDOT/PSS) was successfully achieved onto a flexible polyethylene terephthalate (PET) substrate by using screen printing method. Improvement of the components and the viscosity of the conductive materials enabled to pattern the line electrodes in high resolution. A 4.0 in. diagonal and 88 dpi flexible electronic paper display using quick response liquid-powder technology has been prepared by applying the flexible substrate with the direct printed transparent polymer electrodes.