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Dive into the research topics where Hideharu Horikoshi is active.

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Featured researches published by Hideharu Horikoshi.


Journal of Applied Physics | 2003

Effects of heat treatment on absorption bands in OH-free and OH-containing fused quartz

Nobu Kuzuu; Hideharu Horikoshi; Tsutomu Nishimura; Yosuke Kokubo

Effects of heat treatment on absorption bands in fused quartz produced by melting natural quartz powder containing 2×1017 cm−3 (sample I) and 1.3×1019 cm−3 of OH (sample II) were studied. Both samples have an absorption peak at ≈5.2 eV. Fluorescent spectra and the results of Gaussian peak decomposition suggest that this absorption is associated with the B2β band with a peak at 5.15 eV and full width at half maximum of 0.42 eV. The 5.15 eV band and an absorption component at 7.5 eV in sample II were annealed out at 1423 K, whereas almost no change was observed in the absorption spectra of sample I. The decrement of the 5.15 and 7.5 eV bands was proportional to the decrement of the OH content. The annealing mechanism in sample II can be explained using a previously proposed model for OH-containing fused quartz wherein the B2β band is the twofold-oxygen-coordinated silicon (=Si:) coordinated with two ≡Si-OH structures. Sample I must have a =Si: structure, but it may not be annealed out because it does not ha...


Applied Physics Express | 2015

Influence of OH-group concentration on optical properties of silica glass in terahertz frequency region

Satoshi Tsuzuki; Nobu Kuzuu; Hideharu Horikoshi; Katsuya Saito; Kohji Yamamoto; Masahiko Tani

We evaluated the optical properties of various types of silica glass with different OH-group concentrations by using terahertz (THz) time-domain spectroscopy. The results show that the absorption coefficient in the THz frequency region varied with the OH-group concentration and that the variation depended only on the OH-group concentration, irrespective of the glass-manufacturing process. On the other hand, the refractive index did not depend on the OH-group concentration. Thus, the THz optical properties of silica glass can be predicted based on the OH-group concentration in the glass, and vice versa.


Journal of Applied Physics | 2013

KrF- and ArF-excimer-laser-induced absorption in silica glasses produced by melting synthetic silica powder

Nobu Kuzuu; Toshiya Sasaki; Tatsuya Kojima; Jun-ichiro Tanaka; Takayuki Nakamura; Hideharu Horikoshi

KrF- and ArF-excimer-laser-induced absorption of silica glasses produced by electric melting and flame fusion of synthetic silica powder were investigated. The growth of KrF-laser-induced absorption was more gradual than that of ArF-laser-induced absorption. Induced absorption spectra exhibited a peak at about 5.8 eV, of which the position and width differed slightly among samples and laser species. Widths of ArF-laser-induced absorption spectra were wider than those of KrF-laser-induced spectra. KrF-laser-induced absorption is reproducible by two Gaussian absorption bands peaking at 5.80 eV with full width at half maximum (FWHM) of 0.62 eV and at 6.50 eV with FWHM of 0.74 eV. For reproduction of ArF-laser-induced absorption, Gaussian bands at 5.41 eV with FWHM of 0.62 eV was necessary in addition to components used for reproducing KrF-laser-induced absorption. Based on the discussion of the change of defect structures evaluated from change of absorption components, we proposed that the precursor of the 5...


Japanese Journal of Applied Physics | 2017

Temperature and hydroxyl concentration dependences of diffusion coefficients of hydroxyl groups in vitreous silica at temperatures of 850–1200 °C

Nobu Kuzuu; Naoya Sato; Yu Arakawa; Hideharu Horikoshi; Naohiro Horii

The hydroxyl concentration and temperature dependences of the diffusion coefficients of hydroxyl groups in vitreous silica were investigated by analyzing the change in the hydroxyl concentration distribution caused by heat treatment around the binding interface between silica glass plates with different hydroxyl concentrations. We confirmed experimentally that the diffusion coefficient is proportional to the hydroxyl concentration, which had been predicted theoretically, and obtained the empirical formula D(c OH) = [(4.9 ± 1.0) × 10−14 m2/swt ppm] × exp[−(8.1 ± 0.3) × 103 K/T] c OH with the hydroxyl concentration c OH and the absolute temperature T, which is valid at least in the temperature range of 850–1200 °C. Using the values calculated using this formula, we can reproduce the hydroxyl concentration profile after diffusion from a silica glass surface induced by heating in a water vapor atmosphere in the literature, which supports the validity of the empirical formula obtained in this study. The relationship between the effective diffusion coefficient in the literature and our result is discussed.


Journal of the American Ceramic Society | 2003

Cubic-Formation and Grain-Growth Mechanisms in Tetragonal Zirconia Polycrystal

Koji Matsui; Hideharu Horikoshi; Nobukatsu Ohmichi; Michiharu Ohgai; Hidehiro Yoshida; Yuichi Ikuhara


Archive | 2007

Fused quartz glass and process for producing the same

Kazuyoshi Arai; Tsutomu Takahata; Shinkichi Hasimoto; Masato Uchida; Yoshinori Harada; Hideharu Horikoshi


Archive | 2008

Quartz glass, method of producing the same, member using the same and apparatus

Kazuyoshi Arai; Yoshinori Harada; Shinkichi Hashimoto; Hideharu Horikoshi; Tsutomu Takahata; Masahito Uchida; Shusuke Yamada; 雅人 内田; 美徳 原田; 秀春 堀越; 修輔 山田; 一喜 新井; 眞吉 橋本; 努 高畑


Archive | 2008

HIGH-PURITY MOLTEN QUARTZ GLASS, METHOD OF PRODUCING THE SAME, MEMBER USING THE SAME AND APPARATUS

Kazuyoshi Arai; Yoshinori Harada; Shinkichi Hashimoto; Hideharu Horikoshi; Tsutomu Takahata; Masahito Uchida; Shusuke Yamada; 雅人 内田; 美徳 原田; 秀春 堀越; 修輔 山田; 一喜 新井; 眞吉 橋本; 努 高畑


Archive | 1996

Low hydrogen overvoltage cathode and process for the production thereof

Hideharu Horikoshi; Kazumasa Suetsugu; Takashi Sakaki; Kanji Yoshimitsu


Journal of The Ceramic Society of Japan | 2009

Hydroxyl-concentration distribution near the binding interface formed by heating contacted flat silica glass surfaces at high temperature

Nobu Kuzuu; Hideharu Horikoshi; Akihide Okazaki; Tomoya Seki; Mitsuya Tanaka

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