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Hidehiro Kojiri

Applied Materials

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Publication

Featured researches published by Hidehiro Kojiri.

Archive | 2010

Method of forming a group III-nitride crystalline film on a patterned substrate by hydride vapor phase epitaxy (HVPE)

Olga Kryliouk; Yuriy Melnik; Hidehiro Kojiri; Tetsuya Ishikawa

Archive | 2000

Dielectric etch process reducing striations and maintaining critical dimensions

Ji Ding; Hidehiro Kojiri; Yoshio Ishikawa; Keiji Horioka; Ruiping Wang; Robert W. Wu; Hoiman Hung

Archive | 2010

Light emitting diode with enhanced quantum efficiency and method of fabrication

Jie Su; Olga Kryliouk; Yuriy Melnik; Hidehiro Kojiri; Lu Chen; Tetsuya Ishikawa

Archive | 2010

METHOD OF FORMING IN-SITU PRE-GaN DEPOSITION LAYER IN HVPE

Yuriy Melnik; Hidehiro Kojiri; Olga Kryliouk; Tetsuya Ishikawa

Archive | 2010

Substrate pretreatment for subsequent high temperature group iii depositions

Yuriy Melnik; Olga Kryliouk; Hidehiro Kojiri; Tetsuya Ishikawa

Archive | 2002

Precision dielectric etch using hexafluorobutadiene

Ji Ding; Hidehiro Kojiri; Yoshio Ishikawa; Keiji Horioka; Ruiping Wang; Robert W. Wu; Hoiman Raymond Hung

Archive | 2012

METHODS FOR PRETREATMENT OF GROUP III-NITRIDE DEPOSITIONS

Yuriy Melnik; Lu Chen; Hidehiro Kojiri

Archive | 2012

Methods for improved growth of group III nitride buffer layers

Yurity Melnik; Lu Chen; Hidehiro Kojiri

Archive | 2009

IN-SITU CHAMBER CLEANING METHOD

Hidehiro Kojiri

Archive | 2012

Methods for improved growth of group III nitride semiconductor compounds

Yuriy Melnik; Lu Chen; Hidehiro Kojiri

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Collaboration

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Yuriy Melnik

Applied Materials

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Olga Kryliouk

Applied Materials

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Tetsuya Ishikawa

Applied Materials

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Lu Chen

Applied Materials

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Ji Ding

Applied Materials

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Robert W. Wu

Applied Materials

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Ruiping Wang

Applied Materials

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Yoshio Ishikawa

Applied Materials

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Anjana M. Patel

Applied Materials

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Ganesh Balasubramanian

Applied Materials

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