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Hidekimi Kadokura

Panasonic

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Archive | 1997

PRODUCTION OF BIS(ALKYLCYCLOPENTADIENYL) RUTHENIUM COMPLEX AND PRODUCTION OF RUTHENIUM-CONTAINING THIN FILM USING THE SAME

Hidekimi Kadokura; 秀公 門倉

Archive | 2002

Method for manufacturing hafnium silicate film by atom layer adsorption and deposition method

Hidekimi Kadokura; Mikiko Yasuhara; 三紀子 安原; 秀公 門倉

Archive | 1997

Method of manufacturing layered ferroelectric Bi containing film

Yukoh Hochido; Hidekimi Kadokura; Masamichi Matsumoto; Koji Arita; Masamichi Azuma; T. Otsuki

Archive | 2008

Raw material for forming a strontium-containing thin film and process for preparing the raw material

Hidekimi Kadokura; Shintaro Higashi; Yoshinori Kuboshima

Archive | 2000

TERTIARY AMYLIMIDETRIS(DIMETHYLAMIDE)TANTALUM, METHOD FOR PRODUCING IT, AND RAW MATERIAL SOLUTION FOR MOCVD AND METHOD FOR FORMING TANTALUM NITRIDE FILM THEREWITH

Hidekimi Kadokura; Mikiko Yasuhara; 三紀子 安原; 秀公 門倉

Archive | 1997

Method of manufacturing bi-layered ferroelectric thin film

Yukoh Hochido; Hidekimi Kadokura; Masamichi Matsumoto; Koji Arita; Masamichi Azuma; Tatsuo Otsuki

Archive | 2004

High-purity tetrakis(dimethylamino)hafnium, method for producing the same and method for producing gate insulation film by using the same

Hidekimi Kadokura; Yoshinori Kuboshima; Mikiko Yasuhara; 義則 久保島; 三紀子 安原; 秀公 門倉

Archive | 2000

Zirconium alkoxytris (β-Diketonate), process for manufacturing the same, and liquid composition for formation of PZT film

Hidekimi Kadokura; Yumie Okuhara

Archive | 1995

Production of bismuth laminar ferroelectric thin film

Yuko Hochido; Hidekimi Kadokura; Masamichi Matsumoto; 雄幸 寶地戸; 政道 松本; 秀公 門倉

Archive | 2004

Tert-amylimido-tris(dimethylamido)-niobium, method for producing the same, raw material solution for ald using the same and method for forming niobium nitride film or niobium oxide film by using the same

Hidekimi Kadokura; Mikiko Yasuhara; 三紀子 安原; 秀公 門倉

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