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Dive into the research topics where Hikaru Sugita is active.

Publication


Featured researches published by Hikaru Sugita.


Archive | 2000

Composition for resist underlayer film and method for producing the same

Hikaru Sugita; Akio Saito; Kinji Yamada; Michinori Nishikawa; Yoshihisa Ohta; Yoshiji Yuumoto


Archive | 2003

Acenaphthylene derivative, polymer, and antireflection film-forming composition

Hikaru Sugita; Keiji Konno; Masato Tanaka; Tsutomu Shimokawa


Journal of Applied Polymer Science | 2003

Spin‐on‐glass (SOG) for the trilayer imaging process

Hikaru Sugita; Akio Saito; Keiji Konno; Akihiro Hayasui; Satoru Nishiyama; Masahiko Ebisawa; Michinori Nishikawa; Yoshihisa Ohta; Tetsuo Tominaga


Journal of Applied Polymer Science | 2018

Positive‐tone photoresist consisting of a multifunctional acrylate resin that can be patterned after photo‐crosslinking

Hikaru Sugita; Yuka Miyashita; Hiroyuki Suzuki; Shingo Takasugi; Nobuji Matsumura; Mitsuyo Yoshizawa


Microelectronic Engineering | 2018

Photosensitive anti-biofouling polycarboxymethylbetaine coating: Polymerization, photolithography, and cell aggregation along the pattern geometry

Hikaru Sugita; Tarou Uchida; Shoichi Kato; Kiyoshi Suda; Masaaki Miyaji


Microelectronic Engineering | 2018

I-line photoresist composed of multifunctional acrylate, photo initiator, and photo acid generator, which can be patterned after g-line photo-crosslinking

Hikaru Sugita; Nobuji Matsumura


Journal of Applied Polymer Science | 2015

Styryl silsesquioxane photoresist

Hikaru Sugita; Kei Tanaka; Kaori Shirato; Ryota Yamamoto; Kazuko Tateshima


Archive | 2003

Derivate und Polymere von Acenaphthylen und Zusammensetzung enthalten Antireflektionsfilm

Hikaru Sugita; Keiji Konno; Masato Tanaka; Tsutomu Shimokawa


Archive | 2003

Derivate und Polymere von Acenaphthylen und Zusammensetzung enthalten Antireflektionsfilm Derivatives and polymers of acenaphthylene and composition containing anti-reflection film

Hikaru Sugita; Keiji Konno; Masato Tanaka; Tsutomu Shimokawa


Archive | 2001

Compositions for under-resist film and processes for producing the same, and under-resist films and processes for producing the same

Keiji Konno; Kazuo Kawaguchi; Masato Tanaka; Yasutaka Kobayashi; Akihiro Hayashi; Hikaru Sugita; Yuichi Hashiguchi

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Masato Tanaka

National Institute of Advanced Industrial Science and Technology

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