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Hirokazu Iimori

Tokyo Institute of Technology

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Publication

Featured researches published by Hirokazu Iimori.

Macromolecular Symposia | 2003

Nonstoichiometric polycondensation I. synthesis of polythioether from dibromomethane and 4,4′‐thiobisbenzenethiol

Hirokazu Iimori; Yuji Shibasaki; Shinji Ando; Mitsuru Ueda

Archive | 2005

Photosensitive resin composition, cured film formed from the same and element with cured film

Takenori Fujiwara; Hirokazu Iimori; Masahide Senoo; Mitsufumi Suwa; 将秀 妹尾; 健典 藤原; 充史 諏訪; 弘和 飯森

Archive | 2004

SULFONAMIDE COMPOUND, POLYMER COMPOUND, RESIST MATERIAL, AND METHOD FOR FORMING PATTERN

Masataka Endo; Toshiaki Fukuhara; Hirokazu Iimori; Shinji Kishimura; Masaru Sasako; Mitsuru Ueda; 充 上田; 眞治 岸村; 敏明 福原; 勝 笹子; 政孝 遠藤; 弘和 飯森

Archive | 2004

NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, TRANSPARENT HARDENED FILM FORMED OF THE SAME, AND ELEMENT HAVING HARDENED FILM

Takenori Fujiwara; Hirokazu Iimori; Masahide Senoo; Mitsufumi Suwa; 将秀 妹尾; 健典 藤原; 充史 諏訪; 弘和 飯森

Journal of Photopolymer Science and Technology | 2003

A New Positive-working Alkaline developable Photoresist Based on Partially O- tert-butoxycarbonylmethylated- tetra-C-methylcalix[4]resorcinarene and a Photoacid Generator

Hirokazu Iimori; Yuji Shibasaki; Mitsuru Ueda; Hirotoshi Ishii

Archive | 2006

PHOTOSENSITIVE SILOXANE COMPOSITION AND METHOD FOR PREPARING THE SAME, CURED FILM FORMED FROM PHOTOSENSITIVE SILOXANE COMPOSITION, AND ELEMENT WITH CURED FILM

Hirokazu Iimori; Masahide Senoo; Mitsufumi Suwa; 将秀 妹尾; 充史 諏訪; 弘和 飯森

Journal of Photopolymer Science and Technology | 2003

A New Photoresist Materials for 157 nm Lithography-3: Poly[2-hydroxy-3-pinanyl vinyl sulfonate-co-4-(1,1,1,3,3,3-hexafluoro-2-hydroxypropyl)styrene]

Hirokazu Iimori; Shinji Ando; Yuji Shibasaki; Mitsuru Ueda; Shinji Kishimura; Masataka Endo; Masaru Sasago

Archive | 2016

感光性樹脂組成物、硬化膜、タッチパネル及びタッチパネルの製造方法

三井 博子; Hiroko Mitsui; 美加 越野; Mika Koshino; 弘和 飯森; Hirokazu Iimori

Archive | 2006

感光性シロキサン組成物およびその製造方法、感光性シロキサン組成物から形成された硬化膜、および硬化膜を有する素子

Hirokazu Iimori; Masahide Senoo; Mitsufumi Suwa; 将秀 妹尾; 充史 諏訪; 弘和 飯森

Archive | 2005

感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子

Takenori Fujiwara; Hirokazu Iimori; Masahide Senoo; Mitsufumi Suwa; 将秀 妹尾; 健典 藤原; 充史 諏訪; 弘和 飯森

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Collaboration

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Masahide Senoo

Toray Industries

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Mitsuru Ueda

Panasonic

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Masataka Endo

Panasonic

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Shinji Kishimura

Mitsubishi Electric

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Takenori Fujiwara

Toray Industries

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Yuji Shibasaki

Iwate University

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Shinji Ando

Tokyo Institute of Technology

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Toshiaki Fukuhara

Tokyo Institute of Technology

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Masaru Sasago

Panasonic

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