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Dive into the research topics where Hiromasa Hasegawa is active.

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Featured researches published by Hiromasa Hasegawa.


Applied Physics Letters | 1969

IMPROVEMENTS OF REVERSE I–V CHARACTERISTICS IN EPITAXIAL PLANAR SCHOTTKY BARRIER DIODES

Gota Kano; Shohei Fujiwara; Matsuo Iizuka; Hiromasa Hasegawa; Tsukasa Sawaki

Edge leakage effects in Mo–Si epitaxial planar Schottky barrier diodes have been studied and a simple method for eliminating this effect has been proposed. Improved reverse I–V characteristics have approached the theoretical limit.


Archive | 1969

METHOD FOR MANUFACTURING PRESSURE SENSITIVE SEMICONDUCTOR DEVICE

Shohei Fujiwara; Hiromasa Hasegawa; Gota Kano; Tatsuo Kawasaki; Masami Yokozawa


Archive | 1971

Druckempfindliche Halbleitervorrichtung und Verfahren zu ihrer Herstellung

Gota Kano; Masami Yokozawa; Tatsuo Kawasaki; Shohei Fujiwara; Hiromasa Hasegawa


Archive | 1969

Druckempfindliche Halbleitereinrichtung und Verfahren zum Herstellen derselben Pressure-sensitive semiconductor device and method of manufacturing the same

Gota Kano; Mutsuo Iizuka; Shohei Fujiwara; Hiromasa Hasegawa; Tsukasa Sawaki


Archive | 1969

Halbleitereinrichtung und Verfahren zum Herstellen derselben A semiconductor device and method of manufacturing the same

Gota Kano; Mutsui Iizuka; Shohei Fujiwara; Hiromasa Hasegawa; Tsukasa Sawaki


Archive | 1969

Verfahren zur Herstellung eines Halbleiterelements A process for producing a semiconductor element

Mutsuo Iizuka; Shohei Fujiwara; Hiromasa Hasegawa; Hitoo Iwasa; Gota Kano; Iwao Teramoto


Archive | 1969

Pressure-sensitive semiconductor device and method of manufacturing the same

Gota Kano; Mutsuo Iizuka; Shohei Fujiwara; Hiromasa Hasegawa; Tsukasa Sawaki


Archive | 1969

Halbleitereinrichtung und Verfahren zum Herstellen derselben

Gota Kano; Mutsui Iizuka; Shohei Fujiwara; Hiromasa Hasegawa; Tsukasa Sawaki


Archive | 1969

A process for producing a semiconductor element

Mutsuo Iizuka; Shohei Fujiwara; Hiromasa Hasegawa; Hitoo Iwasa; Gota Kano; Iwao Teramoto


Archive | 1969

Druckempfindliche Halbleitereinrichtung und Verfahren zum Herstellen derselben

Gota Kano; Mutsuo Iizuka; Shohei Fujiwara; Hiromasa Hasegawa; Tsukasa Sawaki

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Tsukasa Sawaki

Industrial Research Institute

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