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Dive into the research topics where Hiromu Isa is active.

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Featured researches published by Hiromu Isa.


IEEE Transactions on Electrical Insulation | 1991

Breakdown process of a rod-to-plane gap in atmospheric air under DC voltage stress

Hiromu Isa; Yasuo Sonoi; Muneaki Hayashi

Discharge phenomena were observed under chopped or steady state DC voltage application. A still camera and two photomultipliers were used to record and measure the development of the electrical breakdown in a normal air gap. The breakdown process under both positive and negative DC voltage stress differs from that under impulse voltage. In the case of DC voltage, space charge is produced by corona discharges prior to the complete breakdown, which affects the breakdown process significantly. >


conference on electrical insulation and dielectric phenomena | 1984

An experimental investigation of electric flashover across solid insulators in vacuum

Hiromu Isa; Ja. H. Leet; Hans Christian von Baeyer

In this research, we observed the characteristics of the onset of surface flashover in a vacuum for three kinds of test pieces. We also observed the development of surface flashover with good time and space resolution by using an image converter camera. The results obtained may be summarized as follows: (1) The flashover voltage varies by the condition of contact between the test piece and the electrode. In many cases, the flashover voltage sharply decreases after the first flashover. (2) The flashover voltage decreases when the dielectric constant of the test piece is increased. (3) The brightness of the flashover channel varies periodically along the channel. The periodic length is approximately 0.5 mm for our experiment. (4) The cathode spot appears when a large clearance exists between the test piece and the cathode. On the streak photographs, the bright part initiates at the cathode and moves toward mid-gap at a speed of 107 m/s, which is almost independent of pressure and applied voltage. (5) If the clearance between the test piece and the electrode is small, the cathode spot does not appear. In such a case, the flashover initiates at a point about 3 mm from the cathode, and expands toward both the cathode and the anode with a speed of approximately 1.2 × 107 m/s. (6) The calculated velocity of electron hopping on the surface is in good agreement with the expansion velocity of the bright portion.


conference on electrical insulation and dielectric phenomena | 1990

Degradation of silicone-coated FRP by weathering

Hiromu Isa; H. Akutagawa

To estimate the quality of sample coating materials, a merit index was calculated from the average value of the order in flashover voltages and the contact angle of the sample insulator during exposure. The contact angle is shown to be the most effective factor for the degradation of sample instructors. Under wet conditions, a low contact angle causes creeping discharges resulting in tracking.<<ETX>>


Ieej Transactions on Power and Energy | 1993

Wave Propagation Characteristics of a Lightning Surge on an Incoming Line

Keisuke Kotaki; Atsushi Hashimoto; Hiromu Isa; Syozo Sekioka


Electrical Engineering in Japan | 1987

Behavior of corona discharges in a rod‐to‐plane gap in atmospheric air under AC voltage application

Hiromu Isa; Muneaki Hayashi


Shinku | 1999

Properties of SOFC Having YSZ Electrolyte Thin Film Grown by Sputtering

Kouhei Okada; Akiyoshi Nagata; Hideo Okayama; Hiromu Isa


Shinku | 1998

Properties of YSZ Thin Films for SOFC Grown by Sputtering

Akiyoshi Nagata; Takanobu Mimura; Kouhei Okada; Hideo Okayama; Hiromu Isa


電気設備学会全国大会講演論文集 | 2004

Evaluation of Solid Oxide Fuel Cells using YbSZ as Solid Electrolyte

Hisashi Katayama; Hiromu Isa; Akiyoshi Nagata; Tomoaki Miichi


Shinku | 1999

Properties of SOFC Having MSZ Electrolyte Thin Film Grown by PECVD

Tomoaki Tatsu; Akiyoshi Nagata; Hideo Okayama; Hiromu Isa


Shinku | 1998

Properties of MSZ Thin Films for SOFC Grown by PECVD

Akiyoshi Nagata; Noritaka Mochizuki; Tomoaki Tatsu; Hideo Okayama; Hiromu Isa

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Akiyoshi Nagata

Osaka Institute of Technology

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Hideo Okayama

Osaka Institute of Technology

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Kouhei Okada

Osaka Institute of Technology

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Noritaka Mochizuki

Osaka Institute of Technology

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Takanobu Mimura

Osaka Institute of Technology

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Tomoaki Tatsu

Osaka Institute of Technology

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Tsukasa Kubo

Osaka Institute of Technology

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Atsushi Hashimoto

Osaka Institute of Technology

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Hiroshi Nagase

Osaka Institute of Technology

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