Is this you? Create Your Porfile
Avatar

Hironori Sonobe

Toshiba

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Hironori Sonobe is active.

Explore More

Publication

Featured researches published by Hironori Sonobe.

Archive | 1991

Vertical heat-treatment apparatus for semiconductor parts

Mitsutoshi Koyama; Koichi Takahashi; Hironori Sonobe

Archive | 1988

Method of manufacturing a semiconductor device having rounded trench corners

Kouichi Takahashi; Hiroshi Kinoshita; Naoto Miyashita; Hironori Sonobe

Archive | 1993

Method of manufacturing semiconductor device having elements isolated by trench

Naoto Miyashita; Koichi Takahashi; Hironori Sonobe

Archive | 1991

Semiconductor device having element regions being electrically isolated from each other

Naoto Miyashita; Koichi Takahashi; Hironori Sonobe; Mitsutoshi Koyama

Archive | 1999

Automatic semiconductor device classification system, method for classifying semiconductor device and recording medium having program for the system

Hideaki Hayashi; Yoshinobu Sawada; Toyohiko Takeda; Hironori Sonobe

Archive | 2002

Process of fabrication of a semiconductor device having element regions being electrically isolated from each other

Naoto Miyashita; Koichi Takahashi; Hironori Sonobe; Mitsutoshi Koyama

Archive | 1998

Method and system for automatically sorting breakdown voltage waveform of semiconductor device

Hideaki Hayashi; Yoshinobu Sawada; Hironori Sonobe; Toyohiko Takeda; 浩徳 園部; 英明 林; 豊彦 武田; 佳伸 澤田

Archive | 1991

Verfahren zur Herstellung einer Halbleiteranordnung mit elektrisch isolierten Komponenten A process for producing a semiconductor device having electrically isolated components

Naoto Miyashita; Koichi Takahashi; Hironori Sonobe; Mitsutoshi Koyama

Archive | 1991

A process for producing a semiconductor device having electrically isolated components

Naoto Miyashita; Koichi Takahashi; Hironori Sonobe; Mitsutoshi Koyama

Archive | 1988

Verfahren zur Herstellung von Halbleiteranordnungen mit Gräben als Isolationszonen A process for producing semiconductor devices with trenches as isolation regions

Kouichi Takahashi; Hiroshi C O Patent D Kinoshita; Naoto Miyashita; Hironori Sonobe

Explore More

Collaboration

Dive into the Hironori Sonobe's collaboration.

Top Co-Authors
Avatar

Naoto Miyashita

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Koichi Takahashi

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Mitsutoshi Koyama

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Kouichi Takahashi

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Hideaki Hayashi

Ebara Corporation

View shared research outputs
Top Co-Authors
Avatar

Toyohiko Takeda

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Yoshinobu Sawada

Toshiba

View shared research outputs
Top Co-Authors
Avatar

Hiroshi Kinoshita

Toshiba

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge