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Dive into the research topics where Hiroshi Tamagaki is active.

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Featured researches published by Hiroshi Tamagaki.


Surface & Coatings Technology | 1990

Reduction in macroparticles during the deposition of TiN films prepared by arc ion plating

K. Akari; Hiroshi Tamagaki; T. Kumakiri; K. Tsuji; E.S. Koh; C.N. Tai

Abstract Preparation of films using the arc ion plating (AIP) process encounters a significant problem in that macroparticles are produced. To overcome this problem, the effect of a modified AIP source, characterized by the presence of a magnetic field on the plasma stream, has been investigated. The surface properties of TiN films were examined by varying the magnetic field strength and the pressure of nitrogen; quantitative measurements were made using an image analyser. It was found that the number of macroparticles could be reduced to 10% of that of the conventional process and that a high deposition rate, similar to that of the conventional process, could be achieved.


IEEE Transactions on Plasma Science | 2009

Electrical and Optical Characteristics of High-Power Pulsed Sputtering Glow Discharge

Kingo Azuma; Ryosuke Mieda; Ken Yukimura; Hiroshi Tamagaki; Tadao Okimoto

Droplet-free metal-plasma sources are promising for enhanced adhesion of deposited films with a smooth surface. High-power pulsed sputtering (HPPS) plasma is an arc-free discharge and a glow-discharge plasma with instantaneous power consumption of several tens of kilowatts, although the average power is the same as conventional sputtering discharge systems. Sputtered metallic species are significantly ionized. In this paper, two metal-plate cathode targets are positioned in parallel to form a gap. A magnetic field with a strength of 0.3 T is oriented parallel to the electric field, and a Penning discharge is generated at the gap. When a negative pulse voltage is applied to the two targets with the same polarity, a glow plasma is generated at the gap. Gas ions are first produced and accelerated toward the target, where metals are sputtered and simultaneously ionized. The plasma source is compact in size (60 times 60 times 60 mm3), with a gap length of 10 mm. The pulsed voltage is rectangular in shape, with amplitude ranging from -600 to -1500 V and pulse-widths of 30 and 100 mus. The repetition rate of the applied pulse is 625 Hz. Electrical and optical characteristics are investigated to determine fundamental characteristics of the HPPS glow metal plasma, and the plasma density are estimated using an electrode immersed in the HPPS glow plasma. The electrode is set nearby the plasma source. With a current-limiting resistor of 10 Omega and an applied voltage of -1200 V, the peak discharge current is approximately 76 A, which results in a peak instantaneous power consumption of approximately 30 kW at an argon gas pressure of 2 Pa. In this case, the consumed energy per pulse is 0.8 J, which corresponds to an average power of 500 W at a repetition rate of 625 Hz. The peak power density at the target surface is approximately 1.3 kW/cm2. The ion density at the holder-electrode set, positioned near the HPPS plasma source, is estimated to be on the order of 1016 m-3, and it is time dependent. Optical emissions from titanium ions with a charge of +1 and excited titanium atoms are observed. Emissions are also observed from argon atoms and ions. Ions are extracted at the holder electrode. It is found that the titanium-ion spectrum intensity is proportional to the argon-ion spectrum intensity. The waveform of the ion current has a sharp peak at the initial stage followed by a stationary state. Thus, the holder electrode is immersed in the plasma, and a transient ion sheath is formed around the holder electrode. It can be shown that the stationary ion current is proportional to the ion density at the surface of the holder electrode.


Surface & Coatings Technology | 1992

The in-line arc ion-plating system for high throughput processing of automobile parts

Hiroshi Tamagaki; K. Tsuji; T. Komuro; F. Kiyota; T. Fujita

Abstract An in-line arc ion-plating system has been developed. The system consists of four isolated chambers, which perform pumping down, pre-heating, coating and cooling independently, and achieves a production throughput of 10–40 cycles day −1 in the case of a 3 μm TiN coating. The system has been applied to tribological coatings for automobile parts, which requires both a high throughput and a high reliability. An example of the application is the chromium nitride coating which results in superior tribological properties, on the compressor parts of car air conditioners as substrates, and production amounting to several hundred thousand pieces per month has been achieved.


Surface & Coatings Technology | 2004

Deposition of α-Al2O3 hard coatings by reactive magnetron sputtering

Toshimitsu Kohara; Hiroshi Tamagaki; Yoshimitsu Ikari; H Fujii


Archive | 2003

Process for producing alumina coating composed mainly of alpha-type crystal structure, alumina coating composed mainly of alpha-type crystal structure, laminate coating including the alumina coating, member clad with the alumina coating or laminate coating, process for producing the member, and physical evaporation apparatu

Toshimitsu Kohara; Yoshimitsu Ikari; Hiroshi Tamagaki


Archive | 2004

Multilayered film having excellent wear resistance, heat resistance and adhesion to substrate and method for producing the same

Toshimitsu Kohara; Hiroshi Tamagaki; Kenji Yamamoto


Archive | 2003

Reactive sputtering method and device

Yoshimitsu Ikari; Hiroshi Tamagaki; Toshimitsu Kohara


Archive | 2008

Continuous film forming apparatus

Hiroshi Tamagaki


Archive | 1995

Vacuum arc deposition device

Hiroshi Tamagaki


Archive | 1994

Arc ion plating device and arc ion plating system

Koji Hanaguri; Kunihiko Tsuji; Homare Nomura; Hiroshi Tamagaki; Hiroshi Kawaguchi; Katsuhiko Shimojima; Hirofumi Fujii; Toshiya Kido; Yoichi Inoue

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