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Featured researches published by Hiroyasu Iimori.


Solid State Phenomena | 2018

Fixed Charge Control of Silylated Surface for Stiction-Free Drying with Surface Energy Reduction Process

Tatsuhiko Koide; Shinsuke Kimura; Takashi Kobayashi; Hiroyasu Iimori; Sugita Tomohiko; Katsuhiro Sato; Yoshihiro Ogawa

Recently, a surface energy reduction process (SERP) for stiction-free drying is used for a high aspect pattern structure like shallow trench isolation (STI). The key technology of SERP is trimethylsilyl (TMS) groups termination of the device surface. To explain the electrical influence of TMS groups was found acceptable by measuring the planar capacitor flat-band voltage shift, and the threshold voltage characteristics of 1x-nm node MOS transistors.


Archive | 2008

Method of treating surface of semiconductor substrate

Hiroshi Tomita; Hiroyasu Iimori; Hisashi Okuchi; Tatsuhiko Koide; Linan Ji


Archive | 2010

Method of treating a semiconductor substrate

Hiroshi Tomita; Tatsuhiko Koide; Hisashi Okuchi; Kentaro Shimayama; Hiroyasu Iimori; Linan Ji


Archive | 2007

Etching apparatus, a method of controlling an etching solution, and a method of manufacturing a semiconductor device

Hisashi Okuchi; Hiroyasu Iimori; Mami Saito; Yoshihiro Ogawa; Hiroshi Tomita; Soichi Nadahara


Archive | 2006

Etching method and apparatus for semiconductor wafers

Yoshihiro Ogawa; Hisashi Okuchi; Hiroshi Tomita; Hiroyasu Iimori


Archive | 2010

Surface treatment agent for semiconductor substrate

Hiroyasu Iimori; Linan Ji; Tatsuhiko Koide; Hisashi Oguchi; Kentaro Shimayama; Hiroshi Tomita


Archive | 2008

Semiconductor substrate cleaning method using bubble/chemical mixed cleaning liquid

Hiroshi Tomita; Hiroyasu Iimori; Hiroaki Yamada; Minako Inukai


Archive | 2005

Filter, substrate treatment apparatus and substrate treatment method

Hiroyasu Iimori; Hisashi Okuchi; Hiroshi Tomita; Yoshihiro Ogawa


228th ECS Meeting (October 11-15, 2015) | 2015

Effect of Surface Energy Reduction for Nano-Structure Stiction

Tatsuhiko Koide; Shinsuke Kimura; Hiroyasu Iimori; Tomohiko Sugita; Katsuhiro Sato; Yohei Sato; Yoshihiro Ogawa


Archive | 2007

Manufacturing method of semiconductor device and etching solution

Hiroshi Tomita; Hiroyasu Iimori

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