Hisae Shimizu

Fast Thin-Film Transistor Circuits Based on Amorphous Oxide Semiconductor

Five-stage ring oscillators (ROs) composed of amorphous In/Ga/Zn/O (a-IGZO) channel thin-film transistors (TFTs) with the channel lengths of 10 mum were fabricated on a glass substrate. The a-IGZO layer was deposited by RF magnetron sputtering onto the unheated substrate. The RO operated at 410 kHz (the propagation delay of 0.24 mus/stage), when supplied with an external voltage of +18 V. This is the fastest integrated circuit based on oxide-semiconductor channel TFTs to date that operates faster than the ROs using conventional hydrogenated amorphous silicon TFTs and organic TFTs

Materials, Devices, and Circuits of Transparent Amorphous-Oxide Semiconductor

This paper presents the following recent investigations of transparent amorphous-oxide semiconductors (TAOS) from materials to devices and circuits. 1) Composition of metals in TAOS are widely explored with the aim of seeking semiconductors suitable for the channel layers of thin-film transistors (TFTs) composing backplanes for flat-panel displays. It is found in combinatorial approaches to the materials exploration that indium-based ternary TAOS (In-X-O) and their TFTs show the properties and the performance as good as those of the most popular material of amorphous In-Ga-Zn-O (alpha-IGZO) when X = Zn or Ge. 2) Defects and impurities in TAOS are investigated by theoretical approaches. The first-principle calculation of the electron states reveals that charge-neutral oxygen vacancy or interstitial forms the density of states around mid-gap level and does not generate carriers directly, while hydrogen impurity raises the Fermi level beyond the conduction-band minimum and acts as a donor in TAOS. 3) Device structures of TAOS-TFTs are also investigated extensively for better performance and stability. It is found in channel-etch type TFTs with bottom-gate inverse-stagger structures that the TFT characteristics and stability are significantly improved by chemically removing the back-channel layer in a wet-etching process. Coplanar homojunction (CH) structure is proposed as a novel device structure where conductive alpha-IGZO regions work as the source and drain electrodes to the channel region of semiconductor alpha-IGZO. The CH TFTs show excellent characteristics and stability, with low series resistance without any difficulty in making good electrical contact between metals and TAOS. 4) Circuits using TAOS-TFTs are demonstrated. A ring oscillator composed of fifteen-stage inverters with a buffer circuit operates as designed by circuit simulation with a TFT model for hydrogenated amorphous Si TFTs. Pixel circuits composed of three TFTs and one transparent capacitor successfully drive organic light-emission diode cells without a planarization layer on a 2-in diagonal panel having 176 times144 times 3 pixels.

Amorphous Avalanche Photodiode with Large Conduction Band Edge Discontinuity

An amorphous avalanche photodiode (APD) with a heterojunction of hydrogenated amorphous silicon carbide (a-SiC:H) and hydrogenated amorphous silicon germanium (a-SiGe:H) was formed. The band gaps of a-SiC:H and a-SiGe:H are 3.5 eV and 1.55 eV, respectively. The discontinuity of conduction bands at the heterojunction is larger than the band gap of a-SiGe:H. In this amorphous APD, photocurrent multiplication is observed under low electric field. The quantum efficiency starts to exceed unity when the conduction band discontinuity becomes larger than the band gap of a lower-gap material, and it is likely to saturate at 2. The slope of photoelectric conversion characteristics is 1.00. The multiplication is explained by the impact ionization process at the band edge discontinuity region.