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Hohle Christoph

Infineon Technologies

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Publication

Featured researches published by Hohle Christoph.

Archive | 2001

Verstärkung von Resiststrukturen aus fluorierten Resistpolymeren durch strukturelles Aufwachsen der Strukturen mittels gezieltem chemischem Anbinden von fluorierten Oligomeren

Rottstegge Joerg; Eschbaumer Christian; Hohle Christoph; Herbst Waltraud; Sebald Michael

Archive | 2003

Chemically-enhanced photo-resist for use, e.g. in the production of structured chips for the semiconductor industry, comprises a solution of acid-labile polymer containing fluorinated cinnamate monomer units

Hohle Christoph; Rottstegge Joerg; Eschbaumer Christian; Sebald Michael

Archive | 2003

Photoresist for lithographic techniques, e.g. structuring silicon wafers, comprises a solution of organopolysiloxane with carbon side chains containing acid-labile groups attached to highly polar groups

Rottstegge Joerg; Kuehn Eberhard; Herbst Waltraud; Eschbaumer Christian; Hohle Christoph; Sebald Michael

Archive | 2008

Testanordnung für molekulare Bauelemente

Klauk Hagen; Elian Klaus; Hohle Christoph; Sebald Michael; Zschieschang Ute; Halik Marcus; Schmid Guenter

Archive | 2008

Hard mask layer structuring method, involves creating structures in resist layers, respectively, transferring structures into hard mask layer in single etching step, and forming hard mask

Hohle Christoph; Choi Kang-Hoon; Bootsmann Maik-Thomas; Keil Katja; Kretz Johannes; Tarek Lutz; Tesauro Mark; Thrum Frank

Archive | 2007

Verfahren zum mehrfachen Bestrahlen eines Resists

Thrum Frank; Kretz Johannes; Choi Kang-Hoon; Hohle Christoph; Elian Klaus

Archive | 2006

Verfahren zum Ausbilden einer Lithografiemaske

Kragler Karl; Herbst Waltraud; Sebald Michael; Hohle Christoph

Archive | 2006

Verfahren zur Silylierung von Fotoresists im UV-Bereich

Ferbitz Jens; Mormann Werner; Rottstegge Joerg; Hohle Christoph; Eschbaumer Christian; Sebald Michael

Archive | 2005

Polymers comprising fluorinated norbornene repeat units useful in photoresists for high-resolution photolithography

Hohle Christoph; Dammel Ralph; Houlihan Michael Francis

Archive | 2004

Chemically reinforced photoresist including a film forming fluorine-containing polymer useful in microchip production has high transparency at 157 nm wavelength, is chemically reinforced, and is simple and cost effective to produce -

Hohle Christoph

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Sebald Michael

Infineon Technologies

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Eschbaumer Christian

Infineon Technologies

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Rottstegge Joerg

Infineon Technologies

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Herbst Waltraud

Infineon Technologies

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Choi Kang-Hoon

Infineon Technologies

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Elian Klaus

Infineon Technologies

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Kretz Johannes

Infineon Technologies

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Thrum Frank

Infineon Technologies

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Dammel Ralph

Infineon Technologies

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Domke Wolf Dieter

Infineon Technologies

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