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Sebald Michael

Infineon Technologies

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Publication

Featured researches published by Sebald Michael.

Archive | 2003

Production of fine resist structures in a photoresist layer during the manufacture of microelectronic components by applying a photoresist layer, applying and exposing 2 masks at different wavelengths and developing resist

Sebald Michael

Archive | 2001

Verstärkung von Resiststrukturen aus fluorierten Resistpolymeren durch strukturelles Aufwachsen der Strukturen mittels gezieltem chemischem Anbinden von fluorierten Oligomeren

Rottstegge Joerg; Eschbaumer Christian; Hohle Christoph; Herbst Waltraud; Sebald Michael

Archive | 2003

Lithografieverfahren zur Verringerung des lateralen Chromstrukturverlustes bei der Fotomaskenherstellung unter Verwendung chemisch verstärkter Resists

Elian Klaus; Sebald Michael

Archive | 2003

Chemically-enhanced photo-resist for use, e.g. in the production of structured chips for the semiconductor industry, comprises a solution of acid-labile polymer containing fluorinated cinnamate monomer units

Hohle Christoph; Rottstegge Joerg; Eschbaumer Christian; Sebald Michael

Archive | 2003

Photoresist for lithographic techniques, e.g. structuring silicon wafers, comprises a solution of organopolysiloxane with carbon side chains containing acid-labile groups attached to highly polar groups

Rottstegge Joerg; Kuehn Eberhard; Herbst Waltraud; Eschbaumer Christian; Hohle Christoph; Sebald Michael

Archive | 2002

Structuring of photoresist layer in integrated circuit manufacture involves exposing photoresist layer comprising film-forming polymer and photosensitive acid generator to light, contacting layer with base and developing after heating

Sebald Michael; Richter Ernst

Archive | 2001

Photoresist composition for integrated circuit production, comprises film-forming polymer giving alkali-soluble groups by acid-catalyzed elimination and groups reacting with amplifying agent and photo- and thermo-acid generators

Sebald Michael; Richter Ernst; Kuehn Eberhard; Falk Gertrud

Archive | 2004

OPTICAL DEVICE SUITABLE FOR MANUFACTURING SEMICONDUCTOR DEVICE AND USED FOR LITHOGRAPHY METHOD, AND OPTICAL LITHOGRAPHY METHOD

Sebald Michael; Richter Ernst-Christian

Archive | 2002

Lithografieverfahren zur Fotomaskenherstellung mittels Elektronenstrahllithografie

Elian Klaus; Sebald Michael

Archive | 2002

Verfahren zur Strukturierung einer Photolackschicht

Sebald Michael; Richter Ernst

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Collaboration

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Hohle Christoph

Infineon Technologies

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Rottstegge Joerg

Infineon Technologies

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Eschbaumer Christian

Infineon Technologies

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Richter Ernst-Christian

Infineon Technologies

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Elian Klaus

Infineon Technologies

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Herbst Waltraud

Infineon Technologies

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Richter Ernst

Infineon Technologies

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Kragler Karl

Infineon Technologies

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Kuehn Eberhard

Infineon Technologies

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Czech Guenther

Infineon Technologies

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