Is this you? Create Your Porfile
Avatar

Holger Möller

Infineon Technologies

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Holger Möller is active.

Explore More

Publication

Featured researches published by Holger Möller.

Archive | 2003

Producing hard mask for semiconductor structure involves providing structured mask layer on hard mask layer, ion implantation, removing structured layer, structuring hard mask layer by selectively etching non-implanted or implanted region

Lars Heineck; Johannes Kowalewski; Holger Möller; Ina Voigt

Archive | 2004

Lithography mask and lithography system for direction-dependent exposure

Christian Dr. Crell; Lothar Bauch; Holger Möller; Ralf Ziebold

Archive | 2003

Verfahren zum Belichten eines fotoempfindlichen Lackes auf einem Halbleiterwafer

Udo Goetschkes; Holger Möller; Alexander Reb; Michael Rogalli; Reiner Trinowitz

Archive | 2004

Forming a pattern on a semiconductor substrate layer comprises applying a photosensitive resist to the substrate, exposing the resist and heating

Oliver Genz; Holger Möller

Archive | 2004

Verfahren zur Bildung eines Musters in einer Schicht auf einem Halbleitersubstrat

Oliver Genz; Holger Möller

Archive | 2003

Lithography mask and lithography system for directional exposure

Lothar Bauch; Christian Dr. Crell; Holger Möller; Ralf Ziebold

Archive | 2003

Lithography system for directional exposure

Lothar Bauch; Christian Dr. Crell; Holger Möller; Ralf Ziebold

Archive | 2003

Method for exposing photosensitive lacquer on semiconductor wafer to form structure pattern in lacquer in manufacture of integrated circuits, forming layer on wafer

Udo Goetschkes; Holger Möller; Alexander Reb; Michael Rogalli; Reiner Trinowitz

Archive | 2003

Lithography mask comprises a structure for transferring a layout onto a substrate, with a blind macrostructure to suppress scattered light

Lothar Bauch; Christian Dr. Crell; Annett Gräser; Holger Möller; Thomas Mülders; Rainer Pforr; Ralf Ziebold

Archive | 2003

Lithographiemaske und Lithographiesystem für richtungsabhängige Belichtung

Lothar Bauch; Christian Dr. Crell; Holger Möller; Ralf Ziebold

Explore More

Collaboration

Dive into the Holger Möller's collaboration.

Top Co-Authors
Avatar

Christian Dr. Crell

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Lothar Bauch

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Ralf Ziebold

Qimonda

View shared research outputs
Top Co-Authors
Avatar

Annett Gräser

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Rainer Pforr

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Thomas Mülders

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Alexander Reb

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Michael Rogalli

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Oliver Genz

Infineon Technologies

View shared research outputs
Top Co-Authors
Avatar

Reiner Trinowitz

Infineon Technologies

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge