Horng-Nan Chern

Method for forming a borderless contact

Method of manufacturing an alignment mark with an etched back dielectric layer and a transparent dielectric layer and a device region on a higher plane with a wiring layer and an isolation region

Method of avoiding sidewall residue in forming connections

METHOD OF REDUCING STRESS BETWEEN A NITRIDE SILICON SPACER AND A SUBSTRATE

Method of forming DRAM capacitors with a native oxide etch-stop

Method for fabricating a hemispherical silicon grain layer

Method for forming semiconductor dielectric layer

Method for increasing the effective spacer width

Method for forming capacitor of memory cell

Method for manufacturing lower electrode of DRAM capacitor