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Hyo-Young Kwon

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Publication

Featured researches published by Hyo-Young Kwon.

Archive | 2013

RESIST UNDERLAYER COMPOSITION, METHOD OF FORMING PATTERNS, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN

Min-Gyum Kim; Hyo-Young Kwon; Jun-Ho Lee; Hwan-Sung Cheon

Archive | 2013

Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition

Yun-Jun Kim; Hyo-Young Kwon; Hea-Jung Kim; Chung-Heon Lee; Youn-Jin Cho; Yoo-Jeong Choi

Archive | 2012

MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION

Yun-Jun Kim; Hwan-Sung Cheon; Youn-Jin Cho; Yong-Woon Yoon; Chung-Heon Lee; Hyo-Young Kwon; Yoo-Jeong Choi

Archive | 2012

MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION

Yoo-Jeong Choi; Hyo-Young Kwon; Youn-Jin Cho; Yun-Jun Kim; Young-Min Kim; Yong-Woon Yoon; Chung-Heon Lee

Archive | 2013

Composition pour film de sous-couche de réserve et procédé de formation de motif

Hyo-Young Kwon; 권효영; Hwan-Sung Cheon; 전환승

Archive | 2013

Positive Photosensitive Resin Composition, and Organic Insulator Film for Display Device and Display Device Fabricated Using the Same

Jun-Ho Lee; Hyo-Young Kwon; Hwan-Sung Cheon

Archive | 2013

Composition for resist lower layer film, method for forming pattern using same, and semiconductor integrated circuit device comprising pattern

Min-Gyum Kim; 김민겸; Hyo-Young Kwon; 권효영; Jun-Ho Lee; 이준호; Hwan-Sung Cheon; 전환승

Archive | 2012

Monomer coupled with thermal acid generator, polymer gained from monomer coupled with thermal acid generator, composition for resist underlayer film including polymer, and method for forming pattern using composition for resist underlayer film

Hyo-Young Kwon; 권효영; Seung-Wook Shin; 신승욱; Sung-Jae Lee; 이성재; Youn-Jin Cho; 조연진

Archive | 2012

Dérivé d'acide cyanurique, composition de sous-couche de résist comprenant le dérivé d'acide cyanyrique et procédé de formation de motif utilisant la composition de sous-couche de résist

Seung-Wook Shin; 신승욱; Hyo-Young Kwon; 권효영; Sung-Jae Lee; 이성재; Youn-Jin Cho; 조연진

Archive | 2012

Cyanuric acid derivative, resist underlayer composition comprising the cyanuric acid derivative, and pattern forming method using the resist underlayer composition

Seung-Wook Shin; 신승욱; Hyo-Young Kwon; 권효영; Sung-Jae Lee; 이성재; Youn-Jin Cho; 조연진

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Hwan-Sung Cheon

Samsung

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Chung-Heon Lee

Samsung

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Yun-Jun Kim

Samsung

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Yong-Woon Yoon

Samsung

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Hea-Jung Kim

Samsung

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Sung-Jae Lee

Korea Institute of Science and Technology

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김민겸

Samsung

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김영민

LG Chem

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