I. Molina-Fernandez

Waveguide grating coupler with subwavelength microstructures

We propose a silicon waveguide-fiber grating coupler that uses a subwavelength microstructure to achieve a continuously variable grating strength yet can be fabricated using only a single etch step. By adjusting the subwavelength microstructure at every point along the grating, the grating coupler can be optimized to give high field overlap with the optical fiber mode and also minimize backreflections along the incident waveguide path. Our design example is optimized for quasi-TM mode in a silicon photonic-wire waveguide, as required for waveguide evanescent-field-sensing applications. A field overlap of up to 94% with a standard single-mode optical fiber (SMF-28) is achieved by coupler apodization. Backreflection from the grating is reduced to ~0.1%, and the total predicted photonic wire to fiber coupling efficiency is 50%.

Continuously apodized fiber-to-chip surface grating coupler with refractive index engineered subwavelength structure

We demonstrate a fully etched, continuously apodized fiber-to-chip surface grating coupler for the first time (to our knowledge). The device is fabricated in a single-etch step and operates with TM-polarized light, achieving a coupling efficiency of 3.7 dB and a 3 dB bandwidth of 60 nm. A subwavelength microstructure is employed to generate an effective medium engineered to vary the strength of the grating and thereby maximize coupling efficiency, while mitigating backreflections at the same time. Minimum feature size is 100 nm for compatibility with deep-UV 193 nm lithography.

Colorless directional coupler with dispersion engineered sub-wavelength structure

Directional couplers are extensively used devices in integrated optics, but suffer from limited operational wavelength range. Here we use, for the first time, the dispersive properties of sub-wavelength gratings to achieve a fivefold enhancement in the operation bandwidth of a silicon-on-insulator directional coupler. This approach does not compromise the size or the phase response of the device. The sub-wavelength grating based directional coupler we propose covers a 100 nm bandwidth with an imbalance of ≤ 0.6 dB between its outputs, as supported by full 3D FDTD simulations.

Wavelength independent multimode interference coupler.

We propose an ultra-broadband multimode interference (MMI) coupler with a wavelength range exceeding the O, E, S, C, L and U optical communication bands. For the first time, the dispersion property of the MMI section is engineered using a subwavelength grating structure to mitigate wavelength dependence of the device. We present a 2 × 2 MMI design with a bandwidth of 450nm, an almost fivefold enhancement compared to conventional designs, maintaining insertion loss, power imbalance and MMI phase deviation below 1dB, 0.6dB and 3°, respectively. The design is performed using an in-house tool based on the 2D Fourier Eigenmode Expansion Method (F-EEM) and verified with a 3D Finite Difference Time Domain (FDTD) simulator.

A Design Procedure for High-Performance, Rib-Waveguide-Based Multimode Interference Couplers in Silicon-on-Insulator

Single mode silicon-on-insulator rib waveguides offer a weak lateral confinement, which makes it difficult to design high-performance multimode interference couplers (MMIs) based on these waveguides. Here, a complete design procedure for single etch step MMIs with tapered rib access waveguides is presented, which yields low excess loss (0.1 dB) and good imbalance (0.02 dB). Furthermore, polarization dependence is low, and high fabrication tolerances are achieved, especially with respect to etch depth.

Evanescent field waveguide sensing with subwavelength grating structures in silicon-on-insulator.

We explore, to the best of our knowledge, the potential of diffractionless subwavelength grating waveguides for sensing applications. We show that by subwavelength patterning of silicon-wire waveguides the field delocalization can be engineered to increase the sensitivity. Fully vectorial 3D-FDTD simulations confirm the sensitivity enhancement, achieving sensitivities of 0.83  RIU/RIU and 1.5·10(-3)  RIU/nm for bulk and surface sensing, respectively, which compare favorably to state-of-the-art sensing waveguides.

Recent Advances in Silicon Waveguide Devices Using Sub-Wavelength Gratings

As most integrated optics platforms, silicon offers only a fixed set of material refractive indices for designing devices. The ability of sub-wavelength patterned structures to synthesize arbitrary equivalent index values between nSi ~ 3.5 and nair=1 has thus enabled completely new design approaches that have led to silicon waveguide devices with breakthrough performance. This review covers the latest advances in sub-wavelength structured fiber-to-chip grating couplers and multimode interference couplers. We discuss, among others, single-etch grating couplers with high coupling efficiency ( -1.8 dB), and broad bandwidth ( 115 nm at 3 dB), as well as ultra-short, high performance multi-mode interference couplers. We furthermore introduce the concept of dispersion engineering with sub-wavelength structures, showing its potential to increase the bandwidth of waveguide devices, including multi-mode interference couplers covering a 450 nm wavelength span.

Suspended SOI waveguide with sub-wavelength grating cladding for mid-infrared

We present a new type of mid-infrared silicon-on-insulator (SOI) waveguide. The waveguide comprises a sub-wavelength lattice of holes acting as lateral cladding while at the same time allowing for the bottom oxide (BOX) removal by etching. The waveguide loss is determined at the wavelength of 3.8 μm for structures before and after being underetched using both vapor phase and liquid hydrofluoric acid (HF). A propagation loss of 3.4 dB/cm was measured for a design with a 300 nm grating period and 150 nm holes after partial removal (560 nm) of BOX by vapor phase HF etching. We also demonstrate an alternative design with 550 nm period and 450 nm holes, which allows a faster and complete removal of the BOX by liquid phase HF etching, yielding the waveguide propagation loss of 3.6 dB/cm.

Efficient fiber-to-chip grating coupler for micrometric SOI rib waveguides

Grating couplers are an efficient means for fiber to chip coupling, as they require no facet preparation and enable wafer scale testing. While grating couplers are commonly used in silicon wire waveguides, their application to micrometric silicon-on-insulator rib waveguides is complicated due to the presence of high-order Bloch modes. We study the Bloch modes behavior and their excitation determined by access waveguide design. The latter is implemented to enable single Bloch mode excitation. The use of a design process based on modal analysis is proposed. A grating coupler is proposed in silicon-on-insulator with 1.5 microm thick silicon layer that achieves a coupling efficiency of 65.6% at 1.55 microm. The structure, including interconnection waveguides, access waveguide and grating can be fabricated using a single lithography step.

High-Performance Multimode Interference Coupler in Silicon Waveguides With Subwavelength Structures

The performance of multimode interference (MMI) couplers in silicon waveguides is limited by the high lateral refractive index contrast. Here we propose the use of subwavelength gratings (SWGs) in the lateral cladding regions of the MMI to reduce the index contrast. Our approach significantly reduces the mode phase error while at the same time allowing a single etch step process. Using a z-periodic lateral SWG, we design a 2 × 4 MMI that operates as a 90° hybrid for a coherent optical receiver. This complex device exhibits a common mode rejection ratio (CMRR) and a phase error of less than -24 dBe and 2°, respectively, over the full C-band. Compared to MMI with a homogenous lateral cladding, using subwavelength refractive index engineering effectively extends the receiver bandwidth from 36 to 60 nm.