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Dive into the research topics where Isao Matsushima is active.

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Featured researches published by Isao Matsushima.


Optics Letters | 2006

10 kHz 40 W Ti:sapphire regenerative ring amplifier.

Isao Matsushima; Hidehiko Yashiro; Toshihisa Tomie

A Ti:sapphire regenerative ring amplifier is developed. The power of 40 W before compression and 26 W after compression are achieved at 10 kHz repetition rate. Thermal distortion of a compressor grating is reduced by air flow cooling.


Optics Communications | 2003

KrF laser picosecond pulse source by stimulated scattering processes

Eiichi Takahashi; Leonid L. Losev; Yuji Matsumoto; Isao Okuda; Isao Matsushima; Susumu Kato; Hirotaka Nakamura; Kenji Kuwahara; Yoshiro Owadano

A new short-pulse KrF laser source was developed by combining stimulated scattering processes, namely, Raman, Brillouin, and four-wave-mixing (FWM). Short pulses of 1.1 ps were obtained from 4 ns oscillator output. Only two commercial discharge KrF lasers are required for this system. This method is very simple and could be extended to an ArF laser wavelength in principle.


Optics Communications | 2000

High-intensity short KrF laser-pulse generation by saturated amplification of truncated leading-edge pulse

Eiichi Takahashi; Kenji Kuwahara; Yuji Matsumoto; Isao Okuda; Isao Matsushima; Susumu Kato; Yoshiro Owadano

Abstract A new method for the generation of high-intensity short KrF laser pulses was developed. The method efficiently uses truncated leading-edge seed-pulse generation by stimulated Brillouin scattering and pulse-shape steepening by saturated amplification, which is mainly based on the Frantz–Nodvik solution. Short KrF pulses of 7 ps were obtained from 20 ns seed pulses without using mode-locked lasers. The experimental results agreed well with the numerical calculations.


Emerging Lithographic Technologies VII | 2003

Use of tin as a plasma source material for high conversion efficiency

Toshihisa Tomie; Tatsuya Aota; Yoshifumi Ueno; Gohta Niimi; Hidehiko Yashiro; Jingqian Lin; Isao Matsushima; Kazumasa Komiyama; Dong-Hoon Lee; Kentaro Nishigori; Hiroshi Yokota

Debris-free generation of a tin plasma was demonstrated in the cavity-confined configuration. Narrow band emission at 13.7-nm was observed in an emission spectrum of a cavity confined tin plasma. The spectral efficiency was as high as 12% and we found the conversion efficiency could reach 6%/2π str ultimately while lots of works are required to achieve this value. We also confirmed a magnetic field has some effect of stopping a plasma.


Japanese Journal of Applied Physics | 2005

A 37% Efficiency, Kilohertz Repetition Rate Cryogenically Cooled Ti:Sapphire Regenerative Amplifier

Isao Matsushima; Hidehiko Yashiro; Toshihisa Tomie

We present a high-efficiency Ti:sapphire regenerative amplifier being developed as a pumping laser for a high-brilliance laser-plasma X-ray source operating at a multi-kHz repetition rate. A ring resonator is adopted for stable single transverse mode operation and a laser rod is cryogenically cooled to suppress the strong thermal lens effect. By reducing losses in the resonator and by matching the pumping mode volume with the resonator mode, the conversion efficiency is increased to 37%. The output power is 7.4 W when pumped by a 1 kHz 20 W green laser.


Fusion Engineering and Design | 1999

Overview of `Super-ASHURA' KrF Laser Program

Yoshiro Owadano; Isao Okuda; Yuji Matsumoto; Isao Matsushima; Eiichi Takahashi; Eisuke Miura; Hidehiko Yashiro; Toshihisa Tomie; Kenji Kuwahara; M Shinbo

Abstract In the Super-ASHURA KrF Laser at ETL, a main amplifier with full pumping duration (270 ns) and 12 beam lines have been completed. At present, total output energy of 2.7 kJ has been extracted from the main amplifier by double-pass amplified 12 beams (20 ns×12) with an aperture filling factor of 74%. Local intrinsic efficiency has reached 10%. In the Raman amplification which is to be used for high peak power pulse generation, multi-pass forward amplification of nanosecond Stokes pulse showed an energy conversion efficiency of 73%. Also, a multi-joule short Stokes pulse (150 ps) has been obtained from 12.5 J, and 20 ns pulse by saturated backward amplification of a self-generated Stokes pulse. To investigate the effect of irradiation smoothness, the two-dimensional profile of the target rear surface displacement has been measured by using short (


Optics Communications | 1991

Beam smoothing by broadband random-phase irradiation

Isao Matsushima; Yoshiro Owadano; Yuji Matsumoto; Isao Okuda; Toshihisa Tomie; K. Koyama; R. Staffin; M. Yano

Abstract A new technique is proposed to achieve smooth laser irradiation profiles on laser fusion targets employing the broad bandwidth of KrF lasers. In this technique, smoothing is obtained by using a spectral dispersing optical device and a random-phase plate placed in front of a focusing lens. Experimental results demonstrate that this simple optical system is effective for smooth irradiation on targets.


Optics Communications | 1995

Two-dimensional beam smoothing by broadband random-phase irradiation

Isao Matsushima; Toshihisa Tomie; Yuji Matsumoto; Isao Okuda; Eisuke Miura; Hidehiko Yashiro; Eiichi Takahashi; Yoshiro Owadano

A new technique for two-dimensional smoothing is proposed to generate smooth laser irradiation profiles on laser fusion targets employing the broad bandwidth of KrF lasers. In this technique, a wedged etalon is used to get angular dispersion to the orthogonal direction to the one-dimensional broadband random-phase smoothing effect. The preliminary experiment has demonstrated its effectiveness.


Emerging Lithographic Technologies VIII | 2004

Particle-cluster tin target for a high conversion efficiency LPP source for EUVL

Toshihisa Tomie; Tatsuya Aota; Jing Quan Lin; Yoshifumi Ueno; Hidehiko Yashiro; Noriaki Kandaka; Hiroki Moriwaki; Gohta Niimi; Isao Matsushima; Kentaro Nishigori

Particle-cluster tin target is presented as the solution of a 100W EUV source for EUVL. Theory for maximizing conversion efficiency of a laser-produced plasma is derived and the theory is experimentally confirmed by using a dispersed SnO2 particles. The EUV intensity 4 times higher than that from a plasma on a solid Sn plate target is observed at the optimized density. The achieved conversion efficiency for dispersed particles is estimated to be as high as 3%/(2π str 2%BW) or higher from the value for a Sn plate of 0.8% measured by using two multilayer mirrors and a calibrated photodiode. Theoretical consideration reveals that larger diameter plasma enables higher EUV power. The particle-cluster can be delivered at multi kHz rep-rate by using water droplet. Experimental confirmation of delivering particles by droplets is also reported.


Japanese Journal of Applied Physics | 2001

High-Repetition-Rate Electron-Beam-Pumped KrF Laser Technology for Inertial-Fusion-Energy Drivers

Isao Okuda; Eiichi Takahashi; Isao Matsushima; Yuji Matsumoto; Susumu Kato; Yoshiro Owadano

The development of a high-repetition-rate (rep-rate) electron-beam (e-beam)-pumped KrF laser is described. In this study, we aim to achieve pulsed laser outputs of 20 J/80 ns at a rep rate of 1 Hz. The key issues are heat management in the diode foils and introduction of long-lifetime switches into the pulsed-power system. E-beam generation experiments have been started with initial test results of twenty consecutive shots at 1 Hz. Improvement in the energy-transfer efficiency in the rep-rate pulsed-power systems is also discussed.

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Isao Okuda

National Institute of Advanced Industrial Science and Technology

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Toshihisa Tomie

National Institute of Advanced Industrial Science and Technology

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Eiichi Takahashi

National Institute of Advanced Industrial Science and Technology

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Yoshiro Owadano

National Institute of Advanced Industrial Science and Technology

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Hidehiko Yashiro

National Institute of Advanced Industrial Science and Technology

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Eisuke Miura

National Institute of Advanced Industrial Science and Technology

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Susumu Kato

National Institute of Advanced Industrial Science and Technology

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Y. Owadano

Rutherford Appleton Laboratory

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