J. Dorsaz

Current status of AlInN layers lattice-matched to GaN for photonics and electronics

We report on the current properties of Al1-x InxN (x approximate to 0.18) layers lattice- matched ( LM) to GaN and their specific use to realize nearly strain- free structures for photonic and electronic applications. Following a literature survey of the general properties of AlInN layers, structural and optical properties of thin state- of- the- art AlInN layers LM to GaN are described showing that despite improved structural properties these layers are still characterized by a typical background donor concentration of ( 1 - 5) x 10(18) cm(-3) and a large Stokes shift (similar to 800 meV) between luminescence and absorption edge. The use of these AlInN layers LM to GaN is then exemplified through the properties of GaN/ AlInN multiple quantum wells ( QWs) suitable for near- infrared intersubband applications. A built- in electric field of 3.64MVcm(-1) solely due to spontaneous polarization is deduced from photoluminescence measurements carried out on strain- free single QW heterostructures, a value in good agreement with that deduced from theoretical calculation. Other potentialities regarding optoelectronics are demonstrated through the successful realization of crack- free highly reflective AlInN/ GaN distributed Bragg reflectors ( R > 99%) and high quality factor microcavities ( Q > 2800) likely to be of high interest for short wavelength vertical light emitting devices and fundamental studies on the strong coupling regime between excitons and cavity photons. In this respect, room temperature ( RT) lasing of a LM AlInN/ GaN vertical cavity surface emitting laser under optical pumping is reported. A description of the selective lateral oxidation of AlInN layers for current confinement in nitride- based light emitting devices and the selective chemical etching of oxidized AlInN layers is also given. Finally, the characterization of LM AlInN/ GaN heterojunctions will reveal the potential of such a system for the fabrication of high electron mobility transistors through the report of a high two- dimensional electron gas sheet carrier density ( n(s) similar to 2.6 x 10(13) cm(-2)) combined with a RT mobility mu(e) similar to 1170 cm(2) V-1 s(-1) and a low sheet resistance, R similar to 210 Omega square.

Recent progress in the growth of highly reflective nitride-based distributed Bragg reflectors and their use in microcavities

The growth of highly-reflective nitride-based distributed Bragg reflectors (DBRs) and their use in vertical cavity structures is reviewed. We discuss the various nitride material systems employed to design Bragg mirrors and microcavities, namely the Al-x(Ga)(1-x)N/(Al)(y)Ga1-yN and the lattice-matched Al1-xInxN/GaN (x(ln) similar to 18%)-based systems. An emphasis on particular issues such as strain management, internal absorption, alloy morphology and contribution of leaky modes is carried out. Specific properties of the poorly known AlInN alloy such as the bandgap variation with In content close to lattice-matched conditions to GaN are reported. The superior optical quality of the lattice-matched AlInN/GaN system for the realization of nitride-based DBRs is demonstrated. The properties of nitride-based vertical cavity devices are also described. Forthcoming challenges such as the realization of electrically pumped vertical cavity surface emitting lasers and strongly coupled quantum microcavities are discussed as well, and in particular critical issues such as vertical current injection.

Broadband blue superluminescent light-emitting diodes based on GaN

We report on the achievement of III-nitride blue superluminescent light-emitting diodes on GaN substrates. The epitaxial structure includes an active region made of In0.12Ga0.88N quantum wells in a GaN/AlGaN waveguide. Superluminescence under cw operation is observed at room temperature for a current of 130 mA and a current density of 8 kA/cm2. The central emission wavelength is 420 nm and the emission bandwidth is ∼5 nm in the superluminescence regime. A peak optical output power of 100 mW is obtained at 630 mA under pulsed operation and an average power of 10 mW is achieved at a duty cycle of 20%.

High Power Blue-Violet Superluminescent Light Emitting Diodes with InGaN Quantum Wells

We report on the characteristics of blue superluminescent light emitting diodes based on the emission of InGaN quantum wells. Narrow ridge-waveguide devices realized by standard processing techniques and with extremely low facet reflectivity show single lateral mode emission and continuous-wave output powers >35 mW with a typical spectral bandwidth of 4–5 nm. Tuning the composition of the active region, superluminescent light emitting diodes spanning all the spectral range between 410 and 445 nm could be realized. The light output is highly directional and results in a coupling efficiency into single mode fibers >50%. The device temperature behavior is also discussed.

Low temperature p-type doping of (Al)GaN layers using ammonia molecular beam epitaxy for InGaN laser diodes

We demonstrate state-of-the-art p-type (Al)GaN layers deposited at low temperature (740 °C) by ammonia molecular beam epitaxy (NH3-MBE) to be used as top cladding of laser diodes (LDs) with the aim of further reducing the thermal budget on the InGaN quantum well active region. Typical p-type GaN resistivities and contact resistances are 0.4 Ω cm and 5 × 10−4 Ω cm2, respectively. As a test bed, we fabricated a hybrid laser structure emitting at 400 nm combining n-type AlGaN cladding and InGaN active region grown by metal-organic vapor phase epitaxy, with the p-doped waveguide and cladding layers grown by NH3-MBE. Single-mode ridge-waveguide LD exhibits a threshold voltage as low as 4.3 V for an 800 × 2 μm2 ridge dimension and a threshold current density of ∼5 kA cm−2 in continuous wave operation. The series resistance of the device is 6 Ω and the resistivity is 1.5 Ω cm, confirming thereby the excellent electrical properties of p-type Al0.06Ga0.94N:Mg despite the low growth temperature.

AlGaN-Free Blue III–Nitride Laser Diodes Grown on c-Plane GaN Substrates

We report on the fabrication of InGaN-based multiple-quantum-well laser diodes (LDs) emitting at 420 nm. Structures with standard claddings (p- and n-AlGaN), asymmetric claddings (p-GaN and n-AlGaN), and AlGaN-free claddings were grown by metal organic vapor phase epitaxy on polar c-plane free-standing GaN substrates. Electrical and optical properties of each LD are presented. Thanks to an optimized design of the InGaN waveguide and active region, cw lasing of a completely AlGaN-free laser diode is demonstrated, with a threshold current density <5 kA/cm2 and a differential efficiency per facet of ~0.4 W/A without high-reflection coatings.

Self-Pulsation at Zero Absorber Bias in GaN-Based Multisection Laser Diodes

We study the influence of pump current and absorber bias voltage on the pulse width and frequency of sustained pulsation in GaN-based multisection laser diodes. The observed frequencies and pulse widths range from 1.5 to 4.5 GHz and 90 to 18 ps, respectively. Negative absorber bias is found to reduce the pulsation frequency and increase the pulse width. This behavior is explained by the tuneability of absorption and charge carrier lifetime in the absorber via the applied bias voltage.

Mode locking in monolithic two-section InGaN blue-violet semiconductor lasers

Passive mode-locked pulses with repetition frequencies in the range 40 to 90 GHz were observed in blue-violet GaN-based quantum-well lasers without external cavities. The lasers had two-section geometry with built-in saturable absorber section. The individual pulses had durations as short as 3–5 ps at peak powers of around 320 mW.

Static and dynamic properties of multi-section InGaN-based laser diodes

We have studied multi-section InGaN multiple-quantum-well (MQW) laser diodes grown on c-plane freestanding GaN substrate consisting of an absorber section (AS) and an amplifier gain section. As a result of the interplay between external bias applied to the AS and the internal piezoelectric and spontaneous polarization fields inherent to c-plane InGaN MQWs, the devices exhibit non-linear non-monotonic variations of the threshold current due to the quantum-confined Stark effect that takes place in the AS MQWs. We report on how this effect tailors the lasing characteristics and lasing dynamics, leading from a steady-state cw lasing regime for an unbiased AS to self-pulsation and Q-switching regimes at high negative absorber bias.

InGaN laser diodes emitting at 500 nm with p-layers grown by molecular beam epitaxy

We demonstrate hybrid laser diodes by combining n-type layers and an active region grown by metal organic vapor phase epitaxy with p-type layers grown by molecular beam epitaxy. These p-doped layers, grown at 740 degrees C, exhibit state-of-the-art electrical characteristics and prevent the indium-rich quantum wells from thermal degradation. Narrow ridge-waveguide lasers with high-reflectivity coatings show a threshold current density of 9.7 kA.cm(-2), a threshold voltage of 5.4V, and a lasing wavelength of 501 nm. The internal optical loss and material gain of the epitaxial structures are also measured and discussed