J. F. Klem

Time-resolved optical measurements of minority carrier recombination in a mid-wave infrared InAsSb alloy and InAs/InAsSb superlattice

Measurements of carrier recombination rates using time-resolved differential transmission are reported for an unintentionally doped mid-wave infrared InAsSb alloy and InAs/InAsSb superlattice. Measurements at 77 K yield minority carrier lifetimes of 3 μs and 9 μs for the InAsSb alloy and InAs/InAsSb superlattice, respectively. The un-optimized InAsSb-based materials also exhibit long lifetimes (>850 ns) at temperatures up to 250 K, indicating the potential use for these materials as mid-wave infrared photodetectors with improved performance over current type-II superlattice photodetectors at both cryogenic and near-ambient operating temperatures.

Minority carrier diffusion and defects in InGaAsN grown by molecular beam epitaxy

To gain insight into the nitrogen-related defects of InGaAsN, nitrogen vibrational mode spectra, Hall mobilities, and minority carrier diffusion lengths are examined for InGaAsN (1.1 eV band gap) grown by molecular beam epitaxy (MBE). Annealing promotes the formation of In–N bonding, and lateral carrier transport is limited by large scale (≫mean free path) material inhomogeneities. Comparing solar cell quantum efficiencies with our earlier results for devices grown by metalorganic chemical vapor deposition (MOCVD), we find significant electron diffusion in the MBE material (reversed from the hole diffusion in MOCVD material), and minority carrier diffusion in InGaAsN cannot be explained by a “universal,” nitrogen-related defect.

Electrical and optical characteristics of AlAsSb/GaAsSb distributed Bragg reflectors for surface emitting lasers

We demonstrate an undoped 20 1/2 pair AlAsSb/GaAsSb distributed Bragg reflector (DBR) grown lattice matched to an InP substrate by molecular beam epitaxy. Reflectivity measurements indicate a stop band centered at 1.78 μm with a maximum reflectivity exceeding 99%. We also measure current–voltage characteristics in a similar 10 1/2 period p‐type DBR and find that a current density of 1 kA/cm2 produces a 2.5 V drop. Hole mobilities and doping concentrations in AlAsSb and GaAsSb are also reported.

HIGHLY REFLECTIVE, LONG WAVELENGTH ALASSB/GAASSB DISTRIBUTED BRAGG REFLECTOR GROWN BY MOLECULAR BEAM EPITAXY ON INP SUBSTRATES

Surface normal optoelectronic devices operating at long wavelengths (≳1.3 μm), require distributed Bragg reflectors (DBRs) with a practical number (≤50) of mirror layers. This requirement implies a large refractive index difference between the mirror layers, which is difficult to achieve in the traditionally used phosphide compounds. We demonstrate a highly reflective AlAsSb/GaAsSb DBR grown nominally lattice matched to an InP substrate by molecular beam epitaxy. Reflectivity measurements indicate a stop band centered at 1.74 μm with maximum reflectivity exceeding 98%, which is well fitted by our theoretical predictions. Atomic force microscopy and transmission electron microscopy indicate reasonable crystal quality with some defects due to an unintentional lattice mismatch to the substrate.

Phased-array sources based on nonlinear metamaterial nanocavities

Coherent superposition of light from subwavelength sources is an attractive prospect for the manipulation of the direction, shape and polarization of optical beams. This phenomenon constitutes the basis of phased arrays, commonly used at microwave and radio frequencies. Here we propose a new concept for phased-array sources at infrared frequencies based on metamaterial nanocavities coupled to a highly nonlinear semiconductor heterostructure. Optical pumping of the nanocavity induces a localized, phase-locked, nonlinear resonant polarization that acts as a source feed for a higher-order resonance of the nanocavity. Varying the nanocavity design enables the production of beams with arbitrary shape and polarization. As an example, we demonstrate two second harmonic phased-array sources that perform two optical functions at the second harmonic wavelength (∼5 μm): a beam splitter and a polarizing beam splitter. Proper design of the nanocavity and nonlinear heterostructure will enable such phased arrays to span most of the infrared spectrum.

Interband-cascade infrared photodetectors with superlattice absorbers

Interband-cascade infrared photodetectors (ICIPs), composed of discrete superlattice absorbers, are demonstrated at temperatures up to 350 K with a cutoff wavelength near 5 μm at 80 K to beyond 7 μm above room temperature. The peak responsivity exceeds 200 mA/W, higher than the values reported from early interband cascade laser structures, suggesting a significantly enhanced quantum efficiency of the superlattice absorbers. A theoretical model, originally developed for quantum well infrared photodetectors (QWIPs), is applied to ICIPs to analyze their device performance. The Johnson-limited and background-limited detectivities are extracted and indicate that background-limited performance temperatures for two ICIP structures are 126 and 105 K at 5 μm. It is expected that optimized ICIPs will provide improved performance by combining the advantages of conventional photodiodes and the discrete nature of QWIPs and IC lasers.

Dislocation formation mechanism in strained InxGa1−xAs islands grown on GaAs(001) substrates

The formation mechanism of misfit dislocations in lattice‐mismatched InxGa1−xAs epilayers (0.2≤x≤1) grown on GaAs substrates has been investigated experimentally. The results suggest that 1/3〈111〉 Frank partial dislocations are grown‐in at island edges in highly lattice‐mismatched epilayers (x≥0.4). Then after further island growth 90° Shockley partial dislocations are nucleated to remove the stacking faults, reacting with the Frank partials to form complete 90° dislocations. An atomic model is proposed to explain the formation mechanism of the Frank partial dislocation. This model could explain the observed change in the dominant type of dislocation from the 60° at small mismatches to 90° edge dislocations at large lattice mismatches.

Identification of dominant recombination mechanisms in narrow-bandgap InAs/InAsSb type-II superlattices and InAsSb alloys

Minority carrier lifetimes in doped and undoped mid-wave infrared InAs/InAsSb type-II superlattices (T2SLs) and InAsSb alloys were measured from 77–300 K. The lifetimes were analyzed using Shockley-Read-Hall (SRH), radiative, and Auger recombination, allowing the contributions of the various recombination mechanisms to be distinguished and the dominant mechanisms identified. For the T2SLs, SRH recombination is the dominant mechanism. Defect levels with energies of 130 meV and 70 meV are determined for the undoped and doped T2SLs, respectively. The alloy lifetimes are limited by radiative and Auger recombination through the entire temperature range, with SRH not making a significant contribution.

GaAsSb/InGaAs type-II quantum wells for long-wavelength lasers on GaAs substrates

The authors have investigated the properties of GaAsSb/InGaAs type-II bilayer quantum well structures grown by molecule beam epitaxy for use in long-wavelength lasers on GaAs substrates. Structures with layer, strains and thicknesses designed to be thermodynamically stable against dislocation formation exhibit room-temperature photoluminescence at wavelengths as long as 1.43 {mu}m. The photoluminescence emission wavelength is significantly affected by growth temperature and the sequence of layer growth (InGaAs/GaAsSb vs GaAsSb/InGaAs), suggesting that Sb and/or In segregation results in non-ideal interfaces under certain growth conditions. At low injection currents, double heterostructure lasers with GaAsSb/InGaAs bilayer quantum well active regions display electroluminescence at wavelengths comparable to those obtained in photoluminescence, but at higher currents the electroluminescence shifts to shorter wavelengths. Lasers have been obtained with threshold current densities as low as 120 A/cm{sup 2} at 1.17 {mu}m, and 2.1 kA/cm{sup 2} at 1.21 {mu}m.

Characterization of thin AlGaAs/InGaAs/GaAs quantum‐well structures bonded directly to SiO2/Si and glass substrates

Strained GaAs/InGaAs/AlGaAs quantum‐well structures grown on GaAs have been removed from their original substrates by a lift‐off process and bonded directly to glass or SiO2‐coated Si substrates. Both undoped and modulation‐doped structures have been characterized before and after transfer by Hall measurements, variable temperature x‐ray diffraction, and photoluminescence. The bonded structures retain the high quality of the as‐grown layers.