J. J. Zhang

X-ray Nanodiffraction on a Single SiGe Quantum Dot inside a Functioning Field-Effect Transistor

For advanced electronic, optoelectronic, or mechanical nanoscale devices a detailed understanding of their structural properties and in particular the strain state within their active region is of utmost importance. We demonstrate that X-ray nanodiffraction represents an excellent tool to investigate the internal structure of such devices in a nondestructive way by using a focused synchotron X-ray beam with a diameter of 400 nm. We show results on the strain fields in and around a single SiGe island, which serves as stressor for the Si-channel in a fully functioning Si–metal–oxide semiconductor field-effect transistor.

Monolithic Growth of Ultrathin Ge Nanowires on Si(001)

Self-assembled Ge wires with a height of only 3 unit cells and a length of up to 2 micrometers were grown on Si(001) by means of a catalyst-free method based on molecular beam epitaxy. The wires grow horizontally along either the [100] or the [010] direction. On atomically flat surfaces, they exhibit a highly uniform, triangular cross section. A simple thermodynamic model accounts for the existence of a preferential base width for longitudinal expansion, in quantitative agreement with the experimental findings. Despite the absence of intentional doping, the first transistor-type devices made from single wires show low-resistive electrical contacts and single-hole transport at sub-Kelvin temperatures. In view of their exceptionally small and self-defined cross section, these Ge wires hold promise for the realization of hole systems with exotic properties and provide a new development route for silicon-based nanoelectronics.

Compositional evolution of SiGe islands on patterned Si (001) substrates

The authors investigate, by atomic-force-microscopy-based nanotomography, the composition evolution of ordered SiGe islands grown on pit-patterned Si (001) substrates as their size and aspect ratio increase with increasing Ge deposition. Compared to islands grown on flat substrates, the ordered island arrays show improved size, shape, and compositional homogeneity. The three-dimensional composition profiles of individual pyramids, domes, and barns reveal that the Ge fraction at the base and in subsurface regions of the islands decreases with increasing amount of deposited Ge.

Strain engineering in Si via closely stacked, site-controlled SiGe islands

The authors report on the fabrication and detailed structural characterization of ordered arrays of vertically stacked SiGe/Si(001) island pairs. By a proper choice of growth parameters, islands which have both large sizes and high Ge fraction are obtained in the upper layer. Finite element method calculations of the strain distribution reveal that (i) the Si spacer between a pair of islands can act as a lateral quantum dot molecule made of four nearby dots for electrons and (ii) the tensile strain in a Si cap deposited on top of the stack is significantly enhanced with respect to a single layer.

Self-organized evolution of Ge/Si(001) into intersecting bundles of horizontal nanowires during annealing

We report the observation of large scale self-assembly of long horizontal nanowires into orthogonally oriented bundles, during in situ annealing of a few monolayers of Ge on Si(001). Results are interpreted in terms of a collective wave-propagation mechanism, previously suggested for interpreting ripple faceting on Ge/Si(1u20091u200910) surfaces. Quantitative agreement between experiments and theory is found. The onset of the mechanism, the number of wires in the bundles, and their total density can be controlled by carefully tuning the growth parameters.

Shaping site-controlled uniform arrays of SiGe/Si(001) islands by in situ annealing

We investigate the effect of in situ annealing on the shape, size, and chemical composition of ordered SiGe islands grown on pit-patterned Si(001) substrates. In contrast to planar substrates, intermixing with substrate material occurs symmetrically during annealing because the substrate patterning pins the island position and suppresses lateral motion. The results are consistent with surface-mediated intermixing and demonstrate that annealing is an effective method to tune the island properties with no appreciable deterioration of the ensemble homogeneity.

Strain relief and shape oscillations in site-controlled coherent SiGe islands

Strain engineering and the crystalline quality of semiconductor nanostructures are important issues for electronic and optoelectronic devices. We report on defect-free SiGe island arrays resulting from Ge coverages of up to 38xa0monolayers grown on prepatterned Si(001) substrates. This represents a significant expansion of the parameter space known for the growth of perfect island arrays. A cyclic development of the Ge content and island shape was observed while increasing the Ge coverage. Synchrotron-based x-ray diffraction experiments and finite element method calculations allow us to study the strain behavior of such islands in great detail. In contrast to the oscillatory changes of island shape and average Ge content, the overall strain behavior of these islands exhibits a clear monotonic trend of progressive strain relaxation with increasing Ge coverage.

Strain distribution in Si capping layers on SiGe islands: influence of cap thickness and footprint in reciprocal space

We present investigations on the strain properties of silicon capping layers on top of regular SiGe island arrays, in dependence on the Si-layer thickness. Such island arrays are used as stressors for the active channel in field-effect transistors where the desired tensile strain in the Si channel is a crucial parameter for the performance of the device. The thickness of the Si cap was varied from 0 to 30xa0nm. The results of high resolution x-ray diffraction experiments served as input to perform detailed strain calculations via finite element method models. Thus, detailed information on the Ge distribution within the buried islands and the strain interaction between the SiGe island and Si cap was obtained. It was found that the tensile strain within the Si capping layer strongly depends on its thickness, even if the Ge concentration of the buried dot remains unchanged, with tensile strains degrading if thicker Si layers are used.

Strain-induced self-assembly of Ge nanodashes, nanodumbbells, and dot chains on Si(001)

We investigate the growth of self-assembled Ge nanostructures on top of embedded Ge nanowires on Si(001) substrates. Ge nanostructures, such as nanodashes, nanodumbbells, and dot chains are observed simply by tuning the growth temperature and thickness of the Si spacer between the Ge layers. The self-assembly process is governed by the surface strain fields generated by the embedded Ge nanowires and is well-described by our theoretical calculations. The catalyst-free and horizontal growth of such Ge nanostructures directly on Si(001) is attractive for investigating exotic transport properties through Si/Ge-based quantum devices.

Closely spaced SiGe barns as stressor structures for strain-enhancement in silicon

We present tensile and compressive strains realized within the same Si capping layer on an array of SiGe islands grown on pit-patterned (001) Si substrates. The strain distributions are obtained from synchrotron X-ray diffraction studies in combination with three-dimensional finite element calculations and simulations of the diffracted intensities. For barn-shaped islands grown at 720u2009°C with average Ge contents of 30%, the Si cap layer is misfit- and threading-dislocation free and exhibits compressive strains as high as 0.8% in positions between the islands and tensile strains of up to 1% on top of the islands.