Jaeup U. Kim

One-Dimensional Metal Nanowire Assembly via Block Copolymer Soft Graphoepitaxy

We accomplished a facile and scalable route to linearly stacked, one-dimensional metal nanowire assembly via soft graphoepitaxy of block copolymers. A one-dimensional nanoscale lamellar stack could be achieved by controlling the block copolymer film thickness self-assembled within the disposable topographic confinement and utilized as a template to generate linear metal nanowire assembly. The mechanism underlying this interesting morhpology evolution was investigated by self-consistent field theory. The optical properties of metal nanowire assembly involved with surface plasmon polariton were investigated by first principle calculations.

Multicomponent Nanopatterns by Directed Block Copolymer Self-Assembly

Complex nanopatterns integrating diverse nanocomponents are crucial requirements for advanced photonics and electronics. Currently, such multicomponent nanopatterns are principally created by colloidal nanoparticle assembly, where large-area processing of highly ordered nanostructures raises significant challenge. We present multicomponent nanopatterns enabled by block copolymer (BCP) self-assembly, which offers device oriented sub-10-nm scale nanopatterns with arbitrary large-area scalability. In this approach, BCP nanopatterns direct the nanoscale lateral ordering of the overlaid second level BCP nanopatterns to create the superimposed multicomponent nanopatterns incorporating nanowires and nanodots. This approach introduces diverse chemical composition of metallic elements including Au, Pt, Fe, Pd, and Co into sub-10-nm scale nanopatterns. As immediate applications of multicomponent nanopatterns, we demonstrate multilevel charge-trap memory device with Pt-Au binary nanodot pattern and synergistic plasmonic properties of Au nanowire-Pt nanodot pattern.

Graphoepitaxy of Block‐Copolymer Self‐Assembly Integrated with Single‐Step ZnO Nanoimprinting

A highly efficient, ultralarge-area nanolithography that integrates block-copolymer lithography with single-step ZnO nanoimprinting is introduced. The UV-assisted imprinting of a photosensitive sol-gel precursor creates large-area ZnO topographic patterns with various pattern shapes in a single-step process. This straightforward approach provides a smooth line edge and high thermal stability of the imprinted ZnO pattern; these properties are greatly advantageous for further graphoepitaxial block-copolymer assembly. According to the ZnO pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical nanodomains in block-copolymer thin films could be directed in a variety of ways. Significantly, the subtle tunability of ZnO trench depth enabled by nanoimprinting, generated complex hierarchical nanopatterns, where surface-parallel and surface-perpendicular nanocylinder arrays are alternately arranged. The stability of this complex morphology is confirmed by self-consistent field theory (SCFT) calculations. The highly ordered graphoepitaxial nanoscale assembly achieved on transparent semiconducting ZnO substrates offers enormous potential for photonics and optoelectronics.

Droplets of structured fluid on a flat substrate

We study the equilibrium morphology of droplets of symmetric AB diblock copolymer on a flat substrate. Using self-consistent field theory (SCFT), we provide the first predictions for the equilibrium droplet shape and its internal structure. When the substrate affinity for the A component, ηA, is small, the droplet adopts a nearly spherical shape much like that of simple fluids. Inside the spherical droplet, however, concentric circular lamellar layers stack on top of each other; hence the thickness of the droplet is effectively quantized by a half-integer or integer number of layers. At larger ηA and smaller contact angle, the area of the upper-most layer becomes relatively large, resulting in a nearly flat, faceted top surface, followed by a semi-spherical slope. This geometry is remarkably reminiscent of the droplet shapes observed with smectic liquid crystals.

Self-consistent field theory for diblock copolymers grafted to a sphere

An efficient numerical self-consistent field theory (SCFT) algorithm is developed for treating structured polymers on spherical surfaces. The method solves the diffusion equations of SCFT with a pseudo-spectral approach that combines a spherical-harmonics expansion for the angular coordinates with a modified real-space Crank–Nicolson method for the radial direction. The self-consistent field equations are solved with Anderson-mixing iterations using dynamical parameters and an alignment procedure to prevent angular drift of the solution. A demonstration of the algorithm is provided for thin films of diblock copolymer grafted to the surface of a spherical core, in which the sequence of equilibrium morphologies is predicted as a function of diblock composition. The study reveals an array of interesting behaviors as the block copolymer pattern is forced to adapt to the finite surface area of the sphere.

High-throughput preparation of complex multi-scale patterns from block copolymer/homopolymer blend films

A simple, straightforward process for fabricating multi-scale micro- and nanostructured patterns from polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP)/poly(methyl methacrylate) (PMMA) homopolymer in a preferential solvent for PS and PMMA is demonstrated. When the PS-b-P2VP/PMMA blend films were spin-coated onto a silicon wafer, PS-b-P2VP micellar arrays consisting of a PS corona and a P2VP core were formed, while the PMMA macrodomains were isolated, due to the macrophase separation caused by the incompatibility between block copolymer micelles and PMMA homopolymer during the spin-coating process. With an increase of PMMA composition, the size of PMMA macrodomains increased. Moreover, the P2VP blocks have a strong interaction with a native oxide of the surface of the silicon wafer, so that the P2VP wetting layer was first formed during spin-coating, and PS nanoclusters were observed on the PMMA macrodomains beneath. Whereas when a silicon surface was modified with a PS brush layer, the PS nanoclusters underlying PMMA domains were not formed. The multi-scale patterns prepared from copolymer micelle/homopolymer blend films are used as templates for the fabrication of gold nanoparticle arrays by incorporating the gold precursor into the P2VP chains. The combination of nanostructures prepared from block copolymer micellar arrays and macrostructures induced by incompatibility between the copolymer and the homopolymer leads to the formation of complex, multi-scale surface patterns by a simple casting process.

Finite- N effects for ideal polymer chains near a flat impenetrable wall

This paper addresses the statistical mechanics of ideal polymer chains next to a hard wall. The principal quantity of interest, from which all monomer densities can be calculated, is the partition function, GN(z) , for a chain of N discrete monomers with one end fixed a distance z from the wall. It is well accepted that in the limit of infinite N , GN(z) satisfies the diffusion equation with the Dirichlet boundary condition, GN(0) = 0 , unless the wall possesses a sufficient attraction, in which case the Robin boundary condition, GN(0) = -

Nanoporous Bicontinuous Structures via Addition of Thermally-Stable Amphiphilic Nanoparticles within Block Copolymer Templates

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Diblock and triblock copolymer thin films on a substrate with controlled selectivity

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Roles of chemical pattern period and film thickness in directed self-assembly of diblock copolymers

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