James Broc Stirton

Method and apparatus for controlling photolithography overlay registration

Method and apparatus for selecting wafer alignment marks based on film thickness variation

Methods of using adaptive sampling techniques based upon categorization of process variations, and system for performing same

Method and apparatus for identifying misregistration in a complimentary phase shift mask process

Method and apparatus for determining feature characteristics using scatterometry

Method and apparatus for periodic correction of metrology data

Method of controlling stepper process parameters based upon scatterometric measurements of DICD features

Method and apparatus for controlling a polishing process based on scatterometry derived film thickness variation

Method of identifying film stacks based upon optical properties

Method and apparatus for filtering metrology data based on collection purpose