Janos Farkas
Motorola
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Publication
Featured researches published by Janos Farkas.
Electrochemical and Solid State Letters | 2002
Kevin Cooper; Jennifer Cooper; Johannes Groschopf; John C. Flake; Yuri E. Solomentsev; Janos Farkas
Effects of particle concentration on removal rates in chemical mechanical planarization (CMP) were investigated. Experimental data shows the removal rate scales with the cubic root of weight percent solids and is proportional to mean separation distance between particles in the slurry. Results show similar removal rate scaling with solid concentration for both silicon dioxide and copper films. This work also identifies a critical solid concentration needed to initiate removal for oxide or copper surfaces. The effects of particles on copper surface oxidation and roughness are further characterized by voltammetry and atomic force microscopy. Results show copper films become progressively smoother with additional solids in the slurry.
Archive | 1997
Janos Farkas; Rajeev Bajaj; Melissa Freeman; David K. Watts; Sanjit Das
Archive | 1997
David K. Watts; Rajeev Bajaj; Sanjit Das; Janos Farkas; Chelsea Dang; Melissa Freeman; Jaime Saravia; Jason Gomez; Lance B Cook
Archive | 1996
Janos Farkas; Melissa Freeman
Archive | 2001
Janos Farkas; Brian G. Anthony; Abbas Guvenilir; Mohammed Rabiul Islam; Venkat Kolagunta; John Mendonca; Rajesh Tiwari; Suresh Venkatesan
Archive | 1998
Nigel Cave; Kathleen C. Yu; Janos Farkas
Archive | 1997
David K. Watts; Janos Farkas; Jason Gomez; Chelsea Dang
Archive | 1996
Janos Farkas; James M. Mullins
Archive | 1996
Janos Farkas; Melissa Freeman
Archive | 1998
Rajeev Bajaj; Lance B Cook; Chelsea Dang; Sanjit Das; Janos Farkas; Melissa Freeman; Jason Gomez; Jaime Saravia; David K. Watts; サンジト・ダス; ジェイソン、ゴメス; ジェイノス・ファーカス; ジェイム・エー・サラビア; チェルシー・ダン; デビッド・ワッツ; メリッサ・フリーマン; ラジーブ、バジャジュ; ランス・ビー・クック
